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Extract from the Register of European Patents

EP About this file: EP1876440

EP1876440 - Ultra-small angle X-ray scattering measuring apparatus [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  17.02.2017
Database last updated on 30.09.2024
Most recent event   Tooltip17.02.2017No opposition filed within time limitpublished on 22.03.2017  [2017/12]
Applicant(s)For all designated states
Rigaku Corporation
3-9-12, Matsubara-cho Akishima-shi
Tokyo 196-8666 / JP
[2008/02]
Inventor(s)01 / Iwasaki, Yoshio
c/o Rigaku Corporation
3-9-12, Matsubara-cho
Akishima-shi Tokyo 196-8666 / JP
02 / Yokozawa, Yutaka
c/o Rigaku Corporation
3-9-12, Matsubara-cho
Akishima-shi Tokyo 196-8666 / JP
 [2016/15]
Former [2008/02]01 / Iwasaki, Yoshio
c/o Rigaku Corporation 3-9-12, Matsubara-cho
Akishima-shi Tokyo 196-8666 / JP
02 / Yokozawa, Yutaka
c/o Rigaku Corporation 3-9-12, Matsubara-cho
Akishima-shi Tokyo 196-8666 / JP
Representative(s)Addiss, John William, et al
Mewburn Ellis LLP
City Tower
40 Basinghall Street
London EC2V 5DE / GB
[N/P]
Former [2016/15]Calderbank, Thomas Roger, et al
Mewburn Ellis LLP
City Tower
40 Basinghall Street
London EC2V 5DE / GB
Former [2008/02]Calderbank, Thomas Roger, et al
Mewburn Ellis LLP York House 23 Kingsway
London WC2B 6HP / GB
Application number, filing date07252692.405.07.2007
[2008/02]
Priority number, dateJP2006018782807.07.2006         Original published format: JP 2006187828
[2008/02]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1876440
Date:09.01.2008
Language:EN
[2008/02]
Type: B1 Patent specification 
No.:EP1876440
Date:13.04.2016
Language:EN
[2016/15]
Search report(s)(Supplementary) European search report - dispatched on:EP27.09.2007
ClassificationIPC:G01N23/201, G21K1/06
[2008/02]
CPC:
G01N23/201 (EP,US); B82Y10/00 (EP,US); G01N23/207 (EP,US);
G21K2201/061 (EP,US)
Designated contracting statesDE,   GB [2016/15]
Former [2008/38]DE,  GB 
Former [2008/02]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MT,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Röntgenstrahlungsmessgerät für Ultra-Kleinwinkelstreuungsmessungen[2008/02]
English:Ultra-small angle X-ray scattering measuring apparatus[2008/02]
French:Appareil de mesure de diffusion de rayons X aux très petits angles[2008/02]
Examination procedure08.07.2008Amendment by applicant (claims and/or description)
08.07.2008Examination requested  [2008/34]
10.07.2008Loss of particular rights, legal effect: designated state(s)
13.08.2008Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, FR, GR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR
22.12.2010Despatch of a communication from the examining division (Time limit: M04)
26.04.2011Reply to a communication from the examining division
30.10.2015Communication of intention to grant the patent
23.02.2016Receipt of the translation of the claim(s)
26.02.2016Fee for grant paid
26.02.2016Fee for publishing/printing paid
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  22.12.2010
Opposition(s)16.01.2017No opposition filed within time limit [2017/12]
Fees paidRenewal fee
21.07.2009Renewal fee patent year 03
20.07.2010Renewal fee patent year 04
20.07.2011Renewal fee patent year 05
20.07.2012Renewal fee patent year 06
22.07.2013Renewal fee patent year 07
24.07.2014Renewal fee patent year 08
24.07.2015Renewal fee patent year 09
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[Y]WO9943009  (OSMIC INC [US]) [Y] 6-8 * the whole document *;
 [Y]US6529578  (TAGUCHI TAKEYOSHI [JP], et al) [Y] 1,4-8 * abstract * * column 3, line 21 - line 30 * * column 4, line 7 - line 53 * * figures 1,3 *;
 [Y]FR2850171  (XENOCS [FR]) [Y] 1,5-8 * page 1 - page 7 * * page 13 * * page 14, line 4 - line 8 * * figure 2 *;
 [Y]  - ISE ET AL, "X-Ray scattering study of ionic colloidal crystals", CURRENT OPINION IN COLLOID AND INTERFACE SCIENCE, (200105), vol. 6, no. 2, pages 126 - 131, XP002450884 [Y] 1,4-8 * abstract * * page 128 * * figure 2 *

DOI:   http://dx.doi.org/10.1016/S1359-0294(01)00068-1
 [Y]  - GEHRKE R ET AL, "ULTRASMALL-ANGLE X-RAY SCATTERING AT THE HASYLAB WIGGLER BEAMLINE BW4", REVIEW OF SCIENTIFIC INSTRUMENTS, AIP, MELVILLE, NY, US, (19950201), vol. 66, no. 2, PART 2, ISSN 0034-6748, pages 1354 - 1356, XP000509114 [Y] 5 * page 1355, column L *

DOI:   http://dx.doi.org/10.1063/1.1145973
ExaminationEP1462795
    - LICAI JIANG ET AL, "APPLICATION OF MULTILAYER OPTICS TO X-RAY DIFFRACTION SYSTEMS", INTERNET CITATION, (2001), URL: http://www.rigakumsc.com/journal/Vol18.2.2001/Jiang.pdf, (20040721), XP002289275
    - DIAT O ET AL, "Ultra-small-angle X-ray scattering with a Bonse-Hart camera on the high brilliance beamline at the ESRF", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - A:ACCELERATORS, SPECTROMETERS, DETECTORS AND ASSOCIATED EQUIPMENT, ELSEVIER, AMSTERDAM, NL, (19950315), vol. A356, no. 2, doi:10.1016/0168-9002(94)01253-9, ISSN 0168-9002, pages 566 - 572, XP004009207

DOI:   http://dx.doi.org/10.1016/0168-9002(94)01253-9
by applicantWO9943009
 US6529578
 FR2850171
    - M. ISE ET AL., "X-ray scattering of sonic colloidal crystals", CURRENT OPINION IN COLLOID AND INTERFACE SCIENCE, (200105), vol. 6, no. 2, pages 126 - 131
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.