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Extract from the Register of European Patents

EP About this file: EP1984789

EP1984789 - ILLUMINATION SYSTEM FOR MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS COMPRISING AN ILLUMINATION SYSTEM OF THIS TYPE [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  12.09.2014
Database last updated on 07.10.2024
Most recent event   Tooltip16.01.2015Lapse of the patent in a contracting statepublished on 18.02.2015  [2015/08]
Applicant(s)For all designated states
Carl Zeiss SMT GmbH
Rudolf-Eber-Strasse 2
73447 Oberkochen / DE
[2011/10]
Former [2008/44]For all designated states
Carl Zeiss SMT AG
Rudolf-Eber-Strasse 2
73447 Oberkochen / DE
Inventor(s)01 / DEGÜNTHER, Markus
Langäckerweg 20
73432 Aalen / DE
02 / LAYH, Michael
Heulenbergweg 30
73432 Aalen / DE
03 / GERHARD, Michael
Toggenburger Strasse 15
73432 Aalen / DE
04 / THOME, Bruno
Friedrich-Ebