blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability
Register Forum

2022.02.11

More...
blank News flashes

News flashes

New version of the European Patent Register - SPC information for Unitary Patents.

2024-03-06

More...
blank Related links

Release notes
European Patent Register Assistant
European Patent Register Resource Book
European Patent Register – pocket guide
FAQ - European Patent Register
FAQ - Register Alert
Federated Register (Flyer)
Global Dossier (Flyer)
Register events
Deep link coverage
Federated Register content
The Patent Information Tour
Fair use charter

Extract from the Register of European Patents

EP About this file: EP1502605

EP1502605 - Apparatus and method for electron beam irradiation having improved dose uniformity ratio [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  01.04.2011
Database last updated on 12.07.2024
Most recent event   Tooltip11.10.2013Lapse of the patent in a contracting state
New state(s): ES		published on 13.11.2013  [2013/46]
Applicant(s)For all designated states
ION BEAM APPLICATIONS S.A.
Chemin du Cyclotron, 3
1348 Louvain-la-Neuve / BE
[2005/05]
Inventor(s)01 / Bol, Jean Louis
Place D'hattain 11
1470 Genappe / BE
02 / Gregoire, Olivier
Voie des Gaumais 2/411
1348 Louvain-La-Neuve / BE
03 / Martin, Francis
Rue des Alouettes 21
78700 Conflans-Ste-Honorine / FR
04 / Mullier, Benoît
Rue de Perwez 129
5031 Grand-Leez / BE
05 / Stichelbaut, Frédéric
Rue de Saint-Martin 37
5032 Mazy / BE
 [2010/20]
Former [2005/05]01 / Bol, Jean Louis
Place D'hattain 11
1470 Genappe / BE
02 / Gregoire, Olivier
Voie des Gaumais 2/411
1348 Louvain-La-Neuve / BE
03 / Martin, Francis
Rue des Alouettes 21
78700 Conflans-Ste-Honorine / FR
04 / Mullier, Benôit
Rue de Perwez 129
5031 Grand-Leez / BE
05 / Stichelbaut, Frédéric
Rue de Saint-Martin 37
5032 Mazy / BE
Representative(s)Van Malderen, Joëlle, et al
pronovem - Office Van Malderen
Avenue Josse Goffin 158
1082 Bruxelles / BE
[N/P]
Former [2005/05]Van Malderen, Joelle, et al
Office Van Malderen, Place Reine Fabiola 6/1
1083 Bruxelles / BE
Application number, filing date03447202.730.07.2003
[2005/05]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1502605
Date:02.02.2005
Language:EN
[2005/05]
Type: B1 Patent specification 
No.:EP1502605
Date:26.05.2010
Language:EN
[2010/21]
Search report(s)(Supplementary) European search report - dispatched on:EP26.01.2004
ClassificationIPC:A61L2/08, A61L2/26, B65B55/08
[2005/05]
CPC:
A61L2/087 (EP,US); B65B55/08 (EP,US); B65B55/16 (EP,US);
A61L2202/23 (EP,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   RO,   SE,   SI,   SK,   TR [2005/05]
TitleGerman:Vorrichtung und Verfahren für elektronenstrahl Bestrahlung mit verbesserten Dosierungsverhältnis[2005/05]
English:Apparatus and method for electron beam irradiation having improved dose uniformity ratio[2005/05]
French:Dispositif et procédé pour irradiation avec des rayons électroniques et une proportion de dose amélioré[2005/05]
Examination procedure13.07.2005Examination requested  [2005/36]
05.12.2006Despatch of a communication from the examining division (Time limit: M06)
16.05.2007Reply to a communication from the examining division
17.03.2008Despatch of a communication from the examining division (Time limit: M06)
26.09.2008Reply to a communication from the examining division
08.12.2009Communication of intention to grant the patent
29.03.2010Fee for grant paid
29.03.2010Fee for publishing/printing paid
Opposition(s)01.03.2011No opposition filed within time limit [2011/18]
Fees paidRenewal fee
27.07.2005Renewal fee patent year 03
26.07.2006Renewal fee patent year 04
31.07.2007Renewal fee patent year 05
