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Extract from the Register of European Patents

EP About this file: EP1551886

EP1551886 - FLUORINATED POLYMERS USEFUL AS PHOTORESISTS, AND PROCESSES FOR MICROLITHOGRAPHY [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  17.07.2009
Database last updated on 07.10.2024
Most recent event   Tooltip30.09.2011Lapse of the patent in a contracting state
New state(s): CY, TR		published on 02.11.2011  [2011/44]
Applicant(s)For all designated states
E. I. du Pont de Nemours and Company
1007 Market Street
Wilmington, DE 19898 / US
[N/P]
Former [2008/30]For all designated states
E.I. DU PONT DE NEMOURS AND COMPANY
1007 Market Street
Wilmington DE 19898 / US
Former [2005/28]For all designated states
E.I. du Pont de Nemours and Company
1007 Market Street
Wilmington, DE 19898 / US
Inventor(s)01 / FEIRING, Andrew, Edward
7 Buckridge Drive
Wilmington, DE 19807 / US
02 / SCHADT, Frank, L., III
2407 Delaware Avenue
Wilmington, DE 19806 / US
03 / FARNHAM, William, Brown
123 Dewberry Drive
Hockessin, DE 19707 / US
04 / FELDMAN, Jerald
4403 Channing Road
Wilmington, DE 19802 / US
 [2005/28]
Representative(s)Towler, Philip Dean
Dehns
St Bride's House
10 Salisbury Square
London EC4Y 8JD / GB
[N/P]
Former [2008/33]Towler, Philip Dean
Frank B. Dehn & Co. St Bride's House 10 Salisbury Square
London EC4Y 8JD / GB
Former [2005/28]Towler, Philip Dean
Frank B. Dehn & Co. 179 Queen Victoria Street
London EC4V 4EL / GB
Application number, filing date03788676.919.08.2003
WO2003US26088
Priority number, dateUS20020404374P19.08.2002         Original published format: US 404374 P
[2005/28]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2004016664
Date:26.02.2004
Language:EN
[2004/09]
Type: A1 Application with search report 
No.:EP1551886
Date:13.07.2005
Language:EN
The application published by WIPO in one of the EPO official languages on 26.02.2004 takes the place of the publication of the European patent application.
[2005/28]
Type: B1 Patent specification 
No.:EP1551886
Date:10.09.2008
Language:EN
[2008/37]
Search report(s)International search report - published on:US26.02.2004
(Supplementary) European search report - dispatched on:EP16.10.2007
ClassificationIPC:G03C1/73
[2007/46]
CPC:
C08F232/00 (EP,US); C08F14/18 (KR); C08F214/18 (EP,US);
C08F214/26 (EP,US); C08F220/24 (EP,US); C08F220/26 (EP,US);
C08F232/08 (EP,US); C08F8/12 (EP,US); G03F7/0046 (EP,US);
G03F7/0395 (EP,US); C08F2800/20 (EP,US) (-)
C-Set:
C08F8/12, C08F232/08 (EP,US)
Former IPC [2005/28]C08F14/18, G03C1/73
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   RO,   SE,   SI,   SK,   TR [2005/28]
Former [N/P]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  RO,  SE,  SI,  SK,  TR 
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
TitleGerman:FLUORIERTE POLYMERE, DIE ZUR VERWENDUNG ALS PHOTORESISTS GEEIGNET SIND, UND MIKROLITHOGRAPHIEVERFAHREN[2005/28]
English:FLUORINATED POLYMERS USEFUL AS PHOTORESISTS, AND PROCESSES FOR MICROLITHOGRAPHY[2005/28]
French:Polymères fluorés utiles en tant que résines photorésistantes, et procédés de microlithographie[2008/14]
Former [2005/28]POLYMERES FLUORES UTILES EN TANT QUE PHOTORESINES, ET PROCEDES DE MICROLITHOGRAPHIE
