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Extract from the Register of European Patents

EP About this file: EP1475457

EP1475457 - Metal barrier film production apparatus, metal barrier film production method, metal film production method, and metal film production apparatus [Right-click to bookmark this link]
Status	No opposition filed within time limit Status updated on 13.08.2010 Database last updated on 15.06.2024
Most recent event Tooltip	13.08.2010	No opposition filed within time limit	published on 15.09.2010 [2010/37]
Applicant(s)	For all designated states Canon Anelva Corporation 2-5-1, Kurigi Asao-ku Kawasaki-shi Kanagawa 215-8550 / JP
	[N/P]
Former [2008/52]	For all designated states Canon Anelva Corporation 2-5-1 Kurigi Asao-ku Kawasaki-shi Kanagawa 215-8550 / JP
Former [2007/19]	For all designated states PhyzChemix Corporation ATT East 11F 17-22, Akasaka 2-chome Minato-ku Tokyo 107-0052 / JP
Former [2004/46]	For all designated states Mitsubishi Heavy Industries, Ltd. 5-1, Marunouchi 2-chome, Chiyoda-ku Tokyo / JP
Inventor(s)	01 / Sakamoto, Hitoshi, c/o Mitsubishi Heavy Ind., Ltd. 8-1, Sachiura 1-chome, Kanazawa-ku, Yokohama-shi Kanagawa / JP
	02 / Yahata, Naoki, c/o Mitsubishi Heavy Ind., Ltd. 1-1, Arai-cho, Shinhama 2-chome, Takasago-shi Hyogo / JP
	03 / Matsuda, Ryuichi, c/o Mitsubishi Heavy Ind., Ltd. 1-1, Arai-cho, Shinhama 2-chome, Takasago-shi Hyogo / JP
	04 / Ooba, Yoshiyuki, c/o Mitsubishi Heavy Ind., Ltd. 8-1, Sachiura 1-chome, Kanazawa-ku, Yokohama-shi Kanagawa / JP
	05 / Nishimori, Toshihiko, Mitsubishi Heavy Ind., Ltd. 1-1, Arai-cho Shinhama 2-chome, Takasago-shi Hyogo / JP
	[2005/08]
Former [2005/05]	01 / Sakamoto, Hitoshi Mitsubishi Heavy Ind., Ltd. 8-1, Sachiura 1-chome, Kanazawa-ku, Yokohama-shi Kanagawa / JP
	02 / Yahata, Naoki Mitsubishi Heavy Ind., Ltd. 1-1, Arai-cho, Shinhama 2-chome, Takasago-shi Hyogo / JP
	03 / Matsuda, Ryuichi Mitsubishi Heavy Ind., Ltd. 1-1, Arai-cho, Shinhama 2-chome, Takasago-shi Hyogo / JP
	04 / Ooba, Yoshiyuki Mitsubishi Heavy Ind., Ltd. 8-1, Sachiura 1-chome, Kanazawa-ku, Yokohama-shi Kanagawa / JP
	05 / Nishimori, Toshihiko Mitsubishi Heavy Ind., Ltd. 1-1, Arai-cho Shinhama 2-chome, Takasago-shi Hyogo / JP
Representative(s)	Brown, Kenneth Richard, et al R.G.C. Jenkins & Co 26 Caxton Street London SW1H 0RJ / GB
	[N/P]
Former [2009/48]	Brown, Kenneth Richard, et al R.G.C. Jenkins & Co 26 Caxton Street London SW1H 0RJ / GB
Former [2008/49]	Brown, Kenneth Richard, et al R.G.C. Jenkins & Co. 26 Caxton Street London SW1H 0RJ / GB
Former [2004/46]	HOFFMANN - EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE
Application number, filing date	04017496.3	28.10.2002
	[2004/46]
Priority number, date	JP20010348325	14.11.2001 Original published format: JP 2001348325
	JP20020027738	05.02.2002 Original published format: JP 2002027738
	JP20020044289	21.02.2002 Original published format: JP 2002044289
	JP20020044296	21.02.2002 Original published format: JP 2002044296
	[2004/46]
Filing language	EN
Procedural language	EN
Publication	Type:	A2 Application without search report
	No.:	EP1475457
	Date:	10.11.2004
	Language:	EN
	[2004/46]
	Type:	A8 Corrected patent application
	No.:	EP1475457
	Date:	23.02.2005
	[2005/08]
	Type:	A3 Search report
	No.:	EP1475457
	Date:	11.01.2006
	[2006/02]
	Type:	B1 Patent specification
	No.:	EP1475457
	Date:	07.10.2009
	Language:	EN
	[2009/41]
