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Extract from the Register of European Patents

EP About this file: EP1438734

EP1438734 - METHODS AND APPARATUS FOR PLASMA DOPING AND ION IMPLANTATION IN AN INTEGRATED PROCESSING SYSTEM [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  13.08.2010
Database last updated on 04.06.2024
Most recent event   Tooltip07.10.2011Lapse of the patent in a contracting state
New state(s): CY, TR		published on 09.11.2011  [2011/45]
Applicant(s)For all designated states
Varian Semiconductor Equipment Associates Inc.
35 Dory Road
Gloucester, MA 01930 / US
[2004/30]
Inventor(s)01 / WALTHER, Steven, R.
83 Morton Street
Andover, MA 01810 / US
 [2004/30]
Representative(s)Beck, Simon Antony
Withers & Rogers LLP
4 More London Riverside
London SE1 2AU / GB
[N/P]
Former [2004/30]Beck, Simon Antony
Withers & Rogers, Goldings House, 2 Hays Lane
London SE1 2HW / GB
Application number, filing date02784127.917.10.2002
[2004/30]
WO2002US33091
Priority number, dateUS2001000753026.10.2001         Original published format: US 7530
[2004/30]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO03038879
Date:08.05.2003
Language:EN
[2003/19]
Type: A2 Application without search report 
No.:EP1438734
Date:21.07.2004
Language:EN
The application published by WIPO in one of the EPO official languages on 08.05.2003 takes the place of the publication of the European patent application.
[2004/30]
Type: B1 Patent specification 
No.:EP1438734
Date:07.10.2009
Language:EN
[2009/41]
Search report(s)International search report - published on:EP11.12.2003
ClassificationIPC:H01J37/317
[2004/30]
CPC:
H01J37/32412 (EP,US); H01L21/22 (KR); H01J37/3171 (EP,US);
H01L21/2236 (EP,US); H01L21/26513 (EP,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE,   SK,   TR [2004/30]
TitleGerman:VERFAHREN UND VORRICHTUNG ZUR PLASMADOTIERUNG UND IONENIMPLANTIERUNG IN EINEM INTEGRIERTEN BEHANDLUNGSSYSTEM[2004/30]
English:METHODS AND APPARATUS FOR PLASMA DOPING AND ION IMPLANTATION IN AN INTEGRATED PROCESSING SYSTEM[2004/30]
French:PROCEDES ET APPAREILS DE DOPAGE PAR PLASMA ET D'IMPLANTATION IONIQUE DANS UN SYSTEME DE TRAITEMENT INTEGRE[2004/30]
Entry into regional phase10.05.2004National basic fee paid 
10.05.2004Designation fee(s) paid 
10.05.2004Examination fee paid 
Examination procedure10.05.2004Examination requested  [2004/30]
02.07.2004Amendment by applicant (claims and/or description)
06.06.2007Despatch of a communication from the examining division (Time limit: M06)
19.09.2007Reply to a communication from the examining division
22.04.2009Communication of intention to grant the patent
26.08.2009Fee for grant paid
26.08.2009Fee for publishing/printing paid
Opposition(s)08.07.2010No opposition filed within time limit [2010/37]
Fees paidRenewal fee
25.10.2004Renewal fee patent year 03
27.10.2005Renewal fee patent year 04
27.10.2006Renewal fee patent year 05
29.10.2007Renewal fee patent year 06
27.10.2008Renewal fee patent year 07
Opt-out from the exclusive  Tooltip
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT07.10.2009
BE07.10.2009
CY07.10.2009
CZ07.10.2009
DK07.10.2009
EE07.10.2009
FI07.10.2009
NL07.10.2009
SE07.10.2009
SK07.10.2009
TR07.10.2009
IE17.10.2009
LU17.10.2009
CH31.10.2009
LI31.10.2009
MC31.10.2009
BG07.01.2010
GB07.01.2010
GR08.01.2010
PT08.02.2010
[2011/44]
Former [2011/21]AT07.10.2009
BE07.10.2009
CZ07.10.2009
DK07.10.2009
EE07.10.2009
FI07.10.2009
NL07.10.2009
SE07.10.2009
SK07.10.2009
IE17.10.2009
LU17.10.2009
CH31.10.2009
LI31.10.2009
MC31.10.2009
BG07.01.2010
GB07.01.2010
GR08.01.2010
PT08.02.2010
Former [2011/05]AT07.10.2009
BE07.10.2009
CZ07.10.2009
DK07.10.2009
EE07.10.2009
FI07.10.2009
NL07.10.2009
SE07.10.2009
SK07.10.2009
IE17.10.2009
CH31.10.2009
LI31.10.2009
MC31.10.2009
BG07.01.2010
GB07.01.2010
GR08.01.2010
PT08.02.2010
Former [2010/46]AT07.10.2009
BE07.10.2009
CZ07.10.2009
DK07.10.2009
EE07.10.2009
FI07.10.2009
NL07.10.2009
SE07.10.2009
SK07.10.2009
IE17.10.2009
CH31.10.2009
LI31.10.2009
MC31.10.2009
BG07.01.2010
GR08.01.2010
PT08.02.2010
Former [2010/39]AT07.10.2009
BE07.10.2009
CZ07.10.2009
DK07.10.2009
EE07.10.2009
FI07.10.2009
NL07.10.2009
SE07.10.2009
SK07.10.2009
MC31.10.2009
BG07.01.2010
PT08.02.2010
Former [2010/36]AT07.10.2009
BE07.10.2009
CZ07.10.2009
DK07.10.2009
EE07.10.2009
FI07.10.2009
NL07.10.2009
SE07.10.2009
MC31.10.2009
BG07.01.2010
PT08.02.2010
Former [2010/35]AT07.10.2009
BE07.10.2009
DK07.10.2009
EE07.10.2009
FI07.10.2009
NL07.10.2009
SE07.10.2009
MC31.10.2009
BG07.01.2010
PT08.02.2010
Former [2010/32]AT07.10.2009
BE07.10.2009
FI07.10.2009
NL07.10.2009
SE07.10.2009
MC31.10.2009
PT08.02.2010
Former [2010/29]AT07.10.2009
BE07.10.2009
FI07.10.2009
SE07.10.2009
MC31.10.2009
PT08.02.2010
Former [2010/25]FI07.10.2009
SE07.10.2009
MC31.10.2009
PT08.02.2010
Former [2010/22]FI07.10.2009
SE07.10.2009
PT08.02.2010
Cited inInternational search[A]WO9906110  (SILICON GENESIS CORP [US], et al) [A] 1,23,28* abstract *
ExaminationEP0840355
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.