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EP1431830
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EP About this file: EP1431830
| EP1431830 - Lithographic apparatus, device manufacturing method, and device manufactured thereby [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 20.11.2009 Database last updated on 27.07.2024 | Most recent event Tooltip | 20.11.2009 | Application deemed to be withdrawn | published on 23.12.2009 [2009/52] | Applicant(s) | For all designated states ASML Netherlands B.V. De Run 6501 5504 DR Veldhoven / NL | [N/P] |
| Former [2004/39] | For all designated states ASML Netherlands B.V. De Run 6501 5504 DR Veldhoven / NL | ||
| Former [2004/26] | For all designated states ASML Netherlands B.V. De Run 1110 5503 LA Veldhoven / NL | Inventor(s) | 01 /
Stevens, Lucas Henricus Johannes Zandzegge 75 5658 BD Eindhoven / NL | 02 /
Leenders, Martinus Hendrikus Antonius Stadhoudersplein 29b 3039 ER Rotterdam / NL | 03 /
Meiling, Hans Parklaan 76 3722 BG Bilthoven / NL | 04 /
Moors, Johannes Hubertus Josephina Dierdonklaan 56 5709 MT Helmond / NL | [2004/26] | Representative(s) | van den Hooven, Jan, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | [N/P] |
| Former [2009/16] | Van den Hooven, Jan, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
| Former [2004/26] | Leeming, John Gerard J.A. Kemp & Co., 14 South Square, Gray's Inn London WC1R 5JJ / GB | Application number, filing date | 03258053.2 | 19.12.2003 | [2004/26] | Priority number, date | EP20020258914 | 20.12.2002 Original published format: EP 02258914 | [2004/26] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1431830 | Date: | 23.06.2004 | Language: | EN | [2004/26] | Type: | A3 Search report | No.: | EP1431830 | Date: | 20.10.2004 | [2004/43] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 02.09.2004 | Classification | IPC: | G03F7/20, B08B7/00, B08B6/00 | [2004/26] | CPC: |
G03F7/70925 (EP);
B08B7/0035 (EP)
| Designated contracting states | DE, FR, GB, IT, NL [2005/28] |
| Former [2004/26] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PT, RO, SE, SI, SK, TR | Title | German: | Lithographischer Gerät und Verfahren zur Herstellung einer Vorrichtung | [2004/26] | English: | Lithographic apparatus, device manufacturing method, and device manufactured thereby | [2004/26] | French: | Appareil lithographique et méthode pour la fabrication d'un dispositif | [2004/26] | Examination procedure | 26.01.2005 | Examination requested [2005/13] | 01.07.2009 | Application deemed to be withdrawn, date of legal effect [2009/52] | 06.08.2009 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2009/52] | Fees paid | Renewal fee | 13.12.2005 | Renewal fee patent year 03 | 12.12.2006 | Renewal fee patent year 04 | 13.12.2007 | Renewal fee patent year 05 | Penalty fee | Additional fee for renewal fee | 31.12.2008 | 06 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]EP1011128 (NIKON CORP [JP]) [X] 1-3,6,27,35,42,43 * abstract * * paragraph [0073] - paragraph [0074] * * paragraph [0096] *; | [AX]US6192897 (KLEBANOFF LEONARD E [US], et al) [A] 1-15,22,23,28,30-32,35,36,39,42,43 * the whole document * * column 4, line 32 - line 48; figure 1 * [X] 19-21,24-27,29,38,39; | [X]US2002053353 (KAWATA SHINTARO [JP], et al) [X] 1-9,14,29-32,35,36,39,42,43,19,28,38,39 * paragraph [0003] - paragraph [0004] * * paragraph [0045] - paragraph [0056] * * paragraph [0070] * * paragraph [0115] - paragraph [0122] * * paragraph [0011] * * paragraph [0060] - paragraph [0061] *; | [X]EP1220038 (ASM LITHOGRAPHY BV [NL]) [X] 33,34,40,41* paragraph [0016] *; | [AX]WO02052347 (EUV LLC [US], et al) [A] 1,15-18,37 * the whole document * * page 2, line 3 * [X] 33,40 |