Entry into regional phase10.02.2005National basic fee paid 
10.02.2005Search fee paid 
10.02.2005Designation fee(s) paid 
10.02.2005Examination fee paid 
Examination procedure17.03.2004Request for preliminary examination filed
International Preliminary Examining Authority: US
10.02.2005Examination requested  [2005/28]
26.03.2008Communication of intention to grant the patent
25.07.2008Fee for grant paid
25.07.2008Fee for publishing/printing paid
Opposition(s)11.06.2009No opposition filed within time limit [2009/34]
Fees paidRenewal fee
10.02.2005Renewal fee patent year 03
14.08.2006Renewal fee patent year 04
14.08.2007Renewal fee patent year 05
31.03.2008Renewal fee patent year 06
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT10.09.2008
BE10.09.2008
CY10.09.2008
CZ10.09.2008
DK10.09.2008
EE10.09.2008
FI10.09.2008
IT10.09.2008
NL10.09.2008
RO10.09.2008
SI10.09.2008
SK10.09.2008
TR10.09.2008
BG10.12.2008
SE10.12.2008
GR11.12.2008
ES21.12.2008
PT10.02.2009
HU11.03.2009
[2011/43]
Former [2011/31]AT10.09.2008
BE10.09.2008
CZ10.09.2008
DK10.09.2008
EE10.09.2008
FI10.09.2008
IT10.09.2008
NL10.09.2008
RO10.09.2008
SI10.09.2008
SK10.09.2008
BG10.12.2008
SE10.12.2008
GR11.12.2008
ES21.12.2008
PT10.02.2009
HU11.03.2009
Former [2010/49]AT10.09.2008
BE10.09.2008
CZ10.09.2008
DK10.09.2008
EE10.09.2008
FI10.09.2008
IT10.09.2008
NL10.09.2008
RO10.09.2008
SI10.09.2008
SK10.09.2008
BG10.12.2008
SE10.12.2008
GR11.12.2008
ES21.12.2008
PT10.02.2009
Former [2010/09]AT10.09.2008
BE10.09.2008
CZ10.09.2008
DK10.09.2008
EE10.09.2008
FI10.09.2008
IT10.09.2008
NL10.09.2008
RO10.09.2008
SI10.09.2008
SK10.09.2008
BG10.12.2008
SE10.12.2008
ES21.12.2008
PT10.02.2009
Former [2009/40]AT10.09.2008
BE10.09.2008
CZ10.09.2008
DK10.09.2008
EE10.09.2008
FI10.09.2008
IT10.09.2008
NL10.09.2008
RO10.09.2008
SI10.09.2008
SK10.09.2008
BG10.12.2008
ES21.12.2008
PT10.02.2009
Former [2009/36]AT10.09.2008
BE10.09.2008
CZ10.09.2008
DK10.09.2008
EE10.09.2008
FI10.09.2008
NL10.09.2008
RO10.09.2008
SI10.09.2008
SK10.09.2008
BG10.12.2008
ES21.12.2008
PT10.02.2009
Former [2009/35]AT10.09.2008
BE10.09.2008
CZ10.09.2008
DK10.09.2008
FI10.09.2008
NL10.09.2008
RO10.09.2008
SI10.09.2008
SK10.09.2008
BG10.12.2008
ES21.12.2008
PT10.02.2009
Former [2009/26]AT10.09.2008
BE10.09.2008
CZ10.09.2008
FI10.09.2008
NL10.09.2008
RO10.09.2008
SI10.09.2008
SK10.09.2008
BG10.12.2008
ES21.12.2008
PT10.02.2009
Former [2009/24]AT10.09.2008
BE10.09.2008
CZ10.09.2008
FI10.09.2008
SI10.09.2008
SK10.09.2008
BG10.12.2008
ES21.12.2008
Former [2009/23]AT10.09.2008
BE10.09.2008
FI10.09.2008
SI10.09.2008
BG10.12.2008
ES21.12.2008
Former [2009/20]AT10.09.2008
BE10.09.2008
FI10.09.2008
SI10.09.2008
ES21.12.2008
Former [2009/19]AT10.09.2008
BE10.09.2008
FI10.09.2008
SI10.09.2008
Former [2009/15]AT10.09.2008
FI10.09.2008
SI10.09.2008
Documents cited:Search[A]US6387589  (KOH CHA WON [KR], et al) [A] 1-28 * the whole document *;
 [PA]WO02093263  (CLARIANT INT LTD [CH], et al) [PA] 1-28 * page 8, lines 1,2; claims 1,11 ** page 4, lines 1-7 *
International search[X]US5229473  (KOBO MOTONOBU [JP], et al);
 [YP]US6593058  (FEIRING ANDREW EDWARD [US], et al)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.