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EP1643568
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EP About this file: EP1643568
| EP1643568 - Method of forming a layer of a doped semiconductor material and apparatus [Right-click to bookmark this link] | Status | The application has been refused Status updated on 06.11.2009 Database last updated on 30.10.2024 | Most recent event Tooltip | 06.11.2009 | Refusal of application | published on 09.12.2009 [2009/50] | Applicant(s) | For all designated states Novaled AG Tatzberg 49 01307 Dresden / DE | [2006/41] |
| Former [2006/14] | For all designated states Novaled GmbH Tatzberg 49 01307 Dresden / DE | Inventor(s) | 01 /
Werner, Ansgar Altenberger Strasse 20 01277 Dresden / DE | 02 /
Birnstock, Jan Bayreuther Strasse 21 01187 Dresden / DE | 03 /
Murano, Sven Weimarischestrasse 1 01127 Dresden / DE | [2006/14] | Representative(s) | Bittner, Thomas L. Boehmert & Boehmert Anwaltspartnerschaft mbB Pettenkoferstrasse 22 80336 München / DE | [N/P] |
| Former [2006/14] | Bittner, Thomas L. Forrester & Boehmert Pettenkoferstrasse 20-22 80336 München / DE | Application number, filing date | 04023606.9 | 04.10.2004 | [2006/14] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP1643568 | Date: | 05.04.2006 | Language: | DE | [2006/14] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 24.02.2005 | Classification | IPC: | H01L51/40, C23C14/12 | [2006/14] | CPC: |
H10K71/16 (EP,US);
H10K50/11 (EP,US);
H10K71/30 (EP,US);
H10K50/155 (EP,US);
H10K50/165 (EP,US)
| Designated contracting states | DE, GB, NL [2006/50] |
| Former [2006/14] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR | Title | German: | Verfahren zum Herstellen einer Schicht aus einem dotierten Halbleitermaterial und Vorrichtung | [2006/14] | English: | Method of forming a layer of a doped semiconductor material and apparatus | [2006/14] | French: | Procédé de formation d'une couche au materiel semiconducteur dope et appareil | [2006/14] | Examination procedure | 12.05.2005 | Amendment by applicant (claims and/or description) | 12.05.2005 | Examination requested [2006/14] | 28.04.2006 | Despatch of a communication from the examining division (Time limit: M04) | 21.08.2006 | Reply to a communication from the examining division | 06.10.2006 | Loss of particular rights, legal effect: designated state(s) | 23.01.2007 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, FR, GR, HU, IE, IT, LU, MC, PL, PT, RO, SE, SI, SK, TR | 31.05.2007 | Despatch of a communication from the examining division (Time limit: M04) | 21.09.2007 | Reply to a communication from the examining division | 18.06.2009 | Application refused, date of legal effect [2009/50] | 18.06.2009 | Date of oral proceedings | 21.07.2009 | Despatch of communication that the application is refused, reason: substantive examination [2009/50] | 21.07.2009 | Minutes of oral proceedings despatched | Fees paid | Renewal fee | 12.10.2006 | Renewal fee patent year 03 | 12.10.2007 | Renewal fee patent year 04 | 31.03.2008 | Renewal fee patent year 05 | Penalty fee | Penalty fee Rule 85a EPC 1973 | 09.11.2006 | AT M01 Not yet paid | 09.11.2006 | BE M01 Not yet paid | 09.11.2006 | BG M01 Not yet paid | 09.11.2006 | CH M01 Not yet paid | 09.11.2006 | CY M01 Not yet paid | 09.11.2006 | CZ M01 Not yet paid | 09.11.2006 | DK M01 Not yet paid | 09.11.2006 | EE M01 Not yet paid | 09.11.2006 | ES M01 Not yet paid | 09.11.2006 | FI M01 Not yet paid | 09.11.2006 | FR M01 Not yet paid | 09.11.2006 | GR M01 Not yet paid | 09.11.2006 | HU M01 Not yet paid | 09.11.2006 | IE M01 Not yet paid | 09.11.2006 | IT M01 Not yet paid | 09.11.2006 | LU M01 Not yet paid | 09.11.2006 | MC M01 Not yet paid | 09.11.2006 | PL M01 Not yet paid | 09.11.2006 | PT M01 Not yet paid | 09.11.2006 | RO M01 Not yet paid | 09.11.2006 | SE M01 Not yet paid | 09.11.2006 | SI M01 Not yet paid | 09.11.2006 | SK M01 Not yet paid | 09.11.2006 | TR M01 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]EP1017117 (TDK CORP [JP]) [X] 1-3,12,16 * paragraph [0039] *; | [L]EP1132493 (KIDO JUNJI [JP], et al) [L] 2,3* paragraph [0030] *; | [X]EP1156536 (EASTMAN KODAK CO [US]) [X] 1-8,11-13,16 * paragraphs [0014] , [0025] , [0026] *; | [X]US2003180457 (MURAKAMI MASAKAZU [JP], et al) [X] 1 * paragraph [0183] * * page 16, column 2, line 53 - line 55 *; | [X]EP1454736 (EASTMAN KODAK CO [US]) [X] 1,16 * paragraph [0017] * | Examination | EP0961330 | EP1391532 | WO2004070787 | - SHEN Y. ET AL, "Mobility-dependent charge injection into an organic semiconductor", PHYSICAL REVIEW LETTERS, APS, USA, (20010423), vol. 86, no. 17, pages 3867 - 3870 |