blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability
Register Forum

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP1703547

EP1703547 - Method and device for controlling the contamination of wafer substrates [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  20.07.2012
Database last updated on 02.09.2024
Most recent event   Tooltip18.07.2014Lapse of the patent in a contracting state
New state(s): HU
published on 20.08.2014  [2014/34]
Applicant(s)For all designated states
Adixen Vacuum Products
98 Avenue de Brogny
74009 Annecy / FR
[2011/41]
Former [2007/15]For all designated states
Alcatel Lucent
54 rue La Boétie
75008 Paris / FR
Former [2006/38]For all designated states
ALCATEL
54, rue La Boétie
75008 Paris / FR
Inventor(s)01 / Favre, Arnaud
/ 17bis, avenue de Novel
74000, ANNECY / FR
02 / Thollot, Rémi
/ 196, rue du Mont Blanc
74350, CRUSEILLES / FR
03 / Metais, Xavier
3, rue Fançois Vernex
74960 Meythet / FR
04 / Desbiolles, Jean-Pierre
/ Les Follats
74350, CRUSEILLES / FR
 [2011/37]
Former [2006/38]01 / Favre, Arnaud
17bis, avenue de Novel
74000, ANNECY / FR
02 / Thollot, Rémi
196, rue du Mont Blanc
74350, CRUSEILLES / FR
03 / Metais, Xavier
3, rue Fançois Vernex
74960 Meythet / FR
04 / Desbiolles, Jean-Pierre
Les Follats
74350, CRUSEILLES / FR
Representative(s)Croonenbroek, Thomas Jakob
Innovincia
11, avenue des Tilleuls
74200 Thonon-les-Bains / FR
[N/P]
Former [2011/37]Croonenbroek, Thomas Jakob
Cabinet Innovincia 11, avenue des Tilleuls
74200 Thonon-les-Bains / FR
Former [2011/21]Croonenbroek, Thomas Jakob
Cabinet Innovincia 11, avenue des Tilleuls
74200 Thonon-les-Bains / FR
Former [2008/46]Chaffraix, Sylvain
Alcatel Lucent Intellectual Property & Standards 54 rue La Boétie
75008 Paris / FR
Former [2006/38]Chaffraix, Sylvain
COMPAGNIE FINANCIERE ALCATEL Département Propriété Industrielle 54, rue La Boétie
75008 Paris / FR
Application number, filing date06300207.507.03.2006
[2006/38]
Priority number, dateFR2005005070318.03.2005         Original published format: FR 0550703
[2006/38]
Filing languageFR
Procedural languageFR
PublicationType: A2 Application without search report 
No.:EP1703547
Date:20.09.2006
Language:FR
[2006/38]
Type: A3 Search report 
No.:EP1703547
Date:20.08.2008
[2008/34]
Type: B1 Patent specification 
No.:EP1703547
Date:14.09.2011
Language:FR
[2011/37]
Type: B8 Corrected title page of specification 
No.:EP1703547
Date:14.03.2012
[2012/11]
Search report(s)(Supplementary) European search report - dispatched on:EP17.07.2008
ClassificationIPC:H01L21/00
[2006/38]
CPC:
H01L21/67253 (EP,US); F24F12/003 (KR); F24F13/28 (KR);
F24F13/30 (KR); F24F7/08 (KR); H01L21/67389 (EP,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2006/38]
TitleGerman:Verfahren und Vorrichtung zur Kontrolle der Verunreinigung von Wafersubstraten[2006/38]
English:Method and device for controlling the contamination of wafer substrates[2006/38]
French:Procédé et dispositif pour le contrôle de la contamination des plaquettes de substrat[2006/38]
Examination procedure10.10.2008Examination requested  [2009/18]
29.04.2009Despatch of a communication from the examining division (Time limit: M06)
09.11.2009Reply to a communication from the examining division
16.03.2011Communication of intention to grant the patent
12.07.2011Fee for grant paid
12.07.2011Fee for publishing/printing paid
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  29.04.2009
