blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP1460684

EP1460684 - No-flow underfill process and material therefor [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  24.11.2017
Database last updated on 07.10.2024
FormerThe patent has been granted
Status updated on  16.12.2016
FormerGrant of patent is intended
Status updated on  13.12.2016
Most recent event   Tooltip02.03.2018Lapse of the patent in a contracting state
New state(s): GB
published on 04.04.2018  [2018/14]
Applicant(s)For all designated states
Intel Corporation
2200 Mission College Boulevard
Santa Clara, CA 95054 / US
[2017/03]
Former [2013/17]For all designated states
Intel Corporation
2200 Mission College Boulevard
Santa Clara, CA 95054 / US
Former [2004/39]For all designated states
Delphi Technologies, Inc.
PO Box 5052
Troy, MI 48007 / US
Inventor(s)01 / Workman, Derek B.
10219 Paradise Lane
Noblesville Indiana 46060 / US
02 / Stepniak, Frank
21311 Oakview Drive
Noblesville Indiana 46060 / US
03 / Chaudhuri, Arun K.
13940 Stonemill Circle
Carmel Indiana 46032 / US
04 / Walsh, Matthew R.
1888 West 500 south
Sharpsville Indiana 46068 / US
 [2004/39]
Representative(s)HGF
Fountain Precinct
Balm Green
Sheffield S1 2JA / GB
[N/P]
Former [2014/36]Hufton, David Alan
HGF Limited
Fountain Precinct
Balm Green
Sheffield S1 2JA / GB
Former [2013/14]Harrison Goddard Foote
8th Floor
140 London Wall
London EC2Y 5DN / GB
Former [2013/10]Robert, Vincent
Delphi France SAS
Bât. le Raspail - ZAC Paris Nord 2
22, avenue des Nations
CS 65059 Villepinte
95972 Roissy CDG Cedex / FR
Former [2008/34]Denton, Michael John
Delphi European Headquarters 64 avenue de la Pleine de France Paris Nord II B.P. 65059, Tremblay en France
95972 Roissy Charles de Gaulle Cedex / FR
Former [2004/39]Denton, Michael John
Delphi European Headquarters, 64, avenue de la Plaine de France, Paris Nord II, B.P. 60059, Tremblay en France
95972 Roissy Charles de Gaulle Cédex / FR
Application number, filing date04075615.726.02.2004
[2004/39]
Priority number, dateUS2003039123118.03.2003         Original published format: US 391231
[2004/39]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1460684
Date:22.09.2004
Language:EN
[2004/39]
Type: B1 Patent specification 
No.:EP1460684
Date:18.01.2017
Language:EN
[2017/03]
Search report(s)(Supplementary) European search report - dispatched on:EP28.07.2004
ClassificationIPC:H01L21/56, H01L21/58, H01L21/60, H01L23/29, H01L23/00, C08K5/54, C08L63/00
[2016/32]
CPC:
H01L24/29 (EP,US); H01L21/563 (EP,US); H01L23/293 (EP,US);
H01L24/81 (EP,US); C08K5/54 (EP,US); H01L2224/05568 (EP,US);
H01L2224/05573 (EP,US); H01L2224/056 (EP,US); H01L2224/131 (EP,US);
H01L2224/16225 (EP,US); H01L2224/73204 (EP,US); H01L2224/81191 (EP,US);
H01L2224/81801 (EP,US); H01L2224/83192 (EP,US); H01L24/05 (EP);
H01L2924/01006 (EP,US); H01L2924/01033 (EP,US); H01L2924/0105 (EP,US);
H01L2924/01075 (EP,US); H01L2924/01082 (EP,US); H01L2924/01322 (EP,US);
H01L2924/014 (EP,US); H01L2924/12042 (EP,US) (-)
C-Set:
H01L2224/056, H01L2924/00014 (US,EP);
H01L2224/131, H01L2924/014 (US,EP);
H01L2924/12042, H01L2924/00 (US,EP);
H01L2924/3512, H01L2924/00 (EP,US)
Former IPC [2004/39]H01L21/58, H01L21/56, H01L21/60, C08L63/00, C08K5/54
Designated contracting statesDE,   FR,   GB [2017/03]
Former [2005/23]DE,  FR,  GB 
Former [2004/39]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:No-flow Unterfüllprozess und Material dafür[2004/39]
English:No-flow underfill process and material therefor[2004/39]
French:Procédé et matériau de sous-remplissage sans écoulement[2004/39]
Examination procedure22.03.2005Examination requested  [2005/20]
12.11.2008Despatch of a communication from the examining division (Time limit: M04)
05.03.2009Reply to a communication from the examining division
20.06.2014Despatch of a communication from the examining division (Time limit: M04)
20.10.2014Reply to a communication from the examining division
11.08.2016Communication of intention to grant the patent
12.12.2016Fee for grant paid
12.12.2016Fee for publishing/printing paid
12.12.2016Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  12.11.2008
Opposition(s)19.10.2017No opposition filed within time limit [2017/52]
Fees paidRenewal fee
28.02.2006Renewal fee patent year 03
28.02.2007Renewal fee patent year 04
29.02.2008Renewal fee patent year 05
02.03.2009Renewal fee patent year 06
01.03.2010Renewal fee patent year 07
28.02.2011Renewal fee patent year 08
29.02.2012Renewal fee patent year 09
28.02.2013Renewal fee patent year 10
12.02.2014Renewal fee patent year 11
11.02.2015Renewal fee patent year 12
10.02.2016Renewal fee patent year 13
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipFR20.03.2017
GB18.04.2017
DE01.09.2017
[2018/14]
Former [2018/10]FR20.03.2017
DE01.09.2017
Former [2018/07]FR20.03.2017
Documents cited:Search[XY]JP8199045  ;
 [A]US5904791  (BEARINGER CLAYTON R [US], et al) [A] 1-15 * the whole document *;
 [A]DE19925961  (SIEMENS AG [DE]) [A] 4-7* the whole document *;
 [XY]WO0155243  (HITACHI LTD [JP], et al) [X] 8,12,13 * abstract * [Y] 1-7,9-11;
 [Y]WO0183607  (LOCTITE CORP [US], et al) [Y] 14,15 * page 9, line 3 - line 36 *;
 [Y]FR2812971  (ORIENT SEMICONDUCTOR ELECT LTD [TW]) [Y] 1-7,9-11,14,15 * figures 2A-2D; claim 1 *
 [XY]  - PATENT ABSTRACTS OF JAPAN, (19961226), vol. 1996, no. 12, & JP8199045 A 19960806 (HITACHI LTD) [X] 8,12,13 * abstract * [Y] 1-7,9-11
ExaminationWO9837134
 US6214642
 US2002167077
 US2002173075
 US2002190370
 EP1395101
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.