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Extract from the Register of European Patents

EP About this file: EP1595280

EP1595280 - Buffer structure for heteroepitaxy on a silicon substrate [Right-click to bookmark this link]
Former [2005/46]BUFFER STRUCTURE FOR MODIFYING A SILICON SUBSTRATE
[2006/29]
StatusNo opposition filed within time limit
Status updated on  02.11.2007
Database last updated on 28.03.2026
Most recent event   Tooltip25.09.2009Lapse of the patent in a contracting state
New state(s): TR		published on 28.10.2009  [2009/44]
Applicant(s)For all designated states
QinetiQ Limited
85 Buckingham Gate
London, SW1E 6PD / GB
[N/P]
Former [2005/46]For all designated states
Qinetiq Limited
85 Buckingham Gate
London, SW1E 6PD / GB
Inventor(s)01 / WALLIS, David, John
Malvern Technology Park, St Andrews Road
Malvern, Worcs WR14 3PS / GB
 [2005/46]
Representative(s)Lowther, Deborah Jane
QinetiQ Limited
Intellectual Property
Cody Technology Park
Ively Road
Farnborough, Hants GU14 0LX / GB
[N/P]
Former [2005/46]Lowther, Deborah Jane
QinetiQ Limited Intellectual Property, Cody Technology Park, Ively Road
Farnborough, Hants GU14 0LX / GB
Application number, filing date04711402.016.02.2004
[2005/46]
WO2004GB00560
Priority number, dateGB2003000378419.02.2003         Original published format: GB 0303784
[2005/46]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO2004075249
Date:02.09.2004
Language:EN
[2004/36]
Type: A2 Application without search report 
No.:EP1595280
Date:16.11.2005
Language:EN
The application published by WIPO in one of the EPO official languages on 02.09.2004 takes the place of the publication of the European patent application.
[2005/46]
Type: B1 Patent specification 
No.:EP1595280
Date:27.12.2006
Language:EN
[2006/52]
Type: B8 Corrected title page of specification 
No.:EP1595280
Date:28.02.2007
[2007/09]
Search report(s)International search report - published on:EP28.10.2004
ClassificationIPC:H01L21/20, C30B29/38
[2005/46]
CPC:
C30B23/02 (EP,US); C30B29/403 (EP,US); C30B29/406 (EP,US);
H10P14/2905 (EP,US); H10P14/3202 (EP,US); H10P14/3251 (EP,US);
H10P14/3254 (EP,US); H10P14/3416 (EP,US) (-)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   RO,   SE,   SI,   SK,   TR [2007/04]
Former [2005/46]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  RO,  SE,  SI,  SK,  TR 
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
TitleGerman:Pufferstruktur für Heteroepitaxie auf einem siliziumsubstrat[2006/29]
English:Buffer structure for heteroepitaxy on a silicon substrate[2006/29]
French:Structure tampon pour hétéroépitaxie sur un substrat de silicium[2006/29]
Former [2005/46]PUFFERSTRUKTUR ZUR VERÄNDERUNG EINES SILIZIUMSUBSTRATS
Former [2005/46]BUFFER STRUCTURE FOR MODIFYING A SILICON SUBSTRATE
Former [2005/46]STRUCTURE DE TAMPON POUR LA MODIFICATION D'UN SUBSTRAT DE SILICIUM
Entry into regional phase08.08.2005National basic fee paid 
08.08.2005Designation fee(s) paid 
08.08.2005Examination fee paid 
Examination procedure08.08.2005Amendment by applicant (claims and/or description)
08.08.2005Examination requested  [2005/46]
25.01.2006Despatch of a communication from the examining division (Time limit: M04)
31.05.2006Reply to a communication from the examining division
13.07.2006Communication of intention to grant the patent
18.10.2006Fee for grant paid
18.10.2006Fee for publishing/printing paid
Opposition(s)28.09.2007No opposition filed within time limit [2007/49]
Fees paidRenewal fee
18.01.2006Renewal fee patent year 03
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT27.12.2006
CH27.12.2006
CY27.12.2006
CZ27.12.2006
DK27.12.2006
EE27.12.2006
LI27.12.2006
RO27.12.2006
SI27.12.2006
SK27.12.2006
TR27.12.2006
IE16.02.2007
LU16.02.2007
MC28.02.2007
BG27.03.2007
SE27.03.2007
GR28.03.2007
ES07.04.2007
PT28.05.2007
HU28.06.2007
[2009/44]
Former [2009/41]AT27.12.2006
CH27.12.2006
CY27.12.2006
CZ27.12.2006
DK27.12.2006
EE27.12.2006
LI27.12.2006
RO27.12.2006
SI27.12.2006
SK27.12.2006
IE16.02.2007
LU16.02.2007
MC28.02.2007
BG27.03.2007
SE27.03.2007
GR28.03.2007
ES07.04.2007
PT28.05.2007
HU28.06.2007
Former [2009/10]AT27.12.2006
CH27.12.2006
CZ27.12.2006
DK27.12.2006
EE27.12.2006
LI27.12.2006
RO27.12.2006
SI27.12.2006
SK27.12.2006
IE16.02.2007
MC28.02.2007
BG27.03.2007
SE27.03.2007
GR28.03.2007
ES07.04.2007
PT28.05.2007
Former [2008/22]AT27.12.2006
CH27.12.2006
CZ27.12.2006
DK27.12.2006
LI27.12.2006
RO27.12.2006
SI27.12.2006
SK27.12.2006
IE16.02.2007
MC28.02.2007
BG27.03.2007
SE27.03.2007
GR28.03.2007
ES07.04.2007
PT28.05.2007
Former [2008/11]AT27.12.2006
CH27.12.2006
CZ27.12.2006
DK27.12.2006
LI27.12.2006
RO27.12.2006
SI27.12.2006
SK27.12.2006
IE16.02.2007
MC28.02.2007
BG27.03.2007
SE27.03.2007
ES07.04.2007
PT28.05.2007
Former [2007/50]AT27.12.2006
CH27.12.2006
CZ27.12.2006
DK27.12.2006
LI27.12.2006
RO27.12.2006
SI27.12.2006
SK27.12.2006
MC28.02.2007
BG27.03.2007
SE27.03.2007
ES07.04.2007
PT28.05.2007
Former [2007/47]AT27.12.2006
CH27.12.2006
CZ27.12.2006
DK27.12.2006
LI27.12.2006
RO27.12.2006
SI27.12.2006
SK27.12.2006
BG27.03.2007
SE27.03.2007
ES07.04.2007
PT28.05.2007
Former [2007/43]AT27.12.2006
CH27.12.2006
CZ27.12.2006
LI27.12.2006
RO27.12.2006
BG27.03.2007
SE27.03.2007
ES07.04.2007
PT28.05.2007
Former [2007/27]AT27.12.2006
BG27.03.2007
SE27.03.2007
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.