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Extract from the Register of European Patents

EP About this file: EP1592053

EP1592053 - WIRING FABRICATING METHOD [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  29.06.2012
Database last updated on 23.04.2024
Most recent event   Tooltip29.06.2012No opposition filed within time limitpublished on 01.08.2012  [2012/31]
Applicant(s)For all designated states
Semiconductor Energy Laboratory Co., Ltd.
398 Hase
Atsugi-shi, Kanagawa-ken 243-0036 / JP
[N/P]
Former [2005/44]For all designated states
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
398 Hase
Atsugi-shi, Kanagawa-ken 243-0036 / JP
Inventor(s)01 / YAMAZAKI, Shunpei
C/o Semiconductor Energy Laboratory Co., Ltd.
398, Hase Atsugi-shi Kanagawa 243-0036 / JP
02 / KUWABARA, Hideaki
C/o Semiconductor Energy Laboratory Co., Ltd.
398, Hase Atsugi-shi Kanagawa 243-0036 / JP
 [2005/44]
Representative(s)Grünecker Patent- und Rechtsanwälte PartG mbB
Leopoldstrasse 4
80802 München / DE
[N/P]
Former [2005/44]Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
Maximilianstrasse 58
80538 München / DE
Application number, filing date04706799.630.01.2004
[2005/44]
WO2004JP00897
Priority number, dateJP2003002887805.02.2003         Original published format: JP 2003028878
JP2003002885305.02.2003         Original published format: JP 2003028853
[2005/44]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2004070820
Date:19.08.2004
Language:JA
[2004/34]
Type: A1 Application with search report 
No.:EP1592053
Date:02.11.2005
Language:EN
[2005/44]
Type: B1 Patent specification 
No.:EP1592053
Date:24.08.2011
Language:EN
[2011/34]
Search report(s)International search report - published on:JP19.08.2004
(Supplementary) European search report - dispatched on:EP04.01.2010
ClassificationIPC:H01L21/3213, H01L21/285, H01L21/28, H01L21/336, H01L21/3065, B05D3/04, H05K3/14, G09F9/30
[2005/44]
CPC:
H01L21/32139 (EP,KR,US); H01L21/2855 (EP,KR,US); C23C16/45589 (EP,KR,US);
C23C16/509 (EP,KR,US); C23C16/54 (EP,US); H01L21/02118 (EP);
H01L21/28562 (EP,KR,US); H01L21/312 (US); H01L21/76802 (EP,KR,US);
H01L21/76838 (EP,KR,US); H01L27/124 (EP,KR,US); H01L27/1288 (EP,KR,US);
H10K71/00 (EP,KR,US); H10K71/611 (EP,KR,US); H01J2237/3342 (EP,US);
H10K50/81 (EP,US); H10K59/122 (EP,US); H10K71/231 (EP,US) (-)
Designated contracting statesDE,   FI,   FR,   GB,   NL [2006/21]
Former [2005/44]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  RO,  SE,  SI,  SK,  TR 
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
TitleGerman:VERDRAHTUNGSHERSTELLUNGSVERFAHREN[2005/44]
English:WIRING FABRICATING METHOD[2005/44]
French:PROCEDE DE FABRICATION D'UN CABLAGE[2005/44]
Entry into regional phase19.07.2005Translation filed 
19.07.2005National basic fee paid 
19.07.2005Search fee paid 
19.07.2005Designation fee(s) paid 
19.07.2005Examination fee paid 
Examination procedure19.07.2005Examination requested  [2005/44]
11.05.2010Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
21.05.2010Request for decision received: Application is deemed to be withdrawn
17.06.2010Result of request for decision (Application is deemed to be withdrawn): Request granted
15.07.2010Despatch of a communication from the examining division (Time limit: M06)
19.01.2011Reply to a communication from the examining division
01.03.2011Communication of intention to grant the patent
14.06.2011Fee for grant paid
14.06.2011Fee for publishing/printing paid
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  15.07.2010
Opposition(s)25.05.2012No opposition filed within time limit [2012/31]
Fees paidRenewal fee
20.01.2006Renewal fee patent year 03
30.01.2007Renewal fee patent year 04
30.01.2008Renewal fee patent year 05
29.01.2009Renewal fee patent year 06
13.01.2010Renewal fee patent year 07
14.01.2011Renewal fee patent year 08
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Lapses during opposition  TooltipFI24.08.2011
NL24.08.2011
[2012/09]
Former [2012/08]NL24.08.2011
Documents cited:Search[I]US6051150  (MIYAKAWA TAKUYA [JP]) [I] 1-6 * column 6, lines 15-25; figures 4A, 4B, 5 *;
 [A]JP2002359246  (SEMICONDUCTOR ENERGY LAB) [A] 1-2 * figure 8 *;
 [A]  - C.T. GABRIEL ET AL, "INTEGRATION OF METAL MASKING AND ETCHING FOR DEEP SUBMICRON PATTERNING", J. VAC.SCI. TECHNOL. A, (20000701), vol. 18, no. 4, pages 1420 - 1424, XP002560332 [A] 1-2 * figures 2, 6 *

DOI:   http://dx.doi.org/10.1116/1.582364
International search[Y]JPH11340129  (SEIKO EPSON CORP);
 [Y]JP2002151478  (SEKISUI CHEMICAL CO LTD, et al);
 [Y]JP2002237480  (SEKISUI CHEMICAL CO LTD)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.