30.07.2008Renewal fee patent year 06
28.07.2009Renewal fee patent year 07
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT26.05.2010
CY26.05.2010
CZ26.05.2010
DK26.05.2010
EE26.05.2010
FI26.05.2010
IT26.05.2010
RO26.05.2010
SE26.05.2010
SI26.05.2010
SK26.05.2010
TR26.05.2010
IE30.07.2010
LU30.07.2010
MC31.07.2010
BG26.08.2010
GR27.08.2010
ES06.09.2010
PT27.09.2010
HU27.11.2010
[2013/46]
Former [2013/42]AT26.05.2010
CY26.05.2010
CZ26.05.2010
DK26.05.2010
EE26.05.2010
FI26.05.2010
IT26.05.2010
RO26.05.2010
SE26.05.2010
SI26.05.2010
SK26.05.2010
TR26.05.2010
IE30.07.2010
LU30.07.2010
MC31.07.2010
BG26.08.2010
GR27.08.2010
PT27.09.2010
HU27.11.2010
Former [2012/47]AT26.05.2010
BG26.05.2010
CY26.05.2010
CZ26.05.2010
DK26.05.2010
EE26.05.2010
FI26.05.2010
IT26.05.2010
RO26.05.2010
SE26.05.2010
SI26.05.2010
SK26.05.2010
TR26.05.2010
IE30.07.2010
LU30.07.2010
MC31.07.2010
GR27.08.2010
PT27.09.2010
HU27.11.2010
Former [2012/44]AT26.05.2010
BG26.05.2010
CY26.05.2010
CZ26.05.2010
DK26.05.2010
EE26.05.2010
FI26.05.2010
IT26.05.2010
RO26.05.2010
SE26.05.2010
SI26.05.2010
SK26.05.2010
IE30.07.2010
LU30.07.2010
MC31.07.2010
GR27.08.2010
PT27.09.2010
HU27.11.2010
Former [2012/42]AT26.05.2010
BG26.05.2010
CY26.05.2010
CZ26.05.2010
DK26.05.2010
EE26.05.2010
FI26.05.2010
IT26.05.2010
RO26.05.2010
SE26.05.2010
SI26.05.2010
SK26.05.2010
IE30.07.2010
MC31.07.2010
GR27.08.2010
PT27.09.2010
HU27.11.2010
Former [2012/41]AT26.05.2010
BG26.05.2010
CY26.05.2010
CZ26.05.2010
DK26.05.2010
EE26.05.2010
FI26.05.2010
IT26.05.2010
RO26.05.2010
SE26.05.2010
SI26.05.2010
SK26.05.2010
IE30.07.2010
MC31.07.2010
GR27.08.2010
PT27.09.2010
Former [2011/35]AT26.05.2010
CY26.05.2010
CZ26.05.2010
DK26.05.2010
EE26.05.2010
FI26.05.2010
IT26.05.2010
RO26.05.2010
SE26.05.2010
SI26.05.2010
SK26.05.2010
IE30.07.2010
MC31.07.2010
GR27.08.2010
PT27.09.2010
Former [2011/15]AT26.05.2010
CY26.05.2010
CZ26.05.2010
DK26.05.2010
EE26.05.2010
FI26.05.2010
IT26.05.2010
RO26.05.2010
SE26.05.2010
SI26.05.2010
SK26.05.2010
MC31.07.2010
GR27.08.2010
PT27.09.2010
Former [2011/11]AT26.05.2010
CY26.05.2010
CZ26.05.2010
DK26.05.2010
EE26.05.2010
FI26.05.2010
RO26.05.2010
SE26.05.2010
SI26.05.2010
SK26.05.2010
MC31.07.2010
GR27.08.2010
PT27.09.2010
Former [2011/10]AT26.05.2010
CY26.05.2010
CZ26.05.2010
DK26.05.2010
EE26.05.2010
FI26.05.2010
RO26.05.2010
SE26.05.2010
SI26.05.2010
SK26.05.2010
GR27.08.2010
PT27.09.2010
Former [2011/08]AT26.05.2010
CY26.05.2010
DK26.05.2010
EE26.05.2010
FI26.05.2010
SE26.05.2010
SI26.05.2010
GR27.08.2010
PT27.09.2010
Former [2011/07]AT26.05.2010
CY26.05.2010
DK26.05.2010
FI26.05.2010
SE26.05.2010
SI26.05.2010
GR27.08.2010
Former [2011/05]AT26.05.2010
CY26.05.2010
FI26.05.2010
SE26.05.2010
SI26.05.2010
GR27.08.2010
Former [2011/01]AT26.05.2010
FI26.05.2010
SE26.05.2010
SI26.05.2010
GR27.08.2010
Former [2010/52]AT26.05.2010
FI26.05.2010
SE26.05.2010
SI26.05.2010
Former [2010/50]AT26.05.2010
FI26.05.2010
SE26.05.2010
Former [2010/49]AT26.05.2010
SE26.05.2010
Documents cited:Search[A]JPH08322914  ;
 [A]US4010374  (RAMLER WARREN J) [A] 3,4,11,12* column 3, line 8 - line 64 *;
 [XDA]US4983849  (THOMPSON CHESTER C [US], et al) [XD] 1,2,5,9,10 * column 5, line 18 - line 43; figures 6,7 * [A] 4;
 [XDA]WO9824484  (HOSPAL AG [CH], et al) [XD] 1,2,5,8-10 * page 4, line 5 - page 5, line 2 * * page 6, line 17 - page 7, line 24; figure 1 * [A] 13;
 [X]US5809739  (ENO KENNETH M [US]) [X] 1,9,10 * column 3, line 55 - column 4, line 21; figure 2 *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19970430), vol. 1997, no. 04, & JP08322914 A 19961210 (IWASAKI ELECTRIC CO LTD) [A] 3,4,11,12 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.