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Extract from the Register of European Patents

EP About this file: EP1551066

EP1551066 - MATERIAL WITH PATTERN SURFACE FOR USE AS TEMPLATE AND PROCESS FOR PRODUCING THE SAME [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  28.10.2011
Database last updated on 15.06.2024
Most recent event   Tooltip28.10.2011Application deemed to be withdrawnpublished on 30.11.2011  [2011/48]
Applicant(s)For all designated states
DAIKIN INDUSTRIES, LTD.
Umeda Center Building, 4-12, Nakazaki-nishi 2-chome, Kita-ku
Osaka-shi, Osaka 530-8323 / JP
[N/P]
Former [2005/27]For all designated states
Daikin Industries, Ltd.
Umeda Center Building, 4-12, Nakazaki-nishi 2-chome, Kita-ku
Osaka-shi, Osaka 530-8323 / JP
Inventor(s)01 / Morita, Masamichi
1-12-11 Tsutsujigaoka-kita
Sanda-shi, Hyogo 669-1348 / JP
02 / Otsuka, Hideyuki
3-3-3-403 Hakomatsu, Higashi-ku
Fukuoka-shi, Fukuoka 812-0061 / JP
03 / Takahara, Atsushi
5-19-8 Nanakuma, Jonan-ku
Fukuoka-shi, Fukuoka 814-0133 / JP
04 / Yamamoto, Ikuo, Yodogawa Works of DAIKIN IND. LTD.
1-1 Nishihitotsuya
Settsu-shi, Osaka 566-8585 / JP
05 / Itami, Yasuo, Yodogawa Works of DAIKIN IND. LTD.
1-1 Nishihitotsuya
Settsu-shi, Osaka 566-8585 / JP
06 / Aoyama, Hirokazu, Yodogawa Works
DAIKIN IND. LTD., 1-1 Nishihitotsuya
Settsu-shi, Osaka 566-8585 / JP
 [2005/27]
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastrasse 30
81925 München / DE
[N/P]
Former [2005/27]HOFFMANN - EITLE
Patent- und Rechtsanwälte Arabellastrasse 4
81925 München / DE
Application number, filing date03797648.718.09.2003
[2005/27]
WO2003JP11876
Priority number, dateJP2002027314419.09.2002         Original published format: JP 2002273144
[2005/27]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2004027889
Date:01.04.2004
Language:EN
[2004/14]
Type: A1 Application with search report 
No.:EP1551066
Date:06.07.2005
Language:EN
The application published by WIPO in one of the EPO official languages on 01.04.2004 takes the place of the publication of the European patent application.
[2005/27]
Search report(s)International search report - published on:JP01.04.2004
(Supplementary) European search report - dispatched on:EP11.12.2008
ClassificationIPC:H01L51/00, G03F7/004, G03F7/075
[2009/03]
CPC:
B82Y10/00 (EP,US); G03F7/0002 (EP,US); B82Y40/00 (EP,US);
H10K71/191 (EP,US); Y10T428/24917 (EP,US); Y10T428/24926 (EP,US)
Former IPC [2005/27]H01L51/00
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   RO,   SE,   SI,   SK,   TR [2005/27]
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
TitleGerman:MATERIAL MIT STRUKTUROBERFLÄCHE ZUR VERWENDUNG ALS VORLAGE UND PROZESS SEINER HERSTELLUNG[2005/27]
English:MATERIAL WITH PATTERN SURFACE FOR USE AS TEMPLATE AND PROCESS FOR PRODUCING THE SAME[2005/27]
French:MATERIAU A SURFACE DE STRUCTURE EN TANT QUE GABARIT ET PROCEDE DE PRODUCTION ASSOCIE[2005/27]
Entry into regional phase18.04.2005Translation filed 
18.04.2005National basic fee paid 
18.04.2005Search fee paid 
18.04.2005Designation fee(s) paid 
18.04.2005Examination fee paid 
Examination procedure18.04.2005Examination requested  [2005/27]
14.01.2011Despatch of a communication from the examining division (Time limit: M04)
25.05.2011Application deemed to be withdrawn, date of legal effect  [2011/48]
01.07.2011Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2011/48]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  14.01.2011
Fees paidRenewal fee
26.09.2005Renewal fee patent year 03
21.09.2006Renewal fee patent year 04
24.09.2007Renewal fee patent year 05
27.03.2008Renewal fee patent year 06
26.03.2009Renewal fee patent year 07
22.09.2010Renewal fee patent year 08
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[Y]US2002081520  (SOORIYAKUMARAN RATNAM [US], et al) [Y] 1,9,10,12-14 * the whole document *;
 [X]JP2002261048  (SEIKO EPSON CORP) [X] 1-14 * see passages of US-Doc *;
 US2003024103  [ ] (KIGUCHI HIROSHI [JP], et al) [ ] * paragraphs [0046] , [0050] *;
 [Y]  - SUGIMURA H ET AL, "MICROPATTERNING OF ALKYL-AND FLUOROALKYLSILANE SELF-ASSEMBLED MONOLAYERS USING VACUUM ULTRAVIOLET LIGHT", LANGMUIR, ACS, WASHINGTON, DC, US, (20000208), vol. 16, no. 3, ISSN 0743-7463, pages 885 - 888, XP000929923 [Y] 1-14 * the whole document *

DOI:   http://dx.doi.org/10.1021/la990953e
 [Y]  - JEON N L ET AL, "PATTERNED SELF-ASSEMBLED MONOLAYERS FORMED BY MICROCONTACT PRINTING DIRECT SELECTIVE METALIZATION BY CHEMICAL VAPOR DEPOSITION ON PLANAR AND NONPLANAR SUBSTRATES", LANGMUIR, ACS, WASHINGTON, DC, US, (19950808), vol. 11, ISSN 0743-7463, pages 3024 - 3026, XP001088596 [Y] 1-14 * the whole document *

DOI:   http://dx.doi.org/10.1021/la00008a029
 [Y]  - NOO LI JEON ET AL, "A MONOLAYER-BASED LIFT-OFF PROCESS FOR PATTERNING CHEMICAL VAPOR DEPOSITION COPPER THIN FILMS", LANGMUIR, ACS, WASHINGTON, DC, US, (19961030), vol. 12, ISSN 0743-7463, pages 5350 - 5355, XP001088595 [Y] 1-14 * the whole document *

DOI:   http://dx.doi.org/10.1021/la960377b
 [Y]  - RIEKE P C ET AL, "SPATIALLY RESOLVED MINERAL DEPOSITION ON PATTERNED SELF-ASSEMBLED MONOLAYERS", LANGMUIR, ACS, WASHINGTON, DC, US, (19940101), vol. 10, ISSN 0743-7463, pages 619 - 622, XP009071465 [Y] 1-14 * page 620, column 2, line 15 - line 22 * * page 619, column 2, line 12 - line 23 *

DOI:   http://dx.doi.org/10.1021/la00015a003
 [A]  - HOFFMANN P W ET AL, "Vapor phase self-assembly of fluorinated monolayers on silicon and germanium oxide", LANGMUIR, ACS, WASHINGTON, DC, US, (19970101), vol. 13, ISSN 0743-7463, pages 1877 - 1880, XP002272050

DOI:   http://dx.doi.org/10.1021/la961091+
 [A]  - ST JOHN P M ET AL, "MONOLAYERS OF FLUORINATED SILANES AS ELECTRON-BEAM RESISTS", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AVS / AIP, MELVILLE, NEW YORK, NY, US, (19960101), vol. 14, no. 1, ISSN 1071-1023, pages 69 - 74, XP000558383

DOI:   http://dx.doi.org/10.1116/1.588436
 [A]  - "Low temperature deposition of patterned TiO2 thin films using photopatterned self-assembled monolayers", APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, (19960805), vol. 69, no. 6, ISSN 0003-6951, pages 860 - 862, XP012017157

DOI:   http://dx.doi.org/10.1063/1.117916
International search[X]EP1041652  (LUCENT TECHNOLOGIES INC [US]);
 [X]JP2001284289  (SEIKO EPSON CORP);
 [X]JP2001284288  (SEIKO EPSON CORP);
 [X]JP2001284274  (SEIKO EPSON CORP);
 [X]JP2002023356  (SEIKO EPSON CORP);
 [X]JP2002261048  (SEIKO EPSON CORP);
 [XP]JP2002311592  (SEIKO EPSON CORP);
 [XP]JP2003162058  (SEIKO EPSON CORP)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.