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Extract from the Register of European Patents

EP About this file: EP1493722

EP1493722 - SILICON CARBIDE BASED POROUS MATERIAL AND METHOD FOR PRODUCTION THEREOF [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  20.03.2009
Database last updated on 11.09.2024
Most recent event   Tooltip20.03.2009No opposition filed within time limitpublished on 22.04.2009  [2009/17]
Applicant(s)For all designated states
NGK Insulators, Ltd.
2-56, Suda-cho, Mizuho-ku
Nagoya-shi, Aichi 467-8530 / JP
[N/P]
Former [2008/20]For all designated states
NGK INSULATORS, LTD.
2-56, Suda-cho, Mizuho-ku
Nagoya-shi, Aichi 467-8530 / JP
Former [2005/01]For all designated states
NGK INSULATORS, LTD.
2-56, Suda-cho, Mizuho-ku
Nagoya-shi Aichi 467-8530 / JP
Inventor(s)01 / Tabuchi, Yuuichirou, NGK INSULATORS, LTD.
2-56 Suda-cho, Mizuho-ku
Nagoya-shi, Aichi 467-8530 / JP
02 / Furukawa, Masahiro, NGK INSULATORS, LTD.
2-56 Suda-cho, Mizuho-ku
Nagoya-shi, Aichi 467-8530 / JP
03 / Morimoto, Kenji, NGK INSULATORS, LTD.
2-56 Suda-cho, Mizuho-ku
Nagoya-shi, Aichi 467-8530 / JP
04 / Kawasaki, Shinji, NGK INSULATORS, LTD.
2-56 Suda-cho, Mizuho-ku
Nagoya-shi, Aichi 467-8530 / JP
 [2005/01]
Representative(s)Paget, Hugh Charles Edward, et al
Mewburn Ellis LLP
City Tower
40 Basinghall Street
London EC2V 5DE / GB
[N/P]
Former [2005/01]Paget, Hugh Charles Edward, et al
Mewburn Ellis LLP York House 23 Kingsway
London WC2B 6HP / GB
Application number, filing date03715654.431.03.2003
[2005/01]
WO2003JP04086
Priority number, dateJP2002009726029.03.2002         Original published format: JP 2002097260
[2005/01]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO03082770
Date:09.10.2003
Language:EN
[2003/41]
Type: A1 Application with search report 
No.:EP1493722
Date:05.01.2005
Language:EN
The application published by WIPO in one of the EPO official languages on 09.10.2003 takes the place of the publication of the European patent application.
[2005/01]
Type: B1 Patent specification 
No.:EP1493722
Date:14.05.2008
Language:EN
[2008/20]
Search report(s)International search report - published on:JP09.10.2003
(Supplementary) European search report - dispatched on:EP11.01.2006
ClassificationIPC:C04B35/565, C04B38/08, B01J35/04, F01N3/022, B01D39/20, B01D53/94
[2006/08]
CPC:
C04B35/565 (EP,KR,US); B01D39/2075 (EP,US); B01D53/94 (EP,US);
C04B35/6263 (EP,US); C04B38/02 (EP,US); C04B38/061 (EP,US);
F01N3/0222 (EP,US); F01N3/2803 (EP,US); B01J35/56 (EP,US);
C04B2111/00793 (EP,US); C04B2111/2084 (EP,US); C04B2235/3206 (EP,US);
C04B2235/3213 (EP,US); C04B2235/3217 (EP,US); C04B2235/3418 (EP,US);
C04B2235/3436 (EP,US); C04B2235/3463 (EP,US); C04B2235/3481 (EP,US);
C04B2235/3826 (EP,US); C04B2235/428 (EP,US); C04B2235/6021 (EP,US);
C04B2235/668 (EP,US); C04B2235/77 (EP,US); C04B2235/80 (EP,US);
C04B2235/96 (EP,US); C04B2235/9684 (EP,US); F01N2330/00 (EP,US);
Y02T10/12 (EP,US); Y10T428/24149 (EP,US); Y10T428/249953 (EP,US);
Y10T428/249969 (EP,US); Y10T428/249985 (EP,US); Y10T428/249986 (EP,US) (-)
C-Set:
C04B38/02, C04B35/565 (US,EP);
C04B38/061, C04B35/565, C04B38/0006, C04B38/0051 (EP,US)
