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Extract from the Register of European Patents

EP About this file: EP1376666

EP1376666 - Method of machining silicon wafer [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  20.01.2006
Database last updated on 13.07.2024
Most recent event   Tooltip20.01.2006Application deemed to be withdrawnpublished on 08.03.2006  [2006/10]
Applicant(s)For all designated states
SHINKO ELECTRIC INDUSTRIES CO., LTD.
711, Aza Shariden, Oaza Kurita
Nagano-shi, Nagano 380-0921 / JP
[N/P]
Former [2004/13]For all designated states
SHINKO ELECTRIC INDUSTRIES CO., LTD.
711, Aza Shariden, Oaza Kurita
Nagano-shi, NAGANO 380-0921 / JP
Former [2004/01]For all designated states
SHINKO ELECTRIC INDUSTRIES CO. LTD.
711, Aza Shariden, Oaza Kurita
Nagano-shi, Nagano 380-0921 / JP
Inventor(s)01 / Mashino, Naohiro, c/o Shinko Electric Industries
Co., Ltd., 711, Aza Shariden, Oaza Kurita
Nagano-shi, Nagano 380-0921 / JP
 [2004/01]
Representative(s)Quantin, Bruno Marie Henri
Santarelli
14, avenue de la Grande Armée
75017 Paris / FR
[N/P]
Former [2004/01]Quantin, Bruno
Santarelli, 14 Avenue de la Grande Armée
75017 Paris / FR
Application number, filing date03291383.211.06.2003
[2004/01]
Priority number, dateJP2002017743018.06.2002         Original published format: JP 2002177430
[2004/01]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1376666
Date:02.01.2004
Language:EN
[2004/01]
Type: A3 Search report 
No.:EP1376666
Date:13.10.2004
[2004/42]
Search report(s)(Supplementary) European search report - dispatched on:EP30.08.2004
ClassificationIPC:H01L21/304, B24B7/22, B24B41/06
[2004/42]
CPC:
H01L21/6835 (EP,US); H01L21/302 (KR); H01L21/6836 (EP,US);
H01L21/6838 (EP,US); H01L2221/68327 (EP,US); H01L2221/6834 (EP,US)
Former IPC [2004/01]H01L21/304
Designated contracting states(deleted) [2005/27]
Former [2004/01]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Verfahren zur Bearbeitung von einem Siliziumwafer[2004/01]
English:Method of machining silicon wafer[2004/01]
French:Procédé d'usinage d'une tranche de silicium[2004/01]
Examination procedure14.04.2005Application deemed to be withdrawn, date of legal effect  [2006/10]
29.08.2005Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time  [2006/10]
Fees paidPenalty fee
Penalty fee Rule 85a EPC 1973
23.05.2005AT   M01   Not yet paid
23.05.2005BE   M01   Not yet paid
23.05.2005BG   M01   Not yet paid
23.05.2005CH   M01   Not yet paid
23.05.2005CY   M01   Not yet paid
23.05.2005CZ   M01   Not yet paid
23.05.2005DE   M01   Not yet paid
23.05.2005DK   M01   Not yet paid
23.05.2005EE   M01   Not yet paid
23.05.2005ES   M01   Not yet paid
23.05.2005FI   M01   Not yet paid
23.05.2005FR   M01   Not yet paid
23.05.2005GB   M01   Not yet paid
23.05.2005GR   M01   Not yet paid
23.05.2005HU   M01   Not yet paid
23.05.2005IE   M01   Not yet paid
23.05.2005IT   M01   Not yet paid
23.05.2005LU   M01   Not yet paid
23.05.2005MC   M01   Not yet paid
23.05.2005NL   M01   Not yet paid
23.05.2005PT   M01   Not yet paid
23.05.2005RO   M01   Not yet paid
23.05.2005SE   M01   Not yet paid
23.05.2005SI   M01   Not yet paid
23.05.2005SK   M01   Not yet paid
23.05.2005TR   M01   Not yet paid
Penalty fee Rule 85b EPC 1973
23.05.2005M01   Not yet paid
Additional fee for renewal fee
30.06.200503   M06   Not yet paid
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Documents cited:Search[D]JPS62154614  ;
 [Y]US4597228  (KOYAMA ISAO [JP], et al) [Y] 2-4 * abstract *;
 [XY]US5087307  (NOMURA TAKEHIKO [JP], et al) [X] 1 * column 3, line 23 - column 5, line 13; figure - * [Y] 2-4;
 [A]EP0850723  (SHINETSU HANDOTAI KK [JP]) [A] 2-4 * abstract *
 [D]  - PATENT ABSTRACTS OF JAPAN, (19871219), vol. 0113, no. 90, Database accession no. (E - 567), & JP62154614 A 19870709 (TOSHIBA CORP) [D] * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.