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Extract from the Register of European Patents

EP About this file: EP1644698

EP1644698 - INTERFEROMETRIC METHOD FOR THE MEASUREMENT OF PLANE SEPARATIONS WITH SUB-NANOMETRE ACCURACY [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  05.10.2007
Database last updated on 03.09.2024
Most recent event   Tooltip25.09.2009Lapse of the patent in a contracting state
New state(s): TR
published on 28.10.2009  [2009/44]
Applicant(s)For all designated states
Universität zu Lübeck
Ratzeburger Allee 160
23538 Lübeck / DE
[2006/47]
Former [2006/15]For all designated states
Medizinisches Laserzentrum Lübeck GmbH
Peter-Monnik-Weg 4
D-23562 Lübeck / DE
Inventor(s)01 / KOCH, Edmund
Mendelssohnallee 6
01309 Dresden / DE
02 / KOCH, Peter
Füchtingstrasse 17
23558 Luebeck / DE
 [2006/15]
Representative(s)Biehl, Christian
Boehmert & Boehmert
Anwaltssozietät
Niemannsweg 133
24105 Kiel / DE
[N/P]
Former [2006/15]Biehl, Christian
Boehmert & Boehmert, Anwaltssozietät, Niemannsweg 133
24105 Kiel / DE
Application number, filing date04738660.214.06.2004
[2006/15]
WO2004DE01208
Priority number, dateDE200312841219.06.2003         Original published format: DE 10328412
[2006/15]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report
No.:WO2004113828
Date:29.12.2004
Language:DE
[2004/53]
Type: A1 Application with search report 
No.:EP1644698
Date:12.04.2006
Language:DE
The application published by WIPO in one of the EPO official languages on 29.12.2004 takes the place of the publication of the European patent application.
[2006/15]
Type: B1 Patent specification 
No.:EP1644698
Date:29.11.2006
Language:DE
[2006/48]
Search report(s)International search report - published on:EP29.12.2004
ClassificationIPC:G01B11/06
[2006/15]
CPC:
G01B11/0675 (EP,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2006/15]
Extension statesALNot yet paid
HRNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
TitleGerman:INTERFEROMETRISCHES VERFAHREN ZUR MESSUNG VON EBENENABSTÄNDEN MIT SUBNANOMETER-GENAUIGKEIT[2006/15]
English:INTERFEROMETRIC METHOD FOR THE MEASUREMENT OF PLANE SEPARATIONS WITH SUB-NANOMETRE ACCURACY[2006/15]
French:PROCEDE DE MESURE PAR INTERFEROMETRIE DE DISTANCES ENTRE DES PLANS AVEC UNE PRECISION SUBNANOMETRIQUE[2006/15]
Entry into regional phase24.12.2005National basic fee paid 
24.12.2005Designation fee(s) paid 
24.12.2005Examination fee paid 
Examination procedure24.12.2005Amendment by applicant (claims and/or description)
24.12.2005Examination requested  [2006/15]
09.06.2006Communication of intention to grant the patent
13.09.2006Fee for grant paid
13.09.2006Fee for publishing/printing paid
Opposition(s)30.08.2007No opposition filed within time limit [2007/45]
Fees paidRenewal fee
12.06.2006Renewal fee patent year 03
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Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipCY29.11.2006
CZ29.11.2006
EE29.11.2006
FI29.11.2006
IE29.11.2006
NL29.11.2006
PL29.11.2006
RO29.11.2006
SI29.11.2006
SK29.11.2006
TR29.11.2006
BG28.02.2007
DK28.02.2007
SE28.02.2007
GR01.03.2007
ES12.03.2007
PT30.04.2007
HU30.05.2007
AT14.06.2007
LU14.06.2007
BE30.06.2007
MC30.06.2007
[2009/44]
Former [2009/41]CY29.11.2006
CZ29.11.2006
EE29.11.2006
FI29.11.2006
IE29.11.2006
NL29.11.2006
PL29.11.2006
RO29.11.2006
SI29.11.2006
SK29.11.2006
BG28.02.2007
DK28.02.2007
SE28.02.2007
GR01.03.2007
ES12.03.2007
PT30.04.2007
HU30.05.2007
AT14.06.2007
LU14.06.2007
BE30.06.2007
MC30.06.2007
Former [2009/10]CZ29.11.2006
EE29.11.2006
FI29.11.2006
IE29.11.2006
NL29.11.2006
PL29.11.2006
RO29.11.2006
SI29.11.2006
SK29.11.2006
BG28.02.2007
DK28.02.2007
SE28.02.2007
GR01.03.2007
ES12.03.2007
PT30.04.2007
AT14.06.2007
BE30.06.2007
MC30.06.2007
Former [2008/39]CZ29.11.2006
FI29.11.2006
IE29.11.2006
NL29.11.2006
PL29.11.2006
RO29.11.2006
SI29.11.2006
SK29.11.2006
BG28.02.2007
DK28.02.2007
SE28.02.2007
GR01.03.2007
ES12.03.2007
PT30.04.2007
AT14.06.2007
BE30.06.2007
MC30.06.2007
Former [2008/21]CZ29.11.2006
FI29.11.2006
IE29.11.2006
NL29.11.2006
PL29.11.2006
RO29.11.2006
SI29.11.2006
SK29.11.2006
BG28.02.2007
DK28.02.2007
SE28.02.2007
GR01.03.2007
ES12.03.2007
PT30.04.2007
BE30.06.2007
MC30.06.2007
Former [2008/11]CZ29.11.2006
FI29.11.2006
IE29.11.2006
NL29.11.2006
PL29.11.2006
RO29.11.2006
SI29.11.2006
SK29.11.2006
BG28.02.2007
DK28.02.2007
SE28.02.2007
ES12.03.2007
PT30.04.2007
MC30.06.2007
Former [2007/47]CZ29.11.2006
FI29.11.2006
IE29.11.2006
NL29.11.2006
PL29.11.2006
RO29.11.2006
SI29.11.2006
SK29.11.2006
BG28.02.2007
DK28.02.2007
SE28.02.2007
ES12.03.2007
PT30.04.2007
Former [2007/43]CZ29.11.2006
FI29.11.2006
IE29.11.2006
NL29.11.2006
PL29.11.2006
RO29.11.2006
BG28.02.2007
DK28.02.2007
SE28.02.2007
ES12.03.2007
PT30.04.2007
Former [2007/29]FI29.11.2006
NL29.11.2006
PL29.11.2006
BG28.02.2007
SE28.02.2007
Former [2007/27]FI29.11.2006
PL29.11.2006
BG28.02.2007
SE28.02.2007
Cited inInternational search[A]US4293224  (GASTON CHARLES A, et al) [A] 1-5 * column 3, line 49 - column 5, line 64 * * abstract *;
 [AD]DE4309056  (HAEUSLER GERD [DE], et al) [AD] 1-5* claim 1 *;
 [A]US5619329  (OTANI ATSUSHI [JP]) [A] 1-5 * column 3, line 18 - column 4, line 59 * * abstract *;
 [A]WO02082008  (KOREA ADVANCED INST SCI & TECH [KR], et al) [A] 1-5 * page 9, line 12 - page 11, line 1 * * page 12, line 4 - page 13, line 23 * * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.