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EP1662323
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EP About this file: EP1662323
| EP1662323 - MATERIAL FOR FORMING RESIST-PROTECTING FILM FOR IMMERSION EXPOSURE PROCESS, RESIST-PROTECTING FILM MADE OF SUCH MATERIAL, AND METHOD FOR FORMING RESIST PATTERN USING SUCH RESIST-PROTECTING FILM [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 05.03.2010 Database last updated on 11.04.2026 | Most recent event Tooltip | 05.03.2010 | Withdrawal of application | published on 07.04.2010 [2010/14] | Applicant(s) | For all designated states TOKYO OHKA KOGYO CO., LTD. 150, Nakamaruko Nakahara-ku Kawasaki-shi, Kanagawa 211-0012 / JP | [2006/22] | Inventor(s) | 01 /
HIRAYAMA, Taku c/o TOKYO OHKA KOGYO CO., LTD. 150, Nakamaruko, Nakahara-ku Kawasaki-shi, Kanagawa 211-0012 / JP | 02 /
ENDO, Kotaro c/o TOKYO OHKA KOGYO CO., LTD. 150, Nakamaruko, Nakahara-ku Kawasaki-shi, Kanagawa 211-0012 / JP | 03 /
YOSHIDA, Masaaki, c/o TOKYO OHKA KOGYO CO., LTD. 150, Nakamaruko, Nakahara-ku Kawasaki-shi, Kanagawa 211-0012 / JP | 04 /
WAKIYA, Kazumasa, c/o TOKYO OHKA KOGYO CO., LTD. 150, Nakamaruko, Nakahara-ku Kawasaki-shi, Kanagawa 211-0012 / JP | [2006/31] |
| Former [2006/22] | 01 /
c/o TOKYO OHKA KOGYO CO., LTD. 150, Nakamaruko, Nakahara-ku Kawasaki-shi, Kanagawa 211-0012 / JP | ||
| 02 /
c/o TOKYO IHKA KOGYO CO., LTD. 150, Nakamaruko, Nakahara-ku Kawasaki-shi, Kanagawa 211-0012 / JP | |||
| 03 /
YOSHIDA, Masaaki, c/o TOKYO OHKA KOGYO CO., LTD. 150, Nakamaruko, Nakahara-ku Kawasaki-shi, Kanagawa 211-0012 / JP | |||
| 04 /
WAKIYA, Kazumasa, c/o TOKYO OHKA KOGYO CO., LTD. 150, Nakamaruko, Nakahara-ku Kawasaki-shi, Kanagawa 211-0012 / JP | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastrasse 30 81925 München / DE | [N/P] |
| Former [2006/22] | HOFFMANN EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | Application number, filing date | 04772165.9 | 25.08.2004 | [2006/22] | WO2004JP12204 | Priority number, date | JP20030300666 | 25.08.2003 Original published format: JP 2003300666 | JP20030356963 | 16.10.2003 Original published format: JP 2003356963 | [2006/22] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2005019937 | Date: | 03.03.2005 | Language: | EN | [2005/09] | Type: | A1 Application with search report | No.: | EP1662323 | Date: | 31.05.2006 | Language: | EN | The application published by WIPO in one of the EPO official languages on 03.03.2005 takes the place of the publication of the European patent application. | [2006/22] | Search report(s) | International search report - published on: | JP | 03.03.2005 | (Supplementary) European search report - dispatched on: | EP | 21.12.2009 | Classification | IPC: | G03F7/11, G03F7/039, H01L21/027 | [2006/22] | CPC: |
G03F7/2041 (EP,KR,US);
G03F7/11 (EP,KR,US);
G03F7/70341 (KR);
H10P76/204 (KR)
| Designated contracting states | DE, FR, IT [2006/48] |
| Former [2006/22] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR | Extension states | AL | Not yet paid | HR | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | Title | German: | MATERIAL ZUR BILDUNG EINES RESIST-SCHUTZFILMS FÜR EINEN IMMERSIONSBELICHTUNGSPROZESS, AUS SOLCHEM MATERIAL HERGESTELLTER RESISTSCHUTZFILM UND VERFAHREN ZUR BILDUNG EINER RESISTSTRUKTUR UNTER VERWENDUNG EINES SOLCHEN RESISTSCHUTZFILMS | [2006/22] | English: | MATERIAL FOR FORMING RESIST-PROTECTING FILM FOR IMMERSION EXPOSURE PROCESS, RESIST-PROTECTING FILM MADE OF SUCH MATERIAL, AND METHOD FOR FORMING RESIST PATTERN USING SUCH RESIST-PROTECTING FILM | [2006/22] | French: | MATIERE DE FORMATION D'UN FILM PROTECTEUR DE RESERVE POUR UN PROCESSUS D'EXPOSITION PAR IMMERSION, FILM PROTECTEUR DE RESERVE CONSTITUE D'UNE TELLE MATIERE, ET PROCEDE DE FORMATION D'UN MODELE DE RESERVE AU MOYEN DUDIT FILM | [2006/22] | Entry into regional phase | 24.02.2006 | Translation filed | 24.02.2006 | National basic fee paid | 24.02.2006 | Search fee paid | 24.02.2006 | Designation fee(s) paid | 24.02.2006 | Examination fee paid | Examination procedure | 24.02.2006 | Examination requested [2006/22] | 26.02.2010 | Application withdrawn by applicant [2010/14] | Fees paid | Renewal fee | 17.08.2006 | Renewal fee patent year 03 | 28.08.2007 | Renewal fee patent year 04 | 27.03.2008 | Renewal fee patent year 05 | 24.08.2009 | Renewal fee patent year 06 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XY] JPH1069091 (SHINETSU CHEMICAL CO et al.) [X] 1-10,12 * page 8; examples 1,12; table 2 * * page 8, paragraph 41 - page 9, paragraph 42 *[Y] 13 | [X] JPH0815859 (TOKYO OHKA KOGYO CO LTD et al.) [X] 1-7,9-10,12 * page 9 - paragraph 69 * | [X] JPH0651523 (MITSUBISHI CHEM IND et al.) [X] 1-7,9-10,12 * page 5, paragraph 26 - paragraph 32 * | [X] JPH10120968 (HITACHI CHEMICAL CO LTD et al.) [X] 1-3,9-12 * page 7, paragraph 47 * | [Y] SWITKES M ET AL: "Immersion lithography at 157 nm", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AVS / AIP, MELVILLE, NEW YORK, NY, US, vol. 19, no. 6, 1 November 2001 (2001-11-01), pages 2353 - 2356, XP012009044, ISSN: 1071-1023 [Y] 13 * page 2353, column 1, paragraph 2 * * page 2353, column 2, paragraph 3 * DOI: http://dx.doi.org/10.1116/1.1412895 |