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EP1737998
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EP About this file: EP1737998
| EP1737998 - REMOTE CHAMBER METHODS FOR REMOVING SURFACE DEPOSITS [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 05.03.2010 Database last updated on 30.10.2024 | Most recent event Tooltip | 05.03.2010 | Application deemed to be withdrawn | published on 07.04.2010 [2010/14] | Applicant(s) | For all designated states MASSACHUSETTS INSTITUTE OF TECHNOLOGY Technology Licensing Office Five Cambridge Center Kendall Square Room NE25-230 Cambridge, MA 02142-1493 / US | [N/P] |
| Former [2007/01] | For all designated states MASSACHUSETTS INSTITUTE OF TECHNOLOGY Technology Licensing Office, Five Cambridge Center Kendall Square, Room NE25-230 Cambridge, MA 02142-1493 / US | Inventor(s) | 01 /
BAI, Bo 60 Wadsworth Street, Apartment 19A Cambridge, MA 02142 / US | 02 /
SAWIN, Herbert, Harold 15 Larkin Road Chestnut Hill, MA 02467 / US | [2007/01] | Representative(s) | Matthews, Derek Peter Dehns St Bride's House 10 Salisbury Square London EC4Y 8JD / GB | [N/P] |
| Former [2007/01] | Matthews, Derek Peter Frank B. Dehn & Co. St Bride's House 10 Salisbury Square London EC4Y 8JD / GB | Application number, filing date | 05760434.0 | 24.03.2005 | [2007/01] | WO2005US10693 | Priority number, date | US20040556227P | 24.03.2004 Original published format: US 556227 P | US20040640833P | 30.12.2004 Original published format: US 640833 P | US20040640444P | 30.12.2004 Original published format: US 640444 P | [2007/01] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | WO2005090638 | Date: | 29.09.2005 | Language: | EN | [2005/39] | Type: | A2 Application without search report | No.: | EP1737998 | Date: | 03.01.2007 | Language: | EN | The application published by WIPO in one of the EPO official languages on 29.09.2005 takes the place of the publication of the European patent application. | [2007/01] | Search report(s) | International search report - published on: | EP | 16.11.2006 | Classification | IPC: | C23C16/44, H01L21/00 | [2007/01] | CPC: |
H01J37/32862 (EP);
C23C16/44 (KR);
B08B7/0035 (EP);
C23C16/4405 (EP);
C23F4/00 (KR);
H01L21/00 (KR);
Y02C20/30 (EP)
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| Designated contracting states | DE, FR, GB, IE, IT, NL [2007/26] |
| Former [2007/01] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR | Extension states | AL | Not yet paid | BA | Not yet paid | HR | Not yet paid | LV | Not yet paid | MK | Not yet paid | YU | Not yet paid | Title | German: | FERNKAMMERVERFAHREN ZUM ENTFERNEN VON OBERFLÄCHENABLAGERUNGEN | [2007/01] | English: | REMOTE CHAMBER METHODS FOR REMOVING SURFACE DEPOSITS | [2007/01] | French: | PROCEDE A CHAMBRE SEPAREE POUR L'ELIMINATION DES DEPOTS DE SURFACE | [2007/01] | Entry into regional phase | 06.10.2006 | National basic fee paid | 06.10.2006 | Designation fee(s) paid | 06.10.2006 | Examination fee paid | Examination procedure | 06.10.2006 | Examination requested [2007/01] | 01.10.2009 | Application deemed to be withdrawn, date of legal effect [2010/14] | 16.11.2009 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2010/14] | Fees paid | Renewal fee | 14.03.2007 | Renewal fee patent year 03 | 14.03.2008 | Renewal fee patent year 04 | Penalty fee | Additional fee for renewal fee | 31.03.2009 | 05 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [A]EP1304731 (RES INST INNOVATIVE TECH EARTH [JP]) [A] 1-16 * paragraph [0055] - paragraph [0060] *; | [XDA] - OH C H ET AL, "Effect of N-containing additive gases on global warming gas emission during remote plasma cleaning process of silicon nitride PECVD chamber using C4F8/O2/Ar chemistry", SURFACE & COATINGS TECHNOLOGY ELSEVIER SWITZERLAND, (20030701), vol. 171, no. 1-3, ISSN 0257-8972, pages 267 - 272, XP002362634 [XD] 12-15 * section 2. Experimental; figs 1& 2 * [A] 1-11,16 DOI: http://dx.doi.org/10.1016/S0257-8972(03)00284-6 | [A] - CRUDEN BRETT A ET AL, "Neutral gas temperature estimate in CF4/O2/Ar inductively coupled plasmas", APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, US, (20020805), vol. 81, no. 6, ISSN 0003-6951, pages 990 - 992, XP012033207 [A] 1-11 * the whole document * DOI: http://dx.doi.org/10.1063/1.1497998 | [A] - ALLGOOD C ET AL, "Evaluation of octafluorocyclobutane as a chamber clean gas in a plasma-enhanced silicon dioxide chemical vapor deposition reactor", JOURNAL OF THE ELECTROCHEMICAL SOCIETY, ELECTROCHEMICAL SOCIETY. MANCHESTER, NEW HAMPSHIRE, US, (2003), vol. 150, no. 2, ISSN 0013-4651, pages G122 - G126, XP002280013 [A] 5,6 * the whole document * DOI: http://dx.doi.org/10.1149/1.1535911 |