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Extract from the Register of European Patents

EP About this file: EP1525333

EP1525333 - METHOD AND APPARATUS FOR PLASMA IMPLANTATION WITHOUT DEPOSITION OF A LAYER OF BYPRODUCT [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  03.04.2009
Database last updated on 26.07.2024
Most recent event   Tooltip03.04.2009Application deemed to be withdrawnpublished on 06.05.2009  [2009/19]
Applicant(s)For all designated states
Varian Semiconductor Equipment Associates Inc.
35 Dory Road
Gloucester, MA 01930 / US
[2005/17]
Inventor(s)01 / WALTHER, Steven, R.
83 Morton Street
Andover, MA 01810 / US
02 / RADOVANOV, Svetlana, B.
218 Pleasant Street
Marblehead, MA 01945 / US
 [2005/17]
Representative(s)Beck, Simon Antony, et al
Withers & Rogers LLP
4 More London Riverside
London SE1 2AU / GB
[N/P]
Former [2005/17]Beck, Simon Antony, et al
Withers & Rogers, Goldings House, 2 Hays Lane
London SE1 2HW / GB
Application number, filing date03759186.401.08.2003
[2005/17]
WO2003US24158
Priority number, dateUS20020400560P02.08.2002         Original published format: US 400560 P
[2005/17]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO2004013371
Date:12.02.2004
Language:EN
[2004/07]
Type: A2 Application without search report 
No.:EP1525333
Date:27.04.2005
Language:EN
The application published by WIPO in one of the EPO official languages on 12.02.2004 takes the place of the publication of the European patent application.
[2005/17]
Search report(s)International search report - published on:EP21.10.2004
ClassificationIPC:C23C8/36, C23C14/48, H01J37/32, H01L21/223
[2005/17]
CPC:
C01B21/083 (KR); C23C14/0057 (KR); C23C14/0063 (KR);
C23C14/0068 (KR); C23C14/48 (EP,KR); C23C14/564 (EP,KR);
H01J37/32412 (EP,KR) (-)
Designated contracting statesDE,   FR,   GB [2005/47]
Former [2005/17]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:VERFAHREN UND VORRICHTUNG ZUR PLASMAIMPLANTIERUNG OHNE ABSCHEIDUNG EINER SCHICHT VON NEBENPRODUKTEN[2005/17]
English:METHOD AND APPARATUS FOR PLASMA IMPLANTATION WITHOUT DEPOSITION OF A LAYER OF BYPRODUCT[2005/17]
French:ENLEVEMENT PAR PULVERISATION CATHODIQUE AU GAZ DE DILUTION DE COUCHES SUPERFICIELLES DEPOSEES EN PHASE VAPEUR ACTIVEE AU PLASMA[2005/17]
Entry into regional phase11.02.2005National basic fee paid 
11.02.2005Designation fee(s) paid 
11.02.2005Examination fee paid 
Examination procedure11.02.2005Examination requested  [2005/17]
31.03.2005Amendment by applicant (claims and/or description)
30.04.2008Despatch of a communication from the examining division (Time limit: M06)
11.11.2008Application deemed to be withdrawn, date of legal effect  [2009/19]
15.12.2008Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2009/19]
Fees paidRenewal fee
19.08.2005Renewal fee patent year 03
29.08.2006Renewal fee patent year 04
29.08.2007Renewal fee patent year 05
25.08.2008Renewal fee patent year 06
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Cited inInternational search[X]JPH11354068  ;
 [X]GB2336603  (METALTECH LIMITED [GB]) [X] 1,4,6,7,9 * page 9; example . * * claim - *;
 [X]JPH0992804  ;
 [X]US5571576  (QIAN LINGQIAN [US], et al) [X] 1,4,6,10,17-21,24 * figures 1,2; claim - *;
 [X]EP1073087  (NISSIN ELECTRIC CO LTD [JP]) [X] 1,4,6,10,11,20,21,24 * paragraphs [0032] - [0040] *;
 [X]US4496843  (KIRITA KEI [JP], et al) [X] 1,3,10,12-16,20,21,24 * column 2, line 27 - column 4, line 48 *;
 [AX]US2001042827  (FANG ZIWEI [US], et al) [A] 1-16 * the whole document * [X] 17-21,24;
 [X]EP1156511  (APPLIED MATERIALS INC [US]) [X] 20,25 * figure 11 *
 [X]  - PATENT ABSTRACTS OF JAPAN, (20000330), vol. 2000, no. 03, & JP11354068 A 19991224 (SEIKO EPSON CORP) [X] 1-4,6-9,11,20,21,24 * abstract *
 [X]  - PATENT ABSTRACTS OF JAPAN, (19970829), vol. 1997, no. 08, & JP09092804 A 19970404 (NEC CORP;NISSIN ELECTRIC CO LTD) [X] 1,4,6,20,21,24 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.