Opposition(s)15.06.2012No opposition filed within time limit [2012/34]
Fees paidRenewal fee
13.03.2008Renewal fee patent year 03
13.03.2009Renewal fee patent year 04
26.03.2010Renewal fee patent year 05
28.03.2011Renewal fee patent year 06
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU07.03.2006
AT14.09.2011
CY14.09.2011
CZ14.09.2011
DK14.09.2011
EE14.09.2011
FI14.09.2011
LT14.09.2011
LV14.09.2011
NL14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
TR14.09.2011
BG14.12.2011
GR15.12.2011
ES25.12.2011
IS14.01.2012
PT16.01.2012
LU07.03.2012
MC31.03.2012
[2014/34]
Former [2014/27]AT14.09.2011
CY14.09.2011
CZ14.09.2011
DK14.09.2011
EE14.09.2011
FI14.09.2011
LT14.09.2011
LV14.09.2011
NL14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
TR14.09.2011
BG14.12.2011
GR15.12.2011
ES25.12.2011
IS14.01.2012
PT16.01.2012
LU07.03.2012
MC31.03.2012
Former [2014/21]AT14.09.2011
CY14.09.2011
CZ14.09.2011
DK14.09.2011
EE14.09.2011
FI14.09.2011
LT14.09.2011
LV14.09.2011
NL14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
TR14.09.2011
BG14.12.2011
GR15.12.2011
ES25.12.2011
IS14.01.2012
PT16.01.2012
MC31.03.2012
Former [2013/29]AT14.09.2011
CY14.09.2011
CZ14.09.2011
DK14.09.2011
EE14.09.2011
FI14.09.2011
LT14.09.2011
LV14.09.2011
NL14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
BG14.12.2011
GR15.12.2011
ES25.12.2011
IS14.01.2012
PT16.01.2012
MC31.03.2012
Former [2013/22]AT14.09.2011
CY14.09.2011
CZ14.09.2011
DK14.09.2011
EE14.09.2011
FI14.09.2011
LT14.09.2011
LV14.09.2011
NL14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
GR15.12.2011
ES25.12.2011
IS14.01.2012
PT16.01.2012
MC31.03.2012
Former [2012/47]AT14.09.2011
CY14.09.2011
CZ14.09.2011
DK14.09.2011
EE14.09.2011
FI14.09.2011
LT14.09.2011
LV14.09.2011
NL14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
GR15.12.2011
IS14.01.2012
PT16.01.2012
MC31.03.2012
Former [2012/35]AT14.09.2011
CY14.09.2011
CZ14.09.2011
DK14.09.2011
EE14.09.2011
FI14.09.2011
LT14.09.2011
LV14.09.2011
NL14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
GR15.12.2011
IS14.01.2012
PT16.01.2012
Former [2012/26]AT14.09.2011
CY14.09.2011
CZ14.09.2011
EE14.09.2011
FI14.09.2011
LT14.09.2011
LV14.09.2011
NL14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
GR15.12.2011
IS14.01.2012
PT16.01.2012
Former [2012/23]AT14.09.2011
CY14.09.2011
CZ14.09.2011
EE14.09.2011
FI14.09.2011
LT14.09.2011
LV14.09.2011
NL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
GR15.12.2011
IS14.01.2012
PT16.01.2012
Former [2012/21]AT14.09.2011
CY14.09.2011
CZ14.09.2011
FI14.09.2011
LT14.09.2011
LV14.09.2011
SE14.09.2011
SI14.09.2011
GR15.12.2011
IS14.01.2012
Former [2012/12]AT14.09.2011
CY14.09.2011
FI14.09.2011
LT14.09.2011
LV14.09.2011
SE14.09.2011
SI14.09.2011
GR15.12.2011
Former [2012/11]AT14.09.2011
FI14.09.2011
LT14.09.2011
LV14.09.2011
SE14.09.2011
SI14.09.2011
GR15.12.2011
Former [2012/10]FI14.09.2011
LT14.09.2011
SE14.09.2011
GR15.12.2011
Former [2012/09]FI14.09.2011
LT14.09.2011
Former [2012/08]LT14.09.2011
Documents cited:Search[A]US5233191  (NOGUCHI MINORI [JP], et al) [A] 1-28 * abstract *;
 [A]US6287023  (YAEGASHI HIDETAMI [JP], et al) [A] 1,23 * abstract *;
 [DA]DE10133520  (SIEMENS AG [DE], et al) [DA] 1-28* abstract *;
 [DA]US2004023419  (KISHKOVICH OLEG P [US], et al) [DA] 1-28 * abstract *
by applicantDE10133520
 US2004023419
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.