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Extract from the Register of European Patents

EP About this file: EP1779190

EP1779190 - SILICON-INSULATOR THIN-FILM STRUCTURES FOR OPTICAL MODULATORS AND METHODS OF MANUFACTURE [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  21.08.2009
Database last updated on 04.06.2024
Most recent event   Tooltip21.08.2009Application deemed to be withdrawnpublished on 23.09.2009  [2009/39]
Applicant(s)For all designated states
Honeywell International Inc.
101 Columbia Road
Morristown, NJ 07960 / US
[N/P]
Former [2008/38]For all designated states
Honeywell International Inc.
101 Columbia Avenue P.O. Box 2245
Morristown NJ 07960 / US
Former [2007/18]For all designated states
Honeywell International Inc.
101 Columbia Road P.O. Box 2245
Morristown, NJ 07960 / US
Inventor(s)01 / KEYSER, Thomas
3835 Yellowstone Ct
Plymouth, MN, 55446 / US
02 / LARSEN, Bradley, J.
1090 Wildhurst Trail
Mound, MN 5564 / US
03 / YUE, Cheisan, J.
1764 Skillman Ave.
Roseville, MN 55113 / US
 [2007/18]
Representative(s)Hucker, Charlotte Jane
Gill Jennings & Every LLP The Broadgate Tower
20 Primrose Street
London
EC2A 2ES / GB
[N/P]
Former [2007/21]Hucker, Charlotte Jane
Gill Jennings & Every LLP Broadgate House 7 Eldon Street
London EC2M 7LH / GB
Former [2007/18]Smee, Anthony James Michael
Gill Jennings & Every LLP Broadgate House 7 Eldon Street
London EC2M 7LH / GB
Application number, filing date05810130.410.08.2005
[2007/18]
WO2005US28391
Priority number, dateUS2004091529910.08.2004         Original published format: US 915299
[2007/18]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO2006017847
Date:16.02.2006
Language:EN
[2006/07]
Type: A2 Application without search report 
No.:EP1779190
Date:02.05.2007
Language:EN
The application published by WIPO in one of the EPO official languages on 16.02.2006 takes the place of the publication of the European patent application.
[2007/18]
Search report(s)International search report - published on:EP18.05.2006
ClassificationIPC:G02F1/25, G02B6/132, G02F1/225
[2007/18]
CPC:
G02B6/132 (EP,US); G02B6/131 (EP,US); G02F1/025 (EP,US)
Designated contracting statesFR,   GB [2007/46]
Former [2007/18]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
Extension statesALNot yet paid
BANot yet paid
HRNot yet paid
MKNot yet paid
YUNot yet paid
TitleGerman:SILIZIUMISOLATOR-DÜNNSCHICHTSTRUKTUREN FÜR OPTISCHE MODULATOREN UND HERSTELLUNGSVERFAHREN[2007/18]
English:SILICON-INSULATOR THIN-FILM STRUCTURES FOR OPTICAL MODULATORS AND METHODS OF MANUFACTURE[2007/18]
French:STRUCTURES DE FILM MINCE SILICIUM-ISOLANT-SILICIUM DESTINEES A DES MODULATEURS OPTIQUES ET PROCEDES DE FABRICATION ASSOCIES[2007/18]
Entry into regional phase09.02.2007National basic fee paid 
09.02.2007Designation fee(s) paid 
09.02.2007Examination fee paid 
Examination procedure08.03.2006Request for preliminary examination filed
International Preliminary Examining Authority: EP
09.02.2007Examination requested  [2007/18]
15.02.2007Amendment by applicant (claims and/or description)
14.08.2007Despatch of a communication from the examining division (Time limit: M06)
25.02.2008Reply to a communication from the examining division
18.09.2008Despatch of a communication from the examining division (Time limit: M06)
31.03.2009Application deemed to be withdrawn, date of legal effect  [2009/39]
08.05.2009Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2009/39]
Fees paidRenewal fee
03.08.2007Renewal fee patent year 03
19.06.2008Renewal fee patent year 04
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Cited inInternational search[X]US6323985  (MALONEY TIMOTHY J [US]) [X] 1-4,7,13-24,50-63 * column 5, line 39 - column 6, line 7; figure 3 *;
 [XP]WO2004088394  (SIOPTICAL INC [US]) [XP] 1-63* pages 8-11; figures 2-5 *;
 [XY]  - LIU A ET AL, "A HIGH-SPEED SILICON OPTICAL MODULATOR BASED ON A METAL-OXIDE-SEMICONDUCTOR CAPACITOR", NATURE, NATURE PUBLISHING GROUP, LONDON, GB, (20040212), vol. 427, ISSN 0028-0836, pages 615 - 618, XP001188890 [X] 1-4,7,13-24,50-63 * the whole document * [Y] 5,6,8-12,25-49

DOI:   http://dx.doi.org/10.1038/nature02310
 [XY]  - LIU A ET AL, "Fast silicon optical modulator", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, (200407), vol. 5357, ISSN 0277-786X, pages 35 - 44, XP002332586 [X] 1-4,7,13-24,50-63 * the whole document * [Y] 5,6,8-12,25-49

DOI:   http://dx.doi.org/10.1117/12.531994
 [Y]  - AHMED S S ET AL, "Nitrided thermal SiO2 for use as top and bottom gate insulators in self-aligned double gate silicon-on-insulator metal-oxide-semiconductor field effect transistor", JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (MICROELECTRONICS AND NANOMETER STRUCTURES) AIP FOR AMERICAN VACUUM SOC USA, (200105), vol. 19, no. 3, ISSN 0734-211X, pages 800 - 806, XP012008790 [Y] 5,6,8-12,25-49 * Sections I and II *

DOI:   http://dx.doi.org/10.1116/1.1364698
 [Y]  - AHMED S S ET AL, "Nitrided thermal SiO2 for thin buried gate insulators in dual gate SOI-MOSFET", UNIVERSITY/GOVERNMENT/INDUSTRY MICROELECTRONICS SYMPOSIUM, 1999. PROCEEDINGS OF THE THIRTEENTH BIENNIAL MINNEAPOLIS, MN, USA 20-23 JUNE 1999, PISCATATWAY, NJ, USA,IEEE, US, (19990620), ISBN 0-7803-5240-8, pages 43 - 46, XP010345902 [Y] 5,6,8-12,25-49 * the whole document *

DOI:   http://dx.doi.org/10.1109/UGIM.1999.782819
 [A]  - PNG C E ET AL, "Development of small silicon modulators in silicon-on-insulator (SOI)", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, (2003), vol. 4997, ISSN 0277-786X, pages 190 - 197, XP002329756 [A] 1-63 * the whole document *

DOI:   http://dx.doi.org/10.1117/12.476666
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.