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EP1668423
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EP About this file: EP1668423
| EP1668423 - METHOD AND DEVICE FOR IMMERSION LITHOGRAPHY [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 24.09.2010 Database last updated on 19.10.2024 | Most recent event Tooltip | 24.09.2010 | Application deemed to be withdrawn | published on 27.10.2010 [2010/43] | Applicant(s) | For all designated states MICRONIC LASER SYSTEMS AB Nytorpsvägen 9, P.O. Box 3141 S-18303 Täby / SE | [2006/24] | Inventor(s) | 01 /
CAROLL, Allen 720 Calmar Avenue Oakland, CA 94610 / US | [2006/24] | Application number, filing date | 04775497.3 | 01.10.2004 | [2006/24] | WO2004SE01403 | Priority number, date | US20030679701 | 03.10.2003 Original published format: US 679701 | [2006/24] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | WO2005034174 | Date: | 14.04.2005 | Language: | EN | [2005/15] | Type: | A2 Application without search report | No.: | EP1668423 | Date: | 14.06.2006 | Language: | EN | The application published by WIPO in one of the EPO official languages on 14.04.2005 takes the place of the publication of the European patent application. | [2006/24] | Search report(s) | International search report - published on: | SE | 09.06.2005 | Classification | IPC: | G03F7/20 | [2006/24] | CPC: |
G03F7/70341 (EP,US);
G03F7/20 (KR);
G03B27/00 (KR)
| Designated contracting states | DE, NL [2007/02] |
| Former [2006/24] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR | Extension states | AL | Not yet paid | HR | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | Title | German: | VERFAHREN UND EINRICHTUNG ZUR IMMERSIONSLITHOGRAPHIE | [2006/24] | English: | METHOD AND DEVICE FOR IMMERSION LITHOGRAPHY | [2006/24] | French: | PROCEDE ET DISPOSITIF DE LITHOGRAPHIE PAR IMMERSION | [2006/24] | Entry into regional phase | 15.02.2006 | National basic fee paid | 15.02.2006 | Designation fee(s) paid | 15.02.2006 | Examination fee paid | Examination procedure | 20.04.2005 | Request for preliminary examination filed International Preliminary Examining Authority: SE | 06.02.2006 | Amendment by applicant (claims and/or description) | 15.02.2006 | Examination requested [2006/24] | 01.05.2010 | Application deemed to be withdrawn, date of legal effect [2010/43] | 07.06.2010 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2010/43] | Fees paid | Renewal fee | 15.02.2006 | Renewal fee patent year 03 | 29.10.2007 | Renewal fee patent year 04 | 27.10.2008 | Renewal fee patent year 05 | Penalty fee | Additional fee for renewal fee | 31.10.2009 | 06 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [X]US4480910 (TAKANASHI AKIHIRO [JP], et al); | [X]JPH10255319 (HITACHI MAXELL); | [X]US5900354 (BATCHELDER JOHN SAMUEL [US]); | [X]WO9949504 (NIKON CORP [JP], et al); | [Y]US6230722 (MITSUMORI KENICHI [JP], et al); | [X]US2003030916 (SUENAGA YUTAKA [JP]); | [E]EP1498778 (ASML NETHERLANDS BV [NL]) |