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Extract from the Register of European Patents

EP About this file: EP1787320

EP1787320 - PROCESS FOR FABRICATING A SELF-ALIGNED DEPOSITED SOURCE/DRAIN INSULATED GATE FIELD-EFFECT TRANSISTOR [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  03.08.2012
Database last updated on 15.06.2024
Most recent event   Tooltip18.07.2014Lapse of the patent in a contracting state
New state(s): HU		published on 20.08.2014  [2014/34]
Applicant(s)For all designated states
Acorn Technologies, Inc.
Suite 305, 881 Alma Real Drive
Pacific Palisades, CA 90272 / US
[2007/21]
Inventor(s)01 / GRUPP, Daniel, E.
334 Leland Ave.
Palo Alto, California 94306 / US
02 / CONNELLY, Daniel, J.
924 Potrero Avenue
San Francisco, California 94110 / US
03 / CLIFTON, Paul, A.
881 Alma Real Drive, Suite 305
Pacific Palisafes, CA 90272 / US
04 / FAULKNER, Carl, A.
2847 Alhambra Drive
Belmont, California 94002 / US
 [2007/48]
Former [2007/21]01 / GRUPP, Daniel, E.
334 Leland Ave.
Palo Alto, California 94306 / US
02 / CONNELLY, Daniel, J.
924 Potrero Avenue
San Francisco, California 94110 / US
03 / CLIFTON, Paul, A.
675 Sharon Park Drive, 321
Menlo Park, California 94025 / US
04 / FAULKNER, Carl, A.
2847 Alhambra Drive
Belmont, California 94002 / US
Representative(s)Cross, Rupert Edward Blount
Boult Wade Tennant
Verulam Gardens
70 Gray's Inn Road
London WC1X 8BT / GB
[N/P]
Former [2011/39]Cross, Rupert Edward Blount
Boult Wade Tennant Verulam Gardens 70 Gray's Inn Road
London WC1X 8BT / GB
Former [2007/21]Cross, Rupert Edward Blount
Boult Wade Tennant Verulam Gardens 70 Gray's Inn Road
London WC1X 8BT / GB
Application number, filing date05790815.424.08.2005
[2007/21]
WO2005US30209
Priority number, dateUS20040604868P26.08.2004         Original published format: US 604868 P
US2005016628623.06.2005         Original published format: US 166286
[2007/21]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO2006026339
Date:09.03.2006
Language:EN
[2006/10]
Type: A2 Application without search report 
No.:EP1787320
Date:23.05.2007
Language:EN
The application published by WIPO in one of the EPO official languages on 09.03.2006 takes the place of the publication of the European patent application.
[2007/21]
Type: B1 Patent specification 
No.:EP1787320
Date:28.09.2011
Language:EN
[2011/39]
Search report(s)International search report - published on:EP04.05.2006
ClassificationIPC:H01L21/336, H01L29/78, H01L29/45
[2011/39]
CPC:
H01L29/785 (EP,US); H01L29/0895 (EP,US); H01L29/41791 (EP,US);
H01L29/458 (EP,US); H01L29/66545 (EP,US); H01L29/66553 (EP,US);
H01L29/66583 (EP,US); H01L29/66636 (EP,US); H01L29/66772 (EP,US);
H01L29/66795 (EP,US); H01L29/78618 (EP,US); H01L2029/7858 (EP,US);
H01L21/28079 (EP,US); H01L21/7624 (EP,US); H01L29/495 (EP,US);
H01L29/78 (EP,US) (-)
Former IPC [2007/21]H01L21/336, H01L29/786
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2007/21]
TitleGerman:PROZESS ZUR HERSTELLUNG EINES FELDEFFEKTTRANSISTORS MIT ISOLIERTEM GATE MIT SELBSTAUSGERICHTETEM ABGELAGERTEM SOURCE-/ DRAINBEREICH[2007/21]
English:PROCESS FOR FABRICATING A SELF-ALIGNED DEPOSITED SOURCE/DRAIN INSULATED GATE FIELD-EFFECT TRANSISTOR[2007/21]
French:PROCEDE DE FABRICATION D'UN TRANSISTOR A EFFET DE CHAMP A GRILLE ISOLEE, A SOURCE/DRAIN DEPOSE(E) ET A AUTO-ALIGNEMENT[2007/21]
Entry into regional phase12.03.2007National basic fee paid 
12.03.2007Designation fee(s) paid 
12.03.2007Examination fee paid 
Examination procedure24.05.2006Request for preliminary examination filed
