blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability

2022.02.11

More...
blank News flashes

Italy joins the Federated Register

Click here for more information on the Federated Register.

2025-06-12

More...
blank Related links

Release notes
European Patent Register Assistant
European Patent Register User Manual
European Patent Register – pocket guide
FAQ - European Patent Register
Federated Register (Flyer)
Global Dossier (Flyer)
Register events
Deep link coverage
Federated Register content
The Patent Information Tour
Fair use charter

Extract from the Register of European Patents

EP About this file: EP1481287

EP1481287 - Prevention and removal of contamination on optical elements [Right-click to bookmark this link]
Former [2004/49]DEVICE, EUV-LITHOGRAPHIC DEVICE AND METHOD FOR PREVENTING AND CLEANING CONTAMINATION ON OPTICAL ELEMENTS
[2007/41]
StatusThe application is deemed to be withdrawn
Status updated on  12.03.2010
Database last updated on 21.03.2026
Most recent event   Tooltip12.03.2010Application deemed to be withdrawnpublished on 14.04.2010  [2010/15]
Applicant(s)For all designated states
Carl Zeiss SMT AG
Rudolf-Eber-Strasse 2
73447 Oberkochen / DE
[2007/36]
Former [2004/49]For all designated states
Carl Zeiss SMT AG
Carl-Zeiss-Strasse 22
73447 Oberkochen / DE
Inventor(s)01 / WEDOWSKI, Marco
Otto-Schott-Str. 15
73431 Aalen / DE
02 / STIETZ, Frank
Isaah-Hess-Weg 4/1
73466 Lauchheim / DE
03 / MERTENS, Bas
Snelliusstraat 90
NL-2517 RK Den Haag / NL
04 / KLEIN, Roman
Hackerstrasse 10
12163 Berlin / DE
 [2005/01]
Former [2004/49]01 / WEDOWSKI, Marco
Otto-Schott-Str. 15
73431 Aalen / DE
02 / STIETZ, Frank
Isaah-Hess-Weg 4/1
73466 Lauchheim / DE
03 / MERTENS, Bas
Snelliusstraat 90
NL-2517 RK Den Haag / NL
04 / KLEIN, Roman
Feuerbachstr. 18
12163 Berlin / DE
Representative(s)Werner, Anne-Estelle, et al
Patentanwaltskanzlei Mendelstrasse 11
48149 Münster / DE
[2007/39]
Former [2004/49]Fuchs Mehler Weiss & Fritzsche
Patentanwälte Söhnleinstrasse 8
65201 Wiesbaden / DE
Application number, filing date03711941.907.03.2003
[2004/49]
WO2003EP02372
Priority number, dateDE200210949307.03.2002         Original published format: DE 10209493
[2004/49]
Filing languageDE
Procedural languageDE
PublicationType: A2 Application without search report
No.:WO03075098
Date:12.09.2003
Language:DE
[2003/37]
Type: A2 Application without search report 
No.:EP1481287
Date:01.12.2004
Language:DE
The application published by WIPO in one of the EPO official languages on 12.09.2003 takes the place of the publication of the European patent application.
[2004/49]
Search report(s)International search report - published on:EP19.02.2004
ClassificationIPC:G03F7/20, B08B7/00
[2004/49]
CPC:
G03F7/70925 (EP,US); G03F7/20 (KR); B08B7/0035 (EP,US);
G03F7/70916 (EP,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   RO,   SE,   SI,   SK,   TR [2004/49]
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
TitleGerman:Vermeidung und Entfernung von Kontamination auf optischen Elementen[2007/41]
English:Prevention and removal of contamination on optical elements[2007/41]
French:Prévention et enlèvement de contamination sur des éléments optiques[2007/41]
Former [2004/49]VORRICHTUNG, EUV-LITHOGRAPHIEGERÄT UND VERFAHREN ZUR VERMEIDUNG UND REINIGUNG VON KONTAMINATION AUF OPTISCHEN ELEMENTEN
Former [2004/49]DEVICE, EUV-LITHOGRAPHIC DEVICE AND METHOD FOR PREVENTING AND CLEANING CONTAMINATION ON OPTICAL ELEMENTS
Former [2004/49]DISPOSITIF, APPAREIL DE LITHOGRAPHIE EUV ET PROCEDE PERMETTANT D'EVITER ET DE NETTOYER LA CONTAMINATION SUR DES ELEMENTS OPTIQUES
Entry into regional phase20.08.2004National basic fee paid 
20.08.2004Designation fee(s) paid 
20.08.2004Examination fee paid 
Examination procedure20.08.2004Examination requested  [2004/49]
02.02.2005Despatch of a communication from the examining division (Time limit: M04)
28.04.2005Reply to a communication from the examining division
25.09.2007Communication of intention to grant the patent
24.01.2008Fee for grant paid
24.01.2008Fee for publishing/printing paid
01.10.2009Application deemed to be withdrawn, date of legal effect  [2010/15]
13.11.2009Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2010/15]
Fees paidRenewal fee
08.03.2005Renewal fee patent year 03
15.03.2006Renewal fee patent year 04
14.03.2007Renewal fee patent year 05
13.03.2008Renewal fee patent year 06
Penalty fee
Additional fee for renewal fee
31.03.200907   M06   Not yet paid
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search[X] JP2000346817  
 [X]   PATENT ABSTRACTS OF JAPAN vol. 2000, no. 15 6 April 2001 (2001-04-06) [X] 14-20 * the whole document *
 [A]   MEILING H ET AL: "Prevention of MoSi multilayer reflection loss in EUVL tools", SOFT X-RAY AND EUV IMAGING SYSTEMS II, SAN DIEGO, CA, USA, 31 JULY-1 AUG. 2001, vol. 4506, Proceedings of the SPIE - The International Society for Optical Engineering, 2001, SPIE-Int. Soc. Opt. Eng, USA, pages 93 - 104, XP008025582, ISSN: 0277-786X [A] 1,14,15,21 * abstract *

DOI:   http://dx.doi.org/10.1117/12.450949
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.