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Extract from the Register of European Patents

EP About this file: EP1555732

EP1555732 - Method for manufacturing a nitride semiconductor laser diode [Right-click to bookmark this link]
Former [2005/29]Nitride semiconductor laser diode and method for manufacturing the same
[2015/42]
StatusNo opposition filed within time limit
Status updated on  03.02.2017
Database last updated on 11.09.2024
Most recent event   Tooltip03.02.2017No opposition filed within time limitpublished on 08.03.2017  [2017/10]
Applicant(s)For all designated states
LG Electronics, Inc.
20, Yoido-Dong,Youngdungpo-gu
Seoul / KR
[2016/13]
Former [2005/29]For all designated states
LG ELECTRONICS INC.
20, Yoido-Dong,Youngdungpo-gu
Seoul / KR
Inventor(s)01 / Khym, Sungwon
401, 494-92 Yonggang-dong
Mapo-gu
Seoul / KR
 [2016/13]
Former [2005/29]01 / Khym, Sungwon
401, 494-92 Yonggang-dong Mapo-gu
Seoul / KR
Representative(s)Trinks, Ole, et al
Meissner Bolte Patentanwälte
Rechtsanwälte Partnerschaft mbB
Postfach 10 26 05
86016 Augsburg / DE
[N/P]
Former [2016/13]Trinks, Ole, et al
Meissner, Bolte & Partner GbR
Postfach 10 26 05
86016 Augsburg / DE
Former [2010/39]Trinks, Ole, et al
Meissner, Bolte & Partner GbR P.O. Box 102605
86016 Augsburg / DE
Former [2008/41]Sajda, Wolf E., et al
Meissner, Bolte & Partner GbR Postfach 86 06 24
81633 München / DE
Former [2005/29]Sajda, Wolf E., Dipl.-Phys., et al
Meissner, Bolte & Partner GbR, Postfach 10 26 05
86016 Augsburg / DE
Application number, filing date05000651.914.01.2005
[2005/29]
Priority number, dateKR2004000389119.01.2004         Original published format: KR 2004003891
[2005/29]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1555732
Date:20.07.2005
Language:EN
[2005/29]
Type: A3 Search report 
No.:EP1555732
Date:25.07.2007
[2007/30]
Type: B1 Patent specification 
No.:EP1555732
Date:30.03.2016
Language:EN
[2016/13]
Search report(s)(Supplementary) European search report - dispatched on:EP25.06.2007
ClassificationIPC:H01S5/343
[2005/29]
CPC:
B82Y20/00 (EP,US); H02K15/02 (KR); H01S5/34333 (EP,US);
H02K1/17 (KR); H01S5/0215 (EP,US); H01S5/0217 (EP,US)
Designated contracting statesDE,   FR,   GB,   NL [2016/13]
Former [2008/14]DE,  FR,  GB,  NL 
Former [2005/29]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Herstellungsverfahren einer nitriden Halbleiterlaserdiode[2015/42]
English:Method for manufacturing a nitride semiconductor laser diode[2015/42]
French:Procédé de fabrication d'une diode laser à semiconducteur à base de Nitrure[2015/42]
Former [2005/29]Nitriden Halbleiterlaserdiode und deren Herstellungsverfahren
Former [2005/29]Nitride semiconductor laser diode and method for manufacturing the same
Former [2005/29]Diode laser à semiconducteur à base de Nitrure et son procédé de fabrication
Examination procedure22.01.2005Examination requested  [2005/29]
26.01.2008Loss of particular rights, legal effect: designated state(s)
03.04.2008Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HU, IE, IS, IT, LT, LU, MC, PL, PT, RO, SE, SI, SK, TR
24.01.2011Despatch of a communication from the examining division (Time limit: M04)
12.03.2011Reply to a communication from the examining division
12.03.2012Despatch of a communication from the examining division (Time limit: M04)
05.07.2012Reply to a communication from the examining division
27.08.2012Despatch of a communication from the examining division (Time limit: M04)
27.12.2012Reply to a communication from the examining division
17.06.2014Despatch of a communication from the examining division (Time limit: M04)
01.10.2014Reply to a communication from the examining division
29.09.2015Communication of intention to grant the patent
28.01.2016Fee for grant paid
28.01.2016Fee for publishing/printing paid
28.01.2016Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  24.01.2011
Opposition(s)03.01.2017No opposition filed within time limit [2017/10]
Fees paidRenewal fee
14.12.2006Renewal fee patent year 03
13.12.2007Renewal fee patent year 04
27.03.2008Renewal fee patent year 05
03.12.2009Renewal fee patent year 06
22.12.2010Renewal fee patent year 07
15.12.2011Renewal fee patent year 08
28.01.2013Renewal fee patent year 09
30.01.2014Renewal fee patent year 10
23.01.2015Renewal fee patent year 11
27.01.2016Renewal fee patent year 12
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Documents cited:Search[X]JPH1027940  (MATSUSHITA ELECTRIC IND CO LTD) [X] 1,16 * abstract *;
 [X]US6455340  (CHUA CHRISTOPHER L [US], et al) [X] 1,16 * figures 1-3 *;
 [A]US2003052316  (NIDO MASAAKI [JP], et al) [A] 1,12,13,16* figure 7 *;
 [A]  - YANG M ET AL, "A selective growth of III-nitride by MOCVD for a buried-ridge type structure", JOURNAL OF CRYSTAL GROWTH, ELSEVIER, AMSTERDAM, NL, (200106), vol. 226, no. 1, ISSN 0022-0248, pages 73 - 78, XP004242492 [A] 1,12,13,16 * the whole document *

DOI:   http://dx.doi.org/10.1016/S0022-0248(01)01021-1
ExaminationGB2346478
 KR20030040671
by applicantJPH1027940
 GB2346478
 US6455340
 US2003052316
    - JOURNAL OF CRYSTAL GROWTH, vol. 226, no. 1, pages 73 - 78
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.