International Preliminary Examining Authority: EP
12.03.2007Amendment by applicant (claims and/or description)
12.03.2007Examination requested  [2007/21]
28.03.2011Communication of intention to grant the patent
04.08.2011Fee for grant paid
04.08.2011Fee for publishing/printing paid
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  28.03.2011
Opposition(s)29.06.2012No opposition filed within time limit [2012/36]
Fees paidRenewal fee
28.08.2007Renewal fee patent year 03
27.08.2008Renewal fee patent year 04
24.08.2009Renewal fee patent year 05
17.08.2010Renewal fee patent year 06
11.08.2011Renewal fee patent year 07
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU24.08.2005
AT28.09.2011
BE28.09.2011
CY28.09.2011
CZ28.09.2011
DK28.09.2011
EE28.09.2011
FI28.09.2011
IT28.09.2011
LT28.09.2011
LV28.09.2011
NL28.09.2011
PL28.09.2011
RO28.09.2011
SE28.09.2011
SI28.09.2011
SK28.09.2011
TR28.09.2011
BG28.12.2011
GR29.12.2011
ES08.01.2012
IS28.01.2012
PT30.01.2012
[2014/34]
Former [2014/21]AT28.09.2011
BE28.09.2011
CY28.09.2011
CZ28.09.2011
DK28.09.2011
EE28.09.2011
FI28.09.2011
IT28.09.2011
LT28.09.2011
LV28.09.2011
NL28.09.2011
PL28.09.2011
RO28.09.2011
SE28.09.2011
SI28.09.2011
SK28.09.2011
TR28.09.2011
BG28.12.2011
GR29.12.2011
ES08.01.2012
IS28.01.2012
PT30.01.2012
Former [2013/29]AT28.09.2011
BE28.09.2011
CY28.09.2011
CZ28.09.2011
DK28.09.2011
EE28.09.2011
FI28.09.2011
IT28.09.2011
LT28.09.2011
LV28.09.2011
NL28.09.2011
PL28.09.2011
RO28.09.2011
SE28.09.2011
SI28.09.2011
SK28.09.2011
BG28.12.2011
GR29.12.2011
ES08.01.2012
IS28.01.2012
PT30.01.2012
Former [2013/22]AT28.09.2011
BE28.09.2011
CY28.09.2011
CZ28.09.2011
DK28.09.2011
EE28.09.2011
FI28.09.2011
IT28.09.2011
LT28.09.2011
LV28.09.2011
NL28.09.2011
PL28.09.2011
RO28.09.2011
SE28.09.2011
SI28.09.2011
SK28.09.2011
GR29.12.2011
ES08.01.2012
IS28.01.2012
PT30.01.2012
Former [2012/37]AT28.09.2011
BE28.09.2011
CY28.09.2011
CZ28.09.2011
DK28.09.2011
EE28.09.2011
FI28.09.2011
IT28.09.2011
LT28.09.2011
LV28.09.2011
NL28.09.2011
PL28.09.2011
RO28.09.2011
SE28.09.2011
SI28.09.2011
SK28.09.2011
GR29.12.2011
IS28.01.2012
PT30.01.2012
Former [2012/35]AT28.09.2011
BE28.09.2011
CY28.09.2011
CZ28.09.2011
DK28.09.2011
EE28.09.2011
FI28.09.2011
IT28.09.2011
LT28.09.2011
LV28.09.2011
NL28.09.2011
RO28.09.2011
SE28.09.2011
SI28.09.2011
SK28.09.2011
GR29.12.2011
IS28.01.2012
PT30.01.2012
Former [2012/23]AT28.09.2011
BE28.09.2011
CY28.09.2011
CZ28.09.2011
EE28.09.2011
FI28.09.2011
IT28.09.2011
LT28.09.2011
LV28.09.2011
NL28.09.2011
RO28.09.2011
SE28.09.2011
SI28.09.2011
SK28.09.2011
GR29.12.2011
IS28.01.2012
PT30.01.2012
Former [2012/21]AT28.09.2011
BE28.09.2011
CY28.09.2011
CZ28.09.2011
FI28.09.2011
LT28.09.2011
LV28.09.2011
SE28.09.2011
SI28.09.2011
GR29.12.2011
IS28.01.2012
Former [2012/18]AT28.09.2011
BE28.09.2011
CY28.09.2011
FI28.09.2011
LT28.09.2011
LV28.09.2011
SE28.09.2011
SI28.09.2011
GR29.12.2011
Former [2012/12]AT28.09.2011
CY28.09.2011
FI28.09.2011
LT28.09.2011
LV28.09.2011
SE28.09.2011
SI28.09.2011
GR29.12.2011
Former [2012/11]AT28.09.2011
FI28.09.2011
LT28.09.2011
LV28.09.2011
SE28.09.2011
SI28.09.2011
GR29.12.2011
Former [2012/10]FI28.09.2011
LT28.09.2011
SE28.09.2011
GR29.12.2011
Former [2012/09]FI28.09.2011
LT28.09.2011
Former [2012/08]LT28.09.2011
Cited inInternational search[X]US5943575  (CHUNG SHIN YOUNG [KR]) [X] 1-3 * figure 3 *;
 [X]US6091076  (DELEONIBUS SIMON [FR]) [X] 1-3* paragraph [0061]; figures 9,14 *;
 [XA]US2004142524  (GRUPP DANIEL E [US], et al) [X] 1-6,10-46 * figures 4,5 * [A] 7-9
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.