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EP1669806
European procedure
Extract from the Register of European Patents
EP About this file: EP1669806
| EP1669806 - Lithographic apparatus, reticle exchange unit and device manufacturing method [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 15.01.2010 Database last updated on 03.09.2024 | Most recent event Tooltip | 11.03.2011 | Lapse of the patent in a contracting state New state(s): IT | published on 13.04.2011 [2011/15] | Applicant(s) | For all designated states ASML Netherlands BV De Run 6501 5504 DR Veldhoven / NL | [N/P] |
| Former [2006/24] | For all designated states ASML Netherlands BV 6501, De Run 5504 DR Veldhoven / NL | Inventor(s) | 01 /
Ten Kate, Nicolaas Provincialeweg Noord 66 4286 EC Almkerk / NL | [2006/24] | Representative(s) | Weenink, Willem, et al ASML Netherlands B.V. Corporate Intellectual Property De Run 6501 5500 AH Veldhoven / NL | [N/P] |
| Former [2009/23] | Weenink, Willem, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
| Former [2009/09] | Van den Hooven, Jan, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
| Former [2006/24] | Winckels, Johannes Hubertus F., et al Vereenigde Johan de Wittlaan 7 2517 JR Den Haag / NL | Application number, filing date | 05077821.6 | 07.12.2005 | [2006/24] | Priority number, date | US20040005220 | 07.12.2004 Original published format: US 5220 | [2006/24] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1669806 | Date: | 14.06.2006 | Language: | EN | [2006/24] | Type: | A3 Search report | No.: | EP1669806 | Date: | 03.10.2007 | [2007/40] | Type: | B1 Patent specification | No.: | EP1669806 | Date: | 11.03.2009 | Language: | EN | [2009/11] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 03.09.2007 | Classification | IPC: | G03F7/20 | [2006/24] | CPC: |
G03F1/64 (EP,US);
G03F7/70741 (EP,US);
G03F7/70866 (EP,US);
G03F7/70933 (EP,US);
G03F7/70983 (EP,US)
| Designated contracting states | DE, FR, GB, IT, NL [2008/24] |
| Former [2006/24] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR | Title | German: | Lithographischer Apparat, Vorrichtung für den Wechsel einer Fotomaske und Verfahren zur Herstellung einer Vorrichtung | [2006/24] | English: | Lithographic apparatus, reticle exchange unit and device manufacturing method | [2006/24] | French: | Appareil de lithographie, unité d'échange de masques et procédé de fabrication du dispositif | [2006/24] | Examination procedure | 25.01.2008 | Examination requested [2008/10] | 28.02.2008 | Despatch of a communication from the examining division (Time limit: M04) | 02.05.2008 | Loss of particular rights, legal effect: designated state(s) | 21.05.2008 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HU, IE, IS, LT, LU, LV, MC, PL, PT, RO, SE, SI, SK, TR | 27.06.2008 | Reply to a communication from the examining division | 26.09.2008 | Communication of intention to grant the patent | 26.01.2009 | Fee for grant paid | 26.01.2009 | Fee for publishing/printing paid | Opposition(s) | 14.12.2009 | No opposition filed within time limit [2010/07] | Fees paid | Renewal fee | 13.12.2007 | Renewal fee patent year 03 | 16.12.2008 | Renewal fee patent year 04 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | IT | 11.03.2009 | NL | 11.03.2009 | GB | 07.12.2009 | [2011/15] |
| Former [2011/05] | NL | 11.03.2009 | |
| GB | 07.12.2009 | ||
| Former [2009/45] | NL | 11.03.2009 | Documents cited: | Search | [X]US2001026355 (AOKI TAKASHI [JP], et al) [X] 1,2,4-9,11-15,17-20 * abstract * * paragraphs [0091] - [0109] - [0130] - [0137] *; | [X]US2002126269 (SATO TATSUO [JP]) [X] 1,5-8,11-14,18-20 * abstract * * paragraphs [0013] , [0014] , [0034] , [0061] - [0065] - [0115] - [0128] *; | [A]US2003150329 (KAMONO TAKASHI [JP]) [A] 1,2,4-9,11-15,17-20 * abstract ** paragraphs [0012] , [0053] - [0057] - [0060] , [0061] , [0074] *; | [X] - NELLIS ET AL., "Theoretical analysis of 157-nm hard pellicle system purification via a cyclic purge/fill process", J. MICROLITH., MICROFAB., MICROSYST., (200401), vol. 3, no. 1, pages 122 - 129, XP002446371 [X] 1,5-8,11-14,18-20 * abstract * * the whole document * DOI: http://dx.doi.org/10.1117/1.1630313 | by applicant | US6507390 |