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EP1918414
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EP About this file: EP1918414
| EP1918414 - Film deposition of amorphous silicon films with a graded bandgap by electron cyclotron resonance [Right-click to bookmark this link] | |||
| Former [2008/19] | Film deposition of amorphous films with a graded bandgap by electron cyclotron resonance | ||
| [2015/18] | Status | The application is deemed to be withdrawn Status updated on 04.03.2016 Database last updated on 24.08.2024 | Most recent event Tooltip | 04.03.2016 | Application deemed to be withdrawn | published on 06.04.2016 [2016/14] | Applicant(s) | For all designated states Dow Corning Corporation 2200 West Salzburg Road Midland MI 48686-0994 / US | For all designated states Ecole Polytechnique 91128 Palaiseau / FR | [N/P] |
| Former [2008/19] | For all designated states Dow Corning Corporation 2200 West Salzburg Road Midland MI 48686-0994 / US | ||
| For all designated states Ecole Polytechnique 91128 Palaiseau / FR | Inventor(s) | 01 /
Roca i Cabarrocas 13 bis rue Girardot 91140 Villebon sur Yvette / FR | 02 /
Bulkin, Pavel c/o 4C Résidence Clos d'Alençon 35 avenue du General de Gaulle 91440 Villebon sur Yvette / FR | 03 /
Daineka Dmitri 7 rés. Parc d'Ardenay 91120 Palaiseau / FR | 04 /
Leempoel Patrick 500 Avenue Dolez 1180 Brussels / BE | 05 /
Descamps Pierre 44 Clos de la Mare aux Loups 1330 Rixensart / BE | 06 /
Kervyn de Meerendré 2 Avenue Xavier Henrard 1150 Brussels / BE | [2008/19] | Representative(s) | Greene, Simon Kenneth, et al Elkington and Fife LLP Prospect House 8 Pembroke Road Sevenoaks, Kent TN13 1XR / GB | [N/P] |
| Former [2013/28] | Greene, Simon Kenneth, et al Elkington and Fife LLP Prospect House 8 Pembroke Road Sevenoaks Kent TN13 1XR / GB | ||
| Former [2013/25] | Portch, Daniel, et al Elkington and Fife LLP Prospect House 8 Pembroke Road Sevenoaks, Kent TN13 1XR / GB | ||
| Former [2008/19] | Boon, Graham Anthony, et al Elkington and Fife LLP, Prospect House, 8 Pembroke Road Sevenoaks Kent TN13 1XR / GB | Application number, filing date | 06301119.1 | 02.11.2006 | [2008/19] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP1918414 | Date: | 07.05.2008 | Language: | EN | [2008/19] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 27.06.2007 | Classification | IPC: | C23C16/455, C23C16/24, C23C16/511, H01J37/32, H01L31/20 | [2015/18] | CPC: |
C23C16/511 (EP,KR,US);
C23C16/24 (EP,KR,US);
C23C16/45523 (EP,US);
H01J37/32 (KR);
H01J37/32192 (EP,US);
H01J37/32678 (EP,US);
H01L31/20 (EP,KR,US)
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| Former IPC [2008/19] | C23C16/24, C23C16/511, H01J37/32, H01L31/20 | Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR [2008/19] | Title | German: | Verfahren zur Bildung eines Films aus amorphes Silizium mit gradiertem Bandabstand durch Elektronzyklotronresonanz | [2015/18] | English: | Film deposition of amorphous silicon films with a graded bandgap by electron cyclotron resonance | [2015/18] | French: | Procédé de formation d'un film de amorphe silicium à interval de bande graduel par résonance cyclonique électronique | [2015/18] |
| Former [2008/19] | Verfahren zur Bildung eines Films aus amorphen Materialen mit gradiertem Bandabstand durch Elektronzyklotronresonanz | ||
| Former [2008/19] | Film deposition of amorphous films with a graded bandgap by electron cyclotron resonance | ||
| Former [2008/19] | Procédé de formation d'un film amorphe à intervalle de bande graduel par résonance cyclonique électronique | Examination procedure | 06.08.2008 | Examination requested [2008/38] | 17.09.2008 | Despatch of a communication from the examining division (Time limit: M06) | 19.03.2009 | Reply to a communication from the examining division | 12.06.2013 | Despatch of a communication from the examining division (Time limit: M04) | 21.10.2013 | Reply to a communication from the examining division | 28.05.2015 | Communication of intention to grant the patent | 08.10.2015 | Application deemed to be withdrawn, date of legal effect [2016/14] | 17.11.2015 | Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time [2016/14] | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 17.09.2008 | Fees paid | Renewal fee | 14.01.2009 | Renewal fee patent year 03 | 12.11.2009 | Renewal fee patent year 04 | 12.11.2010 | Renewal fee patent year 05 | 14.11.2011 | Renewal fee patent year 06 | 13.11.2012 | Renewal fee patent year 07 | 18.11.2013 | Renewal fee patent year 08 | 10.11.2014 | Renewal fee patent year 09 | Penalty fee | Additional fee for renewal fee | 30.11.2008 | 03 M06 Fee paid on 14.01.2009 | 30.11.2015 | 10 M06 Not yet paid |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [Y]US2002022349 (SUGIYAMA SHUICHIRO [JP], et al) [Y] 1-19 * figures 1-10; examples 1,2; claims 1-4; table 1 *; | [Y] - DAINEKA D ET AL, "Control and monitoring of optical thin films deposition in a matrix distributed electron cyclotron resonance reactor", EUROPEAN PHYSICAL JOURNAL, APPLIED PHYSICS EDP SCIENCES FRANCE, (200412), vol. 28, no. 3, ISSN 1286-0042, pages 343 - 346, XP002436180 [Y] 1-19 * page 343, column 2, line 17 - page 345, column 2, line 6; figure 5 * DOI: http://dx.doi.org/10.1051/epjap:2004198 | by applicant | EP1075168 |