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Extract from the Register of European Patents

EP About this file: EP1875309

EP1875309 - METHOD FOR MONITORING A RETICLE [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  18.04.2014
Database last updated on 15.06.2024
Most recent event   Tooltip15.07.2016Lapse of the patent in a contracting state
New state(s): TR		published on 17.08.2016  [2016/33]
Applicant(s)For all designated states
KLA-Tencor Technologies Corporation
One Technology Drive
Milpitas, CA 95035-7916 / US
[2013/24]
Former [2008/02]For all designated states
KLA-Tencor Technologies Corporation
One Technology Drive
Milpitas, CA 95035-7916 / US
Inventor(s)01 / WATSON, Sterling, G.
2301 South Court
Palo Alto, CA 94301 / US
02 / LEVY, Ady
1621 Samedra Street
Sunnyvale, CA 94087 / US
03 / MACK, Chris, A.
1605 Watchhill Road
Austin, TX 78703 / US
04 / STOKOWSKI, Stanley, E.
755 Contada Circle
Danville, CA 94526 / US
05 / SAIDIN, Zain, K.
545 Edinburgh Street
San Mateo, CA 94402 / US
 [2008/02]
Representative(s)Lukaszyk, Szymon, et al
Kancelaria Patentowa Lukaszyk
ul. Glowackiego 8
40-062 Katowice / PL
[N/P]
Former [2012/08]Lukaszyk, Szymon, et al
Kancelaria Patentowa Lukaszyk ul. Glowackiego 8/6
40-062 Katowice / PL
Former [2012/07]Alton, Andrew, et al
Urquhart-Dykes & Lord LLP Tower North Central Merrion Way
Leeds LS2 8PA / GB
Former [2010/20]Gover, Richard Paul, et al
Urquhart-Dykes & Lord LLP Tower North Central Merrion Way
Leeds LS2 8PA / GB
Former [2008/02]Alton, Andrew
Urquhart-Dykes & Lord LLP Tower North Central Merrion Way
Leeds LS2 8PA / GB
Application number, filing date06749311.403.04.2006
[2008/02]
WO2006US12608
Priority number, dateUS2006039414529.03.2006         Original published format: US 394145
US20050671150P13.04.2005         Original published format: US 671150 P
[2008/02]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO2006113126
Date:26.10.2006
Language:EN
[2006/43]
Type: A2 Application without search report 
No.:EP1875309
Date:09.01.2008
Language:EN
The application published by WIPO in one of the EPO official languages on 26.10.2006 takes the place of the publication of the European patent application.
[2008/02]
Type: B1 Patent specification 
No.:EP1875309
Date:12.06.2013
Language:EN
[2013/24]
Search report(s)International search report - published on:US09.04.2009
(Supplementary) European search report - dispatched on:EP08.02.2012
ClassificationIPC:G06K9/00, G01R31/26, H01L21/66, H01L21/22, H01L21/38, // G03F1/00, G03F7/20, G03F1/84, G03F1/38, G03F1/50
[2012/46]
CPC:
G03F1/84 (EP,US); G03F1/38 (EP,US); G03F1/50 (EP,US);
G03F7/70433 (EP,US); G03F7/70625 (EP,US); Y10S430/146 (EP,US)
Former IPC [2012/12]G03F1/84, G03F1/38, G03F1/50
Former IPC [2009/29]G06K9/00, G01R31/26, H01L21/66, H01L21/22, H01L21/38
Former IPC [2008/02]G03F1/00, G03C5/00, G06K9/00
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2008/02]
TitleGerman:VERFAHREN ZUR ÜBERWACHUNG EINES RETIKELS[2008/02]
English:METHOD FOR MONITORING A RETICLE[2008/02]
French:PROCEDE DE SURVEILLANCE D'UN RETICULE[2008/02]
Entry into regional phase13.11.2007National basic fee paid 
13.11.2007Search fee paid 
13.11.2007Designation fee(s) paid 
13.11.2007Examination fee paid 
Examination procedure13.11.2007Examination requested  [2008/02]
07.09.2012Amendment by applicant (claims and/or description)
21.01.2013Communication of intention to grant the patent
25.02.2013Fee for grant paid
25.02.2013Fee for publishing/printing paid
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  21.01.2013
Opposition(s)13.03.2014No opposition filed within time limit [2014/21]
Fees paidRenewal fee
25.04.2008Renewal fee patent year 03
29.04.2009Renewal fee patent year 04
26.04.2010Renewal fee patent year 05
25.04.2011Renewal fee patent year 06
25.04.2012Renewal fee patent year 07
29.04.2013Renewal fee patent year 08
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU03.04.2006
