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Extract from the Register of European Patents

EP About this file: EP1887109

EP1887109 - Aluminum nitride single crystal [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  22.01.2010
Database last updated on 03.09.2024
Most recent event   Tooltip22.01.2010Application deemed to be withdrawnpublished on 24.02.2010  [2010/08]
Applicant(s)For all designated states
NGK Insulators, Ltd.
2-56 Suda-cho, Mizuho-ku
Nagoya-City, Aichi Pref. 467-8530 / JP
[N/P]
Former [2008/07]For all designated states
NGK INSULATORS, LTD.
2-56 Suda-cho, Mizuho-ku
Nagoya-City, Aichi Pref. 467-8530 / JP
Inventor(s)01 / Kobayashi, Yoshimasa, c/o NGK Insulators Ltd.
2-56 Suda-cho, Mizuho-ku
Nagoya City, Aichi-ken, 467-8530 / JP
 [2008/07]
Representative(s)Paget, Hugh Charles Edward, et al
Mewburn Ellis LLP
City Tower
40 Basinghall Street
London EC2V 5DE / GB
[N/P]
Former [2008/07]Paget, Hugh Charles Edward, et al
Mewburn Ellis LLP York House 23 Kingsway
London WC2B 6HP / GB
Application number, filing date07253014.031.07.2007
[2008/07]
Priority number, dateJP2006021019501.08.2006         Original published format: JP 2006210195
JP2007015913415.06.2007         Original published format: JP 2007159134
[2008/07]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1887109
Date:13.02.2008
Language:EN
[2008/07]
Type: A3 Search report 
No.:EP1887109
Date:11.02.2009
[2009/07]
Search report(s)(Supplementary) European search report - dispatched on:EP13.01.2009
ClassificationIPC:C30B23/00, C30B29/40
[2008/07]
CPC:
C30B23/00 (EP,US); C30B29/403 (EP,US)
Designated contracting statesDE,   FR,   GB [2009/42]
Former [2008/07]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MT,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Aluminiumnitrid-Einkristall[2008/07]
English:Aluminum nitride single crystal[2008/07]
French:Monocristal de nitrure d'aluminium[2008/07]
Examination procedure12.08.2009Application deemed to be withdrawn, date of legal effect  [2010/08]
28.09.2009Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time  [2010/08]
Fees paidRenewal fee
21.07.2009Renewal fee patent year 03
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[X]US4489128  (RUTZ RICHARD F [US]) [X] 1,3 * claim 1 *;
 [A]US6086672  (HUNTER CHARLES ERIC [US]);
 [A]DE10248964  (BICKERMANN MATTHIAS [DE]);
 [A]WO2005012602  (SICRYSTAL AG [DE], et al);
 [A]US5880491  (SOREF RICHARD A [US], et al);
 [X]  - LIU L ET AL, "Substrates for gallium nitride epitaxy", MATERIALS SCIENCE AND ENGINEERING R: REPORTS, ELSEVIER SEQUOIA S.A., LAUSANNE, CH, (20020430), vol. 37, no. 3, ISSN 0927-796X, pages 61 - 127, XP004349792 [X] 1,3 * page 110; table 16 * * page 109 * * page 111 *

DOI:   http://dx.doi.org/10.1016/S0927-796X(02)00008-6
 [X]  - CHAUDHURI J ET AL, "X-RAY DOUBLE CRYSTAL CHARACTERIZATION OF SINGLE CRYSTAL EPITAXIAL ALUMINUM NITRIDE THIN FILMS ON SAPPHIRE, SILICON CARBIDE AND SILICON SUBSTRATES", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, (19950615), vol. 77, no. 12, ISSN 0021-8979, pages 6263 - 6266, XP000543993 [X] 1-3 * table 1 *

DOI:   http://dx.doi.org/10.1063/1.359158
 [X]  - TANG Y-H ET AL, "Electronic structures of wide-band-gap (SiC)1-x(AlN)x quaternary semiconductors", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, (20050428), vol. 97, no. 10, ISSN 0021-8979, pages 103702 - 103702, XP012069353 [X] 1,3 * page 1, column 1, paragraph 2 * * page 2, column 1, paragraph 3; table 1 *
 [A]  - YOKOKAWA H ET AL, "X-ray powder diffraction data for two hexagonal aluminum monoxycarbide phases", JOURNAL OF THE AMERICAN CERAMIC SOCIETY, BLACKWELL PUBLISHING, MALDEN, MA, US, (19820301), vol. 65, ISSN 0002-7820, pages C - 40, XP008099454 [A] 1-3 * figure 1 *

DOI:   http://dx.doi.org/10.1111/j.1151-2916.1982.tb10394.x
 [A]  - I.B. CULTER, P.D. MILLER, W. RAFANIELLO, "News materials in the Si-C-Al-O-N and related systems", NATURE, (19781005), vol. 275, page 434435, XP002508079 [A] 1 * figure 3; table 1 *
 [A]  - KAI Y ET AL, "SYNTHESIS OF LOW-RESISTIVITY ALUMINUM NITRIDE FILMS USING PULSED LASER DEPOSITION", JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOCIETY OF APPLIED PHYSICS, TOKYO,JP, (20030301), vol. 42, no. 3A, PART 02, ISSN 0021-4922, pages L229 - L231, XP001164673 [A] 2 * abstract * * page 230, column 2, paragraph 3 *

DOI:   http://dx.doi.org/10.1143/JJAP.42.L229
 [A]  - SLACK G A ET AL, "Growth of high purity AlN crystals", JOURNAL OF CRYSTAL GROWTH, ELSEVIER, AMSTERDAM, NL, vol. 34, no. 2, ISSN 0022-0248, (19760701), pages 263 - 279, (19760701), XP022624365

DOI:   http://dx.doi.org/10.1016/0022-0248(76)90139-1
 [A]  - TSUCHIDA T ET AL, "self-combustion reaction induced by mechanical activation of Al-Si-C powder mixtures", EUROPEAN JOURNAL OF SOLID STATE AND INORGANIC CHEMISTRY, GAUTHIER-VILLARS, PARIS, FR, (19950101), vol. 32, ISSN 0992-4361, pages 629 - 638, XP008099461
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.