EP1610177 - PHOTOSENSITIVE RESIN FILM AND CURED FILM MADE THEREFROM [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 13.01.2012 Database last updated on 14.06.2024 | Most recent event Tooltip | 04.05.2012 | Lapse of the patent in a contracting state | published on 06.06.2012 [2012/23] | Applicant(s) | For all designated states JSR Corporation 6-10, Tsukiji 5-chome, Chuo-ku Tokyo 104-8410 / JP | [2005/52] | Inventor(s) | 01 /
IWANAGA, Shin-ichiro c/o JSR Corporation, 6-10, Tsukiji 5-chome Chuo-ku, Tokyo 1048410 / JP | 02 /
KIMURA, Tooru c/o JSR Corporation, 6-10, Tsukiji 5-chome Chuo-ku, Tokyo 1048410 / JP | 03 /
NISHIKAWA, Kouji c/o JSR Corporation, 6-10, Tsukiji 5-chome Chuo-ku, Tokyo 1048410 / JP | [2005/52] | Representative(s) | TBK Bavariaring 4-6 80336 München / DE | [N/P] |
Former [2008/22] | TBK-Patent Bavariaring 4-6 80336 München / DE | ||
Former [2005/52] | TBK-Patent Bavariaring 4-6 D-80336 München / DE | Application number, filing date | 04723323.4 | 25.03.2004 | [2005/52] | WO2004JP04155 | Priority number, date | JP20030098392 | 01.04.2003 Original published format: JP 2003098392 | [2005/52] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2004090637 | Date: | 21.10.2004 | Language: | EN | [2004/43] | Type: | A1 Application with search report | No.: | EP1610177 | Date: | 28.12.2005 | Language: | EN | The application published by WIPO in one of the EPO official languages on 21.10.2004 takes the place of the publication of the European patent application. | [2005/52] | Type: | B1 Patent specification | No.: | EP1610177 | Date: | 09.03.2011 | Language: | EN | [2011/10] | Search report(s) | International search report - published on: | JP | 21.10.2004 | (Supplementary) European search report - dispatched on: | EP | 07.06.2010 | Classification | IPC: | G03F7/033, C09D133/04 | [2005/52] | CPC: |
G03F7/031 (EP,US);
G03F7/033 (EP,KR,US);
C08L33/04 (EP,US);
C09D133/04 (KR);
G03F7/029 (EP,US);
Y10S430/111 (EP,US);
| C-Set: |
C08L33/04, C08L2666/02 (EP,US)
| Designated contracting states | DE, FR, IT [2006/27] |
Former [2005/52] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | Title | German: | LICHTEMPFINDLICHER HARZFILM UND DARAUS HERGESTELLTER AUSGEHÄRTETER FILM | [2005/52] | English: | PHOTOSENSITIVE RESIN FILM AND CURED FILM MADE THEREFROM | [2005/52] | French: | FILM DE RESINE PHOTOSENSIBLE ET FILM POLYMERISE REALISE A PARTIR DU FILM DE RESINE PHOTOSENSIBLE | [2005/52] | Entry into regional phase | 20.09.2005 | Translation filed | 20.09.2005 | National basic fee paid | 20.09.2005 | Search fee paid | 20.09.2005 | Designation fee(s) paid | 20.09.2005 | Examination fee paid | Examination procedure | 20.09.2005 | Examination requested [2005/52] | 16.09.2010 | Communication of intention to grant the patent | 25.01.2011 | Fee for grant paid | 25.01.2011 | Fee for publishing/printing paid | Opposition(s) | 12.12.2011 | No opposition filed within time limit [2012/07] | Fees paid | Renewal fee | 30.03.2006 | Renewal fee patent year 03 | 29.03.2007 | Renewal fee patent year 04 | 31.03.2008 | Renewal fee patent year 05 | 31.03.2009 | Renewal fee patent year 06 | 31.03.2010 | Renewal fee patent year 07 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | FR | 09.05.2011 | [2012/23] | Documents cited: | Search | [A]US5837421 (KANDA KAZUNORI [JP], et al) [A] 1-6 * claims 1-11 *; | [AP]WO03069410 (JSR CORP [JP], et al) [AP] 1-6 * Synthesis examples 1,2,5,7,9-11;;; example 1 *; | US2004142280 [ ] (IWANAGA SHIN-ICHIRO [JP], et al) | International search | [A]JPH03188150 (HERCULES INC); | [A]JPH11271974 (NIPPON ZEON CO); | [A]JP2000039709 (JSR CORP); | [A]JP2000336121 (SHINETSU CHEMICAL CO); | [A]JP2002182381 (HITACHI CHEMICAL CO LTD); | [A]JP2003029604 (NAT INST OF ADV IND & TECHNOL, et al); | [AP]JP2003113174 (MITSUBISHI CHEM CORP) |