-
EP1586946
European procedure
- EP About this file
- EP Legal status
- EP Federated register
- EP Event history
- EP Citations
- EP Patent family
- EP All documents
Extract from the Register of European Patents
EP About this file: EP1586946
| EP1586946 - Optical system of a microlithographic projection exposure apparatus [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 18.12.2009 Database last updated on 26.06.2024 | Most recent event Tooltip | 18.12.2009 | Application deemed to be withdrawn | published on 20.01.2010 [2010/03] | Applicant(s) | For all designated states Carl Zeiss SMT AG Rudolf-Eber-Strasse 2 73447 Oberkochen / DE | [2007/36] |
| Former [2005/42] | For all designated states Carl Zeiss SMT AG Carl-Zeiss-Strasse 22 73447 Oberkochen / DE | Inventor(s) | 01 /
Maul, Manfred Elchweg 29 73434 Aalen / DE | 02 /
Totzeck, Michael Schwerzerweg 11 73535 Schwäbisch Gmünd / DE | 03 /
Dittmann, Olaf Brahmsweg 3 73441 Bopfingen / DE | 04 /
Fiolka, Damian Heckenrosenweg 36 73447 Oberkochen / DE | [2005/42] | Representative(s) | Schwanhäusser, Gernot, et al Ostertag & Partner Patentanwälte mbB Epplestrasse 14 70597 Stuttgart / DE | [N/P] |
| Former [2005/42] | Schwanhäusser, Gernot, et al Ostertag & Partner Patentanwälte Epplestr. 14 70597 Stuttgart / DE | Application number, filing date | 05006179.5 | 22.03.2005 | [2005/42] | Priority number, date | US20040562060P | 14.04.2004 Original published format: US 562060 P | [2005/42] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1586946 | Date: | 19.10.2005 | Language: | EN | [2005/42] | Type: | A3 Search report | No.: | EP1586946 | Date: | 17.01.2007 | [2007/03] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 19.12.2006 | Classification | IPC: | G03F7/20 | [2005/42] | CPC: |
G03F7/70966 (EP,US);
G03F7/20 (KR);
G02B13/143 (EP,US);
G02B5/3083 (EP,US);
G03F7/70566 (EP,US)
| Designated contracting states | DE, FR, NL [2007/38] |
| Former [2005/42] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR | Title | German: | Optisches System eines Projektions-Mikrolithographie Apparats | [2005/42] | English: | Optical system of a microlithographic projection exposure apparatus | [2005/42] | French: | Système optique d'un appareil de projection microlithographique | [2005/42] | Examination procedure | 03.03.2007 | Examination requested [2007/16] | 18.08.2007 | Loss of particular rights, legal effect: designated state(s) | 05.09.2007 | Despatch of a communication from the examining division (Time limit: M06) | 02.11.2007 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GB, GR, HU, IE, IS, IT, LT, LU, MC, PL, PT, RO, SE, SI, SK, TR | 07.03.2008 | Reply to a communication from the examining division | 06.03.2009 | Despatch of a communication from the examining division (Time limit: M04) | 17.07.2009 | Application deemed to be withdrawn, date of legal effect [2010/03] | 24.08.2009 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2010/03] | Fees paid | Renewal fee | 14.03.2007 | Renewal fee patent year 03 | 13.03.2008 | Renewal fee patent year 04 | 13.03.2009 | Renewal fee patent year 05 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US5652745 (NOGUCHI MASATO [JP], et al) [A] 1-21 * abstract * * claim 1 * * column 3, lines 17-42 *; | [A]WO0101182 (CORNING INC [US], et al) [A] 1-21 * abstract * * figure 5 ** page 6, lines 1-15 *; | [DA]WO02093209 (ZEISS CARL [DE], et al) [DA] 1-21 * abstract * * page 5, line 23 - page 7, line 23 *; | [A]WO02099500 (OPTICAL RES ASSOCIATES [US], et al) [A] 1-21 * abstract * * page 35, line 24 - page 35, line 2 * |