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Extract from the Register of European Patents

EP About this file: EP1697992

EP1697992 - SIDEWALL FORMATION FOR HIGH DENSITY POLYMER MEMORY ELEMENT ARRAY [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  23.02.2018
Database last updated on 07.10.2024
FormerExamination is in progress
Status updated on  21.06.2017
Most recent event   Tooltip23.02.2018Application deemed to be withdrawnpublished on 28.03.2018  [2018/13]
Applicant(s)For all designated states
Cypress Semiconductor Corporation
198 Champion Court
San Jose, CA 95134-1709 / US
[2015/44]
Former [2007/45]For all designated states
Spansion LLC
915 DeGuigne Drive P.O. Box 3453
Sunnyvale, CA 94088-3453 / US
Former [2007/44]For all designated states
Spansion, Inc
915 DeGuigne Drive
Sunnyvale, CA 94088-3453 / US
Former [2006/36]For all designated states
ADVANCED MICRO DEVICES, INC.
One AMD Place, Mail Stop 68, P.O. Box 3453 Sunnyvale
California 94088-3453 / US
Inventor(s)01 / LYONS, Christopher, F.
42681 Lerwick Street
Freemont, CA 94539 / US
02 / CHANG, Mark, S.
1881 Farndon Avenue
Los Altos, CA 94024 / US
03 / LOPATIN, Sergey, D.
1000 Kiely Blvd. 66
Santa Clara, CA 95051 / US
04 / SUBRAMANIAN, Ramkumar
1155-D La Rochelle Terrace
Sunnyvale, CA 94089 / US
05 / CHEUNG, Patrick
561 Cherrywood Drive
Sunnyvale, CA 94087 / US
06 / NGO, Minh, Van
40986 Canyon Heights Drive
Fremont, CA 94539 / US
07 / OGLESBY, Jane, V.
264 N. Whisman Road 18
Mountain View, CA 94043 / US
 [2006/36]
Representative(s)Murgitroyd & Company
165-169 Scotland Street
Glasgow G5 8PL / GB
[N/P]
Former [2006/36]Brookes Batchellor LLP
102-108 Clerkenwell Road
London EC1M 5SA / GB
Application number, filing date04784925.223.09.2004
[2006/36]
WO2004US31275
Priority number, dateUS2003069990303.11.2003         Original published format: US 699903
[2006/36]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO2005045935
Date:19.05.2005
Language:EN
[2005/20]
Type: A2 Application without search report 
No.:EP1697992
Date:06.09.2006
Language:EN
The application published by WIPO in one of the EPO official languages on 19.05.2005 takes the place of the publication of the European patent application.
[2006/36]
Search report(s)International search report - published on:EP13.10.2005
ClassificationIPC:H01L27/115
[2006/36]
CPC:
G11C11/5664 (EP,KR,US); B82Y10/00 (EP,KR,US); G11C13/0014 (EP,KR,US);
G11C13/0016 (EP,KR,US); H01L21/3213 (KR); H10K10/701 (EP,KR,US);
H10K19/202 (EP,KR,US) (-)
Designated contracting statesDE,   FR,   GB [2007/06]
Former [2006/36]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
Extension statesALNot yet paid
HRNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
TitleGerman:SEITENWAND-AUSBILDUNG FÜR EIN DICHTES POLYMER-SPEICHERELEMENT-ARRAY[2006/36]
English:SIDEWALL FORMATION FOR HIGH DENSITY POLYMER MEMORY ELEMENT ARRAY[2006/36]
French:FORMATION SUR PAROI LATERALE POUR RESEAU DE POINTS MEMOIRE POLYMERIQUES HAUTE DENSITE[2006/36]
Entry into regional phase19.05.2006National basic fee paid 
19.05.2006Designation fee(s) paid 
19.05.2006Examination fee paid 
Examination procedure17.11.2005Request for preliminary examination filed
International Preliminary Examining Authority: EP
19.05.2006Amendment by applicant (claims and/or description)
19.05.2006Examination requested  [2006/36]
15.09.2014Despatch of a communication from the examining division (Time limit: M06)
14.01.2015Reply to a communication from the examining division
12.06.2017Despatch of a communication from the examining division (Time limit: M04)
24.10.2017Application deemed to be withdrawn, date of legal effect  [2018/13]
20.11.2017Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2018/13]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  15.09.2014
Fees paidRenewal fee
19.05.2006Renewal fee patent year 03
05.09.2007Renewal fee patent year 04
05.09.2008Renewal fee patent year 05
04.09.2009Renewal fee patent year 06
07.09.2010Renewal fee patent year 07
08.09.2011Renewal fee patent year 08
26.09.2012Renewal fee patent year 09
27.09.2013Renewal fee patent year 10
29.09.2014Renewal fee patent year 11
30.11.2015Renewal fee patent year 12
27.09.2016Renewal fee patent year 13
Penalty fee
Additional fee for renewal fee
30.09.201512   M06   Fee paid on   30.11.2015
30.09.201714   M06   Not yet paid
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Cited inInternational search[A]US6501134  (KRIVOKAPIC ZORAN [US]);
 [A]US6528815  (BROWN ADAM R [NL], et al);
 [A]US6545891  (TRINGALI J JAMES [US], et al);
 [XY]WO03032392  (AXON TECHNOLOGIES CORP [US], et al);
 [Y]US2003173612  (KRIEGER JURI H [US], et al)
ExaminationWO2004109803
 EP1629535
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.