AT12.06.2013
BE12.06.2013
CY12.06.2013
CZ12.06.2013
DK12.06.2013
EE12.06.2013
FI12.06.2013
IT12.06.2013
LT12.06.2013
LV12.06.2013
MC12.06.2013
PL12.06.2013
RO12.06.2013
SE12.06.2013
SI12.06.2013
SK12.06.2013
TR12.06.2013
BG12.09.2013
GR13.09.2013
ES23.09.2013
IS12.10.2013
PT14.10.2013
[2016/33]
Former [2016/32]HU03.04.2006
AT12.06.2013
BE12.06.2013
CY12.06.2013
CZ12.06.2013
DK12.06.2013
EE12.06.2013
FI12.06.2013
IT12.06.2013
LT12.06.2013
LV12.06.2013
MC12.06.2013
PL12.06.2013
RO12.06.2013
SE12.06.2013
SI12.06.2013
SK12.06.2013
BG12.09.2013
GR13.09.2013
ES23.09.2013
IS12.10.2013
PT14.10.2013
Former [2016/31]AT12.06.2013
BE12.06.2013
CY12.06.2013
CZ12.06.2013
DK12.06.2013
EE12.06.2013
FI12.06.2013
IT12.06.2013
LT12.06.2013
LV12.06.2013
MC12.06.2013
PL12.06.2013
RO12.06.2013
SE12.06.2013
SI12.06.2013
SK12.06.2013
BG12.09.2013
GR13.09.2013
ES23.09.2013
IS12.10.2013
PT14.10.2013
Former [2014/52]AT12.06.2013
BE12.06.2013
CZ12.06.2013
DK12.06.2013
EE12.06.2013
FI12.06.2013
IT12.06.2013
LT12.06.2013
LV12.06.2013
MC12.06.2013
PL12.06.2013
RO12.06.2013
SE12.06.2013
SI12.06.2013
SK12.06.2013
BG12.09.2013
GR13.09.2013
ES23.09.2013
IS12.10.2013
PT14.10.2013
Former [2014/24]AT12.06.2013
BE12.06.2013
CZ12.06.2013
DK12.06.2013
EE12.06.2013
FI12.06.2013
IT12.06.2013
LT12.06.2013
LV12.06.2013
PL12.06.2013
RO12.06.2013
SE12.06.2013
SI12.06.2013
SK12.06.2013
BG12.09.2013
GR13.09.2013
ES23.09.2013
IS12.10.2013
PT14.10.2013
Former [2014/21]AT12.06.2013
BE12.06.2013
CZ12.06.2013
DK12.06.2013
EE12.06.2013
FI12.06.2013
LT12.06.2013
LV12.06.2013
PL12.06.2013
RO12.06.2013
SE12.06.2013
SI12.06.2013
SK12.06.2013
BG12.09.2013
GR13.09.2013
ES23.09.2013
IS12.10.2013
PT14.10.2013
Former [2014/11]AT12.06.2013
BE12.06.2013
CZ12.06.2013
EE12.06.2013
FI12.06.2013
LT12.06.2013
LV12.06.2013
PL12.06.2013
RO12.06.2013
SE12.06.2013
SI12.06.2013
SK12.06.2013
BG12.09.2013
GR13.09.2013
ES23.09.2013
IS12.10.2013
PT14.10.2013
Former [2014/10]AT12.06.2013
BE12.06.2013
CZ12.06.2013
EE12.06.2013
FI12.06.2013
LT12.06.2013
LV12.06.2013
SE12.06.2013
SI12.06.2013
SK12.06.2013
BG12.09.2013
GR13.09.2013
ES23.09.2013
IS12.10.2013
PT14.10.2013
Former [2014/09]AT12.06.2013
BE12.06.2013
EE12.06.2013
FI12.06.2013
LT12.06.2013
LV12.06.2013
SE12.06.2013
SI12.06.2013
BG12.09.2013
GR13.09.2013
ES23.09.2013
PT14.10.2013
Former [2014/08]BE12.06.2013
FI12.06.2013
LT12.06.2013
LV12.06.2013
SE12.06.2013
SI12.06.2013
BG12.09.2013
GR13.09.2013
ES23.09.2013
PT14.10.2013
Former [2014/02]FI12.06.2013
LT12.06.2013
LV12.06.2013
SE12.06.2013
SI12.06.2013
BG12.09.2013
GR13.09.2013
ES23.09.2013
Former [2013/50]FI12.06.2013
LT12.06.2013
SE12.06.2013
SI12.06.2013
BG12.09.2013
GR13.09.2013
ES23.09.2013
Former [2013/49]FI12.06.2013
LT12.06.2013
SE12.06.2013
SI12.06.2013
GR13.09.2013
ES23.09.2013
Former [2013/48]LT12.06.2013
ES23.09.2013
Former [2013/47]LT12.06.2013
Documents cited:Search[A]US6614520  (BAREKET NOAH [US], et al) [A] 1-15* the whole document *;
 [Y]US2004214094  (KIM SOONHO [KR], et al) [Y] 1-15 * figures 1-3 * * paragraphs [0015] , [0016] * * paragraph [0033] - paragraph [0039] *;
 [Y]WO2005008333  (UCLT LTD [IL], et al) [Y] 1-15 * abstract * * page 3 - page 7 * * figure 4 * * claims 1-12 *;
 [Y]  - BHATTACHARYYA K ET AL, "A reticle quality management strategy in wafer fabs addressing progressive mask defect growth problem at low k1 lithography", ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP, 2005 IEE E/SEMI MUNICH, GERMANY 11-12 APRIL 2005, PISCATAWAY, NJ, USA,IEEE, (20050411), doi:10.1109/ASMC.2005.1438788, ISBN 978-0-7803-8997-7, pages 166 - 173, XP010806908 [Y] 1-15 * the whole document *

DOI:   http://dx.doi.org/10.1109/ASMC.2005.1438788
International search[A]US5473426  (HAYANO FUMINORI [JP], et al);
 [A]US2002027653  (SHIBATA YUKIHIRO [JP], et al);
 [A]US2002154297  (NOGUCHI MINORI [JP], et al);
 [A]US2003025908  (TANIGUCHI TETSUO [JP], et al)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.