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Extract from the Register of European Patents

EP About this file: EP1371449

EP1371449 - Chemical mechanical polishing head having floating retaining ring and carrier with multi-zone polishing pressure control [Right-click to bookmark this link]
StatusThe application has been refused
Status updated on  26.10.2007
Database last updated on 02.09.2024
Most recent event   Tooltip26.10.2007Refusal of applicationpublished on 28.11.2007  [2007/48]
Applicant(s)For all designated states
EBARA CORPORATION
11-1, Haneda Asahi-cho Ohta-ku
Tokyo 144-8510 / JP
[N/P]
Former [2005/26]For all designated states
EBARA CORPORATION
11-1, Haneda Asahi-cho
Ohta-ku, Tokyo 144-8510 / JP
Former [2003/51]For all designated states
MITSUBISHI MATERIALS CORPORATION
5-1, Otemachi 1-chome
Chiyoda-ku, Tokyo 100-8117 / JP
Inventor(s)01 / Wang, Huey-Ming
34294 Quartz Terrace
Fremont, CA 94555 / US
02 / Moloney, Gerard S
74 Washington Square Drive
Milpitas, CA 95035 / US
03 / Chin, Scott
473 Pepper Drive
Palo Alto, CA / US
04 / Geraghity, Joh J
52 Buckley Court
Phoenixville, Pennsylvania 19460 / US
05 / Dyson, William Jr
6912 Bollonger Road
San Jose, CA 95129 / US
06 / Dickey, Tanlin K
1063 Morse Avenue 5-205
Sunnyvale, CA 92089 / US
 [2004/16]
Former [2004/04]01 / Wang, Huey-Ming
34294 Quartz Terrace
Fremont, CA 94555 / US
02 / Moloney, Gerard S
74 Washington Square Drive
Milpitas, CA 95035 / US
03 / Chin, Scott
473 Pepper Drive
Palo Alto, CA / US
04 / Geraghity, Joh J
1029 El Camino Real 8
Burlingame, CA 94010 / US
05 / Dyson, William Jr
6912 Bollonger Road
San Jose, CA 95129 / US
06 / Dickey, Tanlin K
1063 Morse Avenue 5-205
Sunnyvale, CA 92089 / US
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[N/P]
Former [2003/51]HOFFMANN - EITLE
Patent- und Rechtsanwälte Arabellastrasse 4
81925 München / DE
Application number, filing date03020525.624.02.2000
[2003/51]
Priority number, dateUS1999026111203.03.1999         Original published format: US 261112
US1999029454719.04.1999         Original published format: US 294547
US1999039014203.09.1999         Original published format: US 390142
[2003/51]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1371449
Date:17.12.2003
Language:EN
[2003/51]
Type: A3 Search report 
No.:EP1371449
Date:21.04.2004
[2004/17]
Search report(s)(Supplementary) European search report - dispatched on:EP09.03.2004
ClassificationIPC:B24B37/04, B24B41/06, B24B53/007, B24B49/16
[2003/51]
CPC:
B24B37/30 (EP,US); B24B37/32 (EP,US); B24B41/061 (EP,US);
B24B49/16 (EP,US)
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE [2003/51]
TitleGerman:Chemisch-mechanische Polierträgervorrichtung mit einem schwimmenden Halterring und einer Trägerplatte mit mehrzonaler Rucksteuervorrichtung[2003/51]
English:Chemical mechanical polishing head having floating retaining ring and carrier with multi-zone polishing pressure control[2003/51]
French:Tête de polissage mécanico-chimique pourvue d'une bague de maintien de tranche flottante et d'un porte-tranche à commande de pression de polissage multi-zone[2003/51]
Examination procedure07.10.2004Examination requested  [2004/50]
16.12.2004Despatch of a communication from the examining division (Time limit: M04)
26.04.2005Reply to a communication from the examining division
20.07.2005Despatch of a communication from the examining division (Time limit: M08)
28.03.2006Reply to a communication from the examining division
07.04.2006Despatch of a communication from the examining division (Time limit: M04)
16.08.2006Reply to a communication from the examining division
20.06.2007Date of oral proceedings
26.06.2007Despatch of communication that the application is refused, reason: substantive examination [2007/48]
26.06.2007Minutes of oral proceedings despatched
06.07.2007Application refused, date of legal effect [2007/48]
Parent application(s)   TooltipEP00919082.8  / EP1091829
Divisional application(s)EP07011957.3  / EP1837122
Fees paidRenewal fee
23.10.2003Renewal fee patent year 03
23.10.2003Renewal fee patent year 04
23.02.2004Renewal fee patent year 05
22.02.2005Renewal fee patent year 06
27.02.2006Renewal fee patent year 07
27.02.2007Renewal fee patent year 08
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Documents cited:Search[XY]JPH10249707  ;
 [Y]JP8011055  ;
 [A]US4918869  (KITTA SATORU [JP]) [A] 1 * column 3, line 61 - column 4, line 68; figures 5-6B *;
 [T]GB2307342  (NEC CORP [JP]) [T] 25 * the whole document *;
 [A]US5651724  (KIMURA NORIO [JP], et al) [A] 1 * column 3, line 58 - column 4, line 50 * * column 7, line 28 - line 56 * * figures 1,4 *;
 [XY]EP0791431  (SHINETSU HANDOTAI KK [JP]) [X] 1-14,20-22 * column 3, line 37 - column 4, line 33 * * figure 1 * [Y] 15-19;
 [T]US5679065  (HENDERSON GARY O [US]) [T] 24 * column W *;
 [Y]US5716258  (METCALF ROBERT L [US]) [Y] 15-18 * column 5, line 60 - column 6, line 10; figure 1 *;
 [Y]US5851136  (LEE LAWRENCE L [US]) [Y] 19 * column 12, line 60 - column 13, line 6; figure 13 *;
 [PX]US6019670  (CHENG TSUNGNAN [US], et al) [PX] 23* column 11, line 57 - column 12, line 18; figure 9 *
 [XY]  - PATENT ABSTRACTS OF JAPAN, (19981231), vol. 1998, no. 14, & JP10249707 A 19980922 (APPLIED MATERIALS INC) [X] 23,30-38 * abstract * [Y] 24,25
 [Y]  - PATENT ABSTRACTS OF JAPAN, (19960531), vol. 1996, no. 05, & JP8011055 A 19960116 (SONY CORP) [Y] 24,25 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.