Former IPC [2005/01]C04B35/565, C04B38/08
Designated contracting statesDE,   FR [2008/20]
Former [2005/01]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  RO,  SE,  SI,  SK,  TR 
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
TitleGerman:AUF SILICIUMCARBID BASIERENDES PORÖSES MATERIAL UND HERSTELLUNGSVERFAHREN DAFÜR[2005/01]
English:SILICON CARBIDE BASED POROUS MATERIAL AND METHOD FOR PRODUCTION THEREOF[2005/01]
French:MATIERE POREUSE A BASE DE CARBURE DE SILICIUM ET SON PROCEDE DE PRODUCTION[2005/01]
Entry into regional phase01.10.2004Translation filed 
15.10.2004National basic fee paid 
15.10.2004Search fee paid 
15.10.2004Designation fee(s) paid 
15.10.2004Examination fee paid 
Examination procedure15.10.2004Examination requested  [2005/01]
18.05.2006Despatch of a communication from the examining division (Time limit: M04)
27.09.2006Reply to a communication from the examining division
27.08.2007Communication of intention to grant the patent
11.02.2008Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time
27.03.2008Fee for grant paid
27.03.2008Fee for publishing/printing paid
Opposition(s)17.02.2009No opposition filed within time limit [2009/17]
Request for further processing for:The application is deemed to be withdrawn due to failure to fulfill actions required for granting the patent
27.03.2008Request for further processing filed
27.03.2008Full payment received (date of receipt of payment)
Request granted
11.04.2008Decision despatched
Fees paidRenewal fee
22.03.2005Renewal fee patent year 03
22.03.2006Renewal fee patent year 04
22.03.2007Renewal fee patent year 05
14.03.2008Renewal fee patent year 06
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]JPH11253722  ;
 [Y]US4777152  (TSUKADA KIYOTAKA [JP]) [Y] 1-9 * column 1, line 10 - line 33 * * column 2, line 28 - line 38 * * column 3, line 36 - line 62 * * column 5, line 65 - column 6, line 2 * * column 8, line 47 - column 9, line 28 * * examples 7,8 * * claim 4 *;
 [A]EP0322998  (IBIDEN CO LTD [JP]) [A] 1-9 * page 3, line 1 - line 25 * * page 4, line 11 - line 12 * * example 1 * * claims 4,9 *;
 [A]EP0575038  (MATSUSHITA ELECTRONICS CORP [JP]) [A] 1-9 * page 2, line 35 - line 49 * * page 4, line 7 - line 35 * * claim - *;
 [A]US5326512  (STILLWAGON THOMAS L [US], et al) [A] 10-17 * abstract *;
 [Y]EP1070687  (INST FRANCAIS DU PETROLE [FR], et al) [Y] 1-9 * abstract * * claim - *;
 [PA]WO02062726  (NGK INSULATORS LTD [JP], et al)[PA] 1-17;
 [E]EP1364930  (NGK INSULATORS LTD [JP]) [E] 1-17 * paragraphs [0015] - [0020] - [0027] , [0032] , [0034] - [0042] - [0046] * * table 1 * * claims 1,13 *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19991222), vol. 1999, no. 14, & JP11253722 A 19990921 (NGK INSULATORS LTD; NGK ADRECH KK) [A] 1-9 * abstract * * cf. also Japanese application: * * example - *
International search[A]JP2001014673  (FUJI PHOTO FILM CO LTD);
 [A]WO0153233  (NGK INSULATORS LTD [JP], et al);
 [A]JP2001206785  (ASAHI GLASS CO LTD);
 [AP]JP2002154882  (NGK INSULATORS LTD);
 [AP]JP2002356384  (ASAHI GLASS CO LTD)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.