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Extract from the Register of European Patents

EP About this file: EP1767070

EP1767070 - METHOD OF FABRICATING AN ELECTROCHEMICAL DEVICE USING ULTRAFAST PULSED LASER DEPOSITION [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  06.05.2016
Database last updated on 28.05.2024
Most recent event   Tooltip06.05.2016Application deemed to be withdrawnpublished on 08.06.2016  [2016/23]
Applicant(s)For all designated states
Imra America, Inc.
1044 Woodridge Avenue
Ann Arbor, MI 48105 / US
[2007/13]
Inventor(s)01 / CHE, Yong
2859 Chaseway Drive
Ann Arbor, MI 48105 / US
02 / HU, Zhendong
2412 Tamarack Court
Ann Arbor, MI 48105 / US
 [2007/13]
Representative(s)Epping - Hermann - Fischer
Patentanwaltsgesellschaft mbH
Schlossschmidstrasse 5
80639 München / DE
[N/P]
Former [2008/30]Epping - Hermann - Fischer
Patentanwaltsgesellschaft mbH Ridlerstrasse 55
80339 München / DE
Former [2007/13]Epping - Hermann - Fischer
Patentanwaltsgesellschaft mbH Ridlerstrasse 55
80339 München / DE
Application number, filing date05759377.409.06.2005
[2007/13]
WO2005US20403
Priority number, dateUS2004086336209.06.2004         Original published format: US 863362
[2007/13]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO2005125288
Date:29.12.2005
Language:EN
[2005/52]
Type: A2 Application without search report 
No.:EP1767070
Date:28.03.2007
Language:EN
The application published by WIPO in one of the EPO official languages on 29.12.2005 takes the place of the publication of the European patent application.
[2007/13]
Search report(s)International search report - published on:US15.03.2007
(Supplementary) European search report - dispatched on:EP28.03.2008
ClassificationIPC:C23C14/28, C23C14/30, C23C14/00
[2007/18]
CPC:
C23C14/28 (EP,KR,US); H01M10/058 (EP,KR,US); C23C14/086 (EP,KR,US);
H01M4/0426 (EP,KR,US); H01M6/40 (EP,KR,US); H01M10/0472 (EP,KR,US);
Y02E60/10 (EP,KR); Y02P70/50 (EP,KR) (-)
Former IPC [2007/13]H05H1/24
Designated contracting statesCH,   DE,   FI,   FR,   GB,   LI [2007/37]
Former [2007/13]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
Extension statesALNot yet paid
BANot yet paid
HRNot yet paid
LVNot yet paid
MKNot yet paid
YUNot yet paid
TitleGerman:VERFAHREN ZUR HERSTELLUNG EINER ELEKTROCHEMISCHEN EINRICHTUNG UNTER VERWENDUNG EINER ULTRASCHNELLEN GEPULSTEN LASERABLAGERUNG[2007/13]
English:METHOD OF FABRICATING AN ELECTROCHEMICAL DEVICE USING ULTRAFAST PULSED LASER DEPOSITION[2007/13]
French:PROCEDE DE FABRICATION D'UN DISPOSITIF ELECTROCHIMIQUE PAR DEPOT LASER PULSE ULTRARAPIDE[2007/13]
Entry into regional phase06.12.2006National basic fee paid 
06.12.2006Search fee paid 
06.12.2006Designation fee(s) paid 
06.12.2006Examination fee paid 
Examination procedure06.12.2006Examination requested  [2007/13]
05.08.2008Despatch of a communication from the examining division (Time limit: M04)
03.12.2008Reply to a communication from the examining division
05.01.2016Application deemed to be withdrawn, date of legal effect  [2016/23]
02.02.2016Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2016/23]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  05.08.2008
Fees paidRenewal fee
14.06.2007Renewal fee patent year 03
28.03.2008Renewal fee patent year 04
16.06.2009Renewal fee patent year 05
11.06.2010Renewal fee patent year 06
13.06.2011Renewal fee patent year 07
14.06.2012Renewal fee patent year 08
10.06.2013Renewal fee patent year 09
31.03.2014Renewal fee patent year 10
Penalty fee
Additional fee for renewal fee
30.06.201511   M06   Not yet paid
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Documents cited:Search[X]US5432151  (RUSSO RICHARD E [US], et al) [X] 1-28 * column 4, line 45 - column 5, line 68; figure 1; claims 1-7 *;
 [A]WO9913127  (UNIV AUSTRALIAN [AU], et al) [A] 1-28* figure 1; example 1 *;
 [X]  - DOMINGUEZ J E ET AL, "Epitaxial SnO2 thin films grown on (-1012) sapphire by femtosecond pulsed laser deposition", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, (20020201), vol. 91, no. 3, ISSN 0021-8979, pages 1060 - 1065, XP012055596 [X] 1-28 * page 1060, column 2, line 10 - page 1061, column 2, line 19 *

DOI:   http://dx.doi.org/10.1063/1.1426245
International search[X]US5432151  (RUSSO RICHARD E [US], et al);
 [A]US5483037  (MASHBURN DOUGLAS N [US]);
 [Y]US5490912  (WARNER BRUCE E [US], et al);
 [Y]US2002001746  (JENSON MARK L [US]);
 [A]US6372106  (JOHNSON BEN F [US], et al);
 [Y]US6645656  (CHEN XIN [US], et al);
 [Y]US6689504  (MATSUMOTO TOSHIHIRO [JP], et al);
 [Y]  - MILLON E. ET AL., "Femtosecond pulsed-laser deposition of BaTiO3", APPLIED PHYSICS, (2003), vol. A77, pages 73 - 80, XP003009617

DOI:   http://dx.doi.org/10.1007/s00339-002-1958-7
 [A]  - VON DER LINDE D. ET AL., "Laser-solid interaction in the femtosecond time regime", APPLIED SURFACE SCIENCE, (1997), vol. 109, no. 110, pages 1 - 10, XP003009616

DOI:   http://dx.doi.org/10.1016/S0169-4332(96)00611-3
 [A]  - ZHAO S. ET AL., "A solid-state electrolyte lithium phosphorus oxynitride film prepared by pulsed laser deposition", THIN SOLID FILMS, (2002), vol. 415, pages 108 - 113, XP003009615

DOI:   http://dx.doi.org/10.1016/S0040-6090(02)00543-6
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.