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EP1635224
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EP About this file: EP1635224
| EP1635224 - Composition for removing a photoresist residue and polymer residue, and residue removal process using the same [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 24.04.2009 Database last updated on 15.06.2024 | Most recent event Tooltip | 24.04.2009 | Application deemed to be withdrawn | published on 27.05.2009 [2009/22] | Applicant(s) | For all designated states Kanto Kagaku Kabushiki Kaisha 2-8, Nihonbashihoncho 3-chome Chuo-ku Tokyo / JP | [2006/11] | Inventor(s) | 01 /
Hata, Kisato c/o Kanto Kagaku K. K. Chuokenkyusho 1-7-1, Inari Soka-shi, Saitama / JP | 02 /
Oowada, Takuo, c/o Kanto Kagaku K. K. Electronic Mat. Div. 2-8, Nihonbashihoncho 3-chome Chuo-ku, Tokyo / JP | [2006/11] | Representative(s) | Flaccus, Rolf-Dieter Flaccus Müller-Wolff Patentanwälte Bussardweg 10 50389 Wesseling / DE | [N/P] |
| Former [2006/11] | Flaccus, Rolf-Dieter Patentanwalt Bussardweg 10 50389 Wesseling / DE | Application number, filing date | 05018230.2 | 23.08.2005 | [2006/11] | Priority number, date | JP20040245717 | 25.08.2004 Original published format: JP 2004245717 | [2006/11] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1635224 | Date: | 15.03.2006 | Language: | EN | [2006/11] | Type: | A3 Search report | No.: | EP1635224 | Date: | 07.05.2008 | [2008/19] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 07.04.2008 | Classification | IPC: | G03F7/42 | [2006/11] | CPC: |
H01L21/02071 (EP,US);
G03F7/42 (KR);
G03F7/426 (EP,US)
| Designated contracting states | (deleted) [2009/03] |
| Former [2006/11] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR | Title | German: | Verfahren und Zusammensetzung zur Entfernung von Photoresist- und Polymerrückständen | [2006/11] | English: | Composition for removing a photoresist residue and polymer residue, and residue removal process using the same | [2006/11] | French: | Procédé et composition pour éliminer des résidus de photoréserve et de polymère | [2006/11] | Examination procedure | 08.11.2008 | Application deemed to be withdrawn, date of legal effect [2009/22] | 29.12.2008 | Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time [2009/22] | Fees paid | Renewal fee | 08.08.2007 | Renewal fee patent year 03 | 19.08.2008 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US4165295 (VANDER MEY JOHN E) [A] 1-7 * claims 1,12 * * column 4, lines 67,68 - column 5, lines 1-8 * * example 1; table 1 ** column 7, lines 13-20 *; | [X]EP1277830 (DAIKIN IND LTD [JP]) [X] 1,3-7 * page 13, paragraph 85; examples 9-28 *; | [PX]WO2004094581 (EKC TECHNOLOGY INC [US], et al) [PX] 1-6 * pages 27,28; examples 1,2 * * pages 18,19, paragraph 72 * |