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Extract from the Register of European Patents

EP About this file: EP1825510

EP1825510 - METHOD FOR COLLECTIVELY PRODUCING A SUPERIMPOSED ELEMENT MICROSTRUCTURE [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  21.05.2010
Database last updated on 11.09.2024
Most recent event   Tooltip21.05.2010No opposition filed within time limitpublished on 23.06.2010  [2010/25]
Applicant(s)For all designated states
E2V Semiconductors
Avenue de Rochepleine
38120 Saint Egreve / FR
For all designated states
Tracit Technologies
Parc Technologique des Fontaines Chemin des Franques
38190 Bernin / FR
[2009/29]
Former [2007/35]For all designated states
E2V SEMICONDUCTORS
Avenue de Rochepleine
38120 Saint Egreve / FR
For all designated states
Tracit Technologies
Parc Technologique des Fontaines Chemin des Franques
38190 Bernin / FR
Inventor(s)01 / ROMMEVEAUX, Philippe
6 LOT LES VOUTES
F-38500 COUBLEVIE / FR
02 / ASPAR, Bernard
110 Lot Le Hameau des Ayes
F-38140 RIVES / FR
 [2007/35]
Representative(s)Guérin, Michel
Marks & Clerk France
Conseils en Propriété Industrielle
Immeuble Visium
22, Avenue Aristide Briand
94117 Arcueil Cedex / FR
[N/P]
Former [2007/35]Guérin, Michel
Marks & Clerk France 31-33 Avenue Aristide Briand
94117 Arcueil Cédex / FR
Application number, filing date05815827.008.12.2005
[2007/35]
WO2005EP56599
Priority number, dateFR2004001334515.12.2004         Original published format: FR 0413345
[2007/35]
Filing languageFR
Procedural languageFR
PublicationType: A1 Application with search report
No.:WO2006063961
Date:22.06.2006
Language:FR
[2006/25]
Type: A1 Application with search report 
No.:EP1825510
Date:29.08.2007
Language:FR
The application published by WIPO in one of the EPO official languages on 22.06.2006 takes the place of the publication of the European patent application.
[2007/35]
Type: B1 Patent specification 
No.:EP1825510
Date:15.07.2009
Language:FR
[2009/29]
Search report(s)International search report - published on:EP22.06.2006
ClassificationIPC:H01L23/02
[2007/35]
CPC:
B81C1/0023 (EP,US); H01L23/02 (KR); H01L27/1462 (EP,US);
H01L2224/45124 (EP,US); H01L2224/45144 (EP,US); H01L2224/48091 (EP,US);
H01L2924/10253 (EP,US); H01L2924/1461 (EP,US) (-)
C-Set:
H01L2224/45124, H01L2924/00 (US,EP);
H01L2224/45144, H01L2924/00 (US,EP);
H01L2224/48091, H01L2924/00014 (EP,US);
H01L2924/10253, H01L2924/00 (US,EP);
H01L2924/1461, H01L2924/00 (EP,US)
(-)
Designated contracting statesDE,   FI,   FR,   GB,   IT,   NL [2008/13]
Former [2007/35]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
Extension statesALNot yet paid
BANot yet paid
HRNot yet paid
MKNot yet paid
YUNot yet paid
TitleGerman:VERFAHREN ZUM KOLLEKTIVEN PRODUZIEREN EINER ELEMENTÜBERLAGERUNGS-MIKROSTRUKTUR[2007/35]
English:METHOD FOR COLLECTIVELY PRODUCING A SUPERIMPOSED ELEMENT MICROSTRUCTURE[2007/35]
French:PROCEDE DE FABRICATION COLLECTIVE DE MICROSTRUCTURES A ELEMENTS SUPERPOSES[2007/35]
Entry into regional phase08.06.2007National basic fee paid 
08.06.2007Designation fee(s) paid 
08.06.2007Examination fee paid 
Examination procedure07.09.2006Request for preliminary examination filed
International Preliminary Examining Authority: EP
08.06.2007Examination requested  [2007/35]
02.03.2009Communication of intention to grant the patent
05.06.2009Fee for grant paid
05.06.2009Fee for publishing/printing paid
Opposition(s)16.04.2010No opposition filed within time limit [2010/25]
Fees paidRenewal fee
12.12.2007Renewal fee patent year 03
15.12.2008Renewal fee patent year 04
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Cited inInternational search[X]US6407381  (GLENN THOMAS P [US], et al) [X] 1-11 * figures 1,2,5-11 *;
 [A]US5668033  (OHARA FUMIO [JP], et al) [A] 1,2,4,5 * figures 10-14,17,18 *;
 [A]US2002170175  (AIGNER ROBERT [DE], et al) [A] 1,2,5 * paragraph [0023]; figures 1-3,7a-7b,8a-8b *;
 [A]WO2004008522  (AUSTRIAMICROSYSTEMS AG [AT], et al) [A] 1,3 * figure 4 *;
 [A]US6555901  (YOSHIHARA SHINJI [JP], et al) [A] 1,2 * figures 14,17 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.