Search report(s)	(Supplementary) European search report - dispatched on:	EP	25.11.2005
Classification	IPC:	C23C14/00, C23C14/02, C23C14/06, C23C14/16, C23C28/02, H01L21/768	[2004/46]
	CPC:	H01L21/7685 (EP,US); H01L21/28 (KR); C23C16/14 (EP,US); C23C16/34 (EP,US); C23C16/40 (EP,US); C23C16/4488 (EP,US); (+) C23C16/452 (EP,US); C23C16/507 (EP,US); C23C16/56 (EP,US); C23C8/36 (EP,US); C23F4/00 (EP,US); H01L21/28556 (EP,US); H01L21/76843 (EP,US); H01L21/76846 (EP,US); H01L21/76856 (EP,US); H01L21/76862 (EP,US); H01L21/76876 (EP,US); H01L21/76888 (EP,US); H01L2221/1078 (EP,US) (-)
Designated contracting states	DE, FR, GB [2006/37]
Former [2004/46]	AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, SK, TR
Title	German:	Vorrichtung und Methode zur Herstellung von Barriereschichten für Metalle sowie Vorrichtung und Methode zur Herstellung von Metallschichten	[2004/46]
	English:	Metal barrier film production apparatus, metal barrier film production method, metal film production method, and metal film production apparatus	[2004/46]
	French:	Appareil et procédé de dépôt pour la formation d'une couche de barrière et appareil et procédé de dépôt pour la formation d'une couche metallique	[2004/46]
Examination procedure	20.04.2006	Examination requested [2006/23]
	27.11.2006	Despatch of a communication from the examining division (Time limit: M06)
	11.05.2007	Reply to a communication from the examining division
	10.02.2009	Communication of intention to grant the patent
	18.06.2009	Fee for grant paid
	18.06.2009	Fee for publishing/printing paid
Parent application(s) Tooltip	EP02024416.6 / EP1312696
Opposition(s)	08.07.2010	No opposition filed within time limit [2010/37]
Fees paid	Renewal fee
	17.08.2004	Renewal fee patent year 03
	24.10.2005	Renewal fee patent year 04
	25.10.2006	Renewal fee patent year 05
	25.10.2007	Renewal fee patent year 06
	23.10.2008	Renewal fee patent year 07
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:	Search	[A]EP0477990 (APPLIED MATERIALS INC [US]) [A] 5-22 * abstract * * column 2, line 39 - line 53 *;
		[A]EP0818559 (APPLIED MATERIALS INC [US]) [A] 5-22 * abstract * * page 4, line 48 - page 5, line 8 * * page 12 - page 22 * * page 23, line 7 - line 9 *;
		[A]EP0837155 (APPLIED MATERIALS INC [US]) [A] 1-22 * column 6, line 48 - line 50 * * column 7, line 10 - column 9, line 58; figure 2 *;
		[A]EP0861921 (APPLIED MATERIALS INC [US]) [A] 1-22 * column 1, line 35 - column 2, line 14; figure 2 * * column 2, line 35 - line 38 *;
		[A]US6040012 (ANDERBOUHR STEPHANIE [FR], et al) [A] 1-22 * the whole document *;
		[A]FR2784694 (COMMISSARIAT ENERGIE ATOMIQUE [FR]) [A] 1-22 * abstract * * page 12, line 19 - page 15, line 32 * * page 33; example 1 *;
		[A]US6238739 (MADAR ROLAND [FR], et al) [A] 1-22 * the whole document *;
		[A]US6294469 (KULKARNI MILIND [US], et al) [A] 5-22 * the whole document *;
		[A]WO0173159 (MITSUBISHI HEAVY IND LTD [JP], et al) [A] 1-22 * abstract *;
		EP1199378 [ ] (MITSUBISHI HEAVY IND LTD [JP]) [ ] * column 20, line 33 - column 21, line 50; figures 2,11,19,20 *;
		[A] - SHEW B-Y ET AL, "Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiAlN films", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, (19970130), vol. 293, no. 1-2, ISSN 0040-6090, pages 212 - 219, XP004112538 [A] 1-22 * page 212 - page 213; figure 1 * DOI: http://dx.doi.org/10.1016/S0040-6090(96)09038-4

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