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Extract from the Register of European Patents

EP About this file: EP1381074

EP1381074 - Method and apparatus for observing a semiconductor device using an electron microscope [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  14.10.2011
Database last updated on 05.10.2024
Most recent event   Tooltip14.10.2011Application deemed to be withdrawnpublished on 16.11.2011  [2011/46]
Applicant(s)For all designated states
Carl Zeiss NTS GmbH
Carl-Zeiss-Strasse 56
73447 Oberkochen / DE
[2007/42]
Former [2004/03]For all designated states
LEO Elektronenmikroskopie GmbH
Carl-Zeiss-Strasse 56
73447 Oberkochen / DE
Inventor(s)01 / Kienzle, Oliver, Dr.
Kiefernweg 18
73430 Aalen / DE
02 / Knippelmeyer, Rainer, Dr.
Weisse Steige 32
73431 Aalen / DE
03 / Müller, Ingo, Dr.
Kälblesrainweg 103
73430 Aalen / DE
 [2004/03]
Representative(s)Diehl & Partner
Patent- und Rechtsanwaltskanzlei mbB
Erika-Mann-Straße 9
80636 München / DE
[N/P]
Former [2004/03]DIEHL GLAESER HILTL & PARTNER
Patentanwälte Augustenstrasse 46
80333 München / DE
Application number, filing date03015393.608.07.2003
[2004/03]
Priority number, dateDE2002103092909.07.2002         Original published format: DE 10230929
[2004/03]
Filing languageDE
Procedural languageDE
PublicationType: A2 Application without search report 
No.:EP1381074
Date:14.01.2004
Language:DE
[2004/03]
Type: A3 Search report 
No.:EP1381074
Date:12.09.2007
[2007/37]
Search report(s)(Supplementary) European search report - dispatched on:EP16.08.2007
ClassificationIPC:H01J37/28
[2004/03]
CPC:
H01J37/28 (EP,US); H01L22/00 (KR); H01J2237/2817 (EP,US)
Designated contracting statesCZ,   DE,   FR,   GB,   IT,   NL [2008/21]
Former [2004/03]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Verfahren und Vorrichtung zum elektronenmikroskopischen Beobachten einer Halbleiteranordnung[2004/03]
English:Method and apparatus for observing a semiconductor device using an electron microscope[2004/03]
French:Méthode et appareil pour l'observation d'un dispositif semiconducteur en microscopie électronique[2004/03]
Examination procedure20.02.2008Examination requested  [2008/14]
13.03.2008Loss of particular rights, legal effect: designated state(s)
18.04.2008Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, DK, EE, ES, FI, GR, HU, IE, LU, MC, PT, RO, SE, SI, SK, TR
11.01.2011Despatch of a communication from the examining division (Time limit: M04)
24.05.2011Application deemed to be withdrawn, date of legal effect  [2011/46]
27.06.2011Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2011/46]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  11.01.2011
Fees paidRenewal fee
14.07.2005Renewal fee patent year 03
13.07.2006Renewal fee patent year 04
28.07.2007Renewal fee patent year 05
15.07.2008Renewal fee patent year 06
20.07.2009Renewal fee patent year 07
27.07.2010Renewal fee patent year 08
Penalty fee
Additional fee for renewal fee
31.07.201109   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[Y]US6087659  (ADLER DAVID L [US], et al) [Y] 9-11 * column A; figures 1-3 *;
 [DXA]US6232787  (LO CHIWOEI WAYNE [US], et al) [DX] 1-5,13-15 * column 3, line 30 - column 8, line 53; figures 1,2,4 * [A] 18-20;
 WO0175929  [ ] (HITACHI LTD [JP], et al);
 [PXY]EP1271603  (HITACHI LTD [JP]) [PX] 1-8,12-20 * paragraphs [0023] - [0036]; figures 1,4-6 * [PY] 9-11
ExaminationDE10000361
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.