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EP1630612
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EP About this file: EP1630612
| EP1630612 - Method for manufacturing a microstructure, exposure device, and electronic apparatus [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 06.11.2009 Database last updated on 26.07.2024 | Most recent event Tooltip | 06.11.2009 | Withdrawal of application | published on 09.12.2009 [2009/50] | Applicant(s) | For all designated states Seiko Epson Corporation 4-1, Nishi-Shinjuku 2-chome Shinjuku-ku Tokyo 163-0811 / JP | [N/P] |
| Former [2006/09] | For all designated states SEIKO EPSON CORPORATION 4-1, Nishi-shinjuku 2-chome Shinjuku-ku Tokyo 163-0811 / JP | Inventor(s) | 01 /
Amako, Jun Seiko Epson Corp. 3-5, Owa 3-chome Suwa-shi Nagano-ken 392-8502 / JP | 02 /
Takakuwa, Atsushi Seiko Epson Corp. 3-5, Owa 3-chome Suwa-shi Nagano-ken 392-8502 / JP | 03 /
Sawaki, Daisuke Seiko Epson Corp. 3-5, Owa 3-chome Suwa-shi Nagano-ken 392-8502 / JP | [2006/09] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastrasse 30 81925 München / DE | [N/P] |
| Former [2006/09] | HOFFMANN EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | Application number, filing date | 05015880.7 | 21.07.2005 | [2006/09] | Priority number, date | JP20040245161 | 25.08.2004 Original published format: JP 2004245161 | JP20040245169 | 25.08.2004 Original published format: JP 2004245169 | JP20040245177 | 25.08.2004 Original published format: JP 2004245177 | JP20050010420 | 18.01.2005 Original published format: JP 2005010420 | [2006/09] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1630612 | Date: | 01.03.2006 | Language: | EN | [2006/09] | Type: | A3 Search report | No.: | EP1630612 | Date: | 19.09.2007 | [2007/38] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 17.08.2007 | Classification | IPC: | G03F7/20 | [2006/09] | CPC: |
G02B5/3058 (EP,US);
E02D29/16 (KR);
B82Y30/00 (EP,US);
E02D29/045 (KR);
G02B6/02138 (EP,US);
G03F7/70408 (EP,US);
| Designated contracting states | DE, FR, GB [2008/22] |
| Former [2006/09] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR | Title | German: | Verfahren zur Herstellung einer Mikrostruktur, Belichtungsvorrichtung und elektronischer Apparat | [2006/09] | English: | Method for manufacturing a microstructure, exposure device, and electronic apparatus | [2006/09] | French: | Méthode de fabrication d'une microstructure, dispositif d'exposition et appareil électronique | [2006/09] | Examination procedure | 09.11.2007 | Examination requested [2007/51] | 13.12.2007 | Despatch of a communication from the examining division (Time limit: M04) | 20.03.2008 | Loss of particular rights, legal effect: designated state(s) | 16.04.2008 | Reply to a communication from the examining division | 23.04.2008 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR | 30.10.2009 | Application withdrawn by applicant [2009/50] | Fees paid | Renewal fee | 17.07.2007 | Renewal fee patent year 03 | 26.03.2008 | Renewal fee patent year 04 | 16.07.2009 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [Y]US5759744 (BRUECK STEVEN R J [US], et al) [Y] 2-4,21 * claims 18,20 *; | [XAY]EP0939343 (CANON KK [JP]) [X] 1,5,6,11-15,19,22,28,34 * paragraphs [0160] , [0183]; figures 2,19 * [A] 8-10,17,20,32 [Y] 2-4,7,21,23-27; | [X]WO0135168 (MASSACHUSETTS INST TECHNOLOGY [US]) [X] 1,13,15,16,18,19,22,29-31,33 * page 15, lines 16-34; figures 1,10b; claim 1 *; | [Y]US6243348 (GOODBERLET JAMES G [US]) [Y] 2,21 * column 11, lines 27-36; figure 12c *; | [Y]US2002105628 (SAITO KENJI [JP], et al) [Y] 7* paragraph [0051] *; | [Y]US6548820 (MERMELSTEIN MICHAEL [US]) [Y] 2,21,23-27 * column 5, lines 48-62 * | by applicant | - APPLIED PHYSICS, (2004), vol. 73, no. 4, pages 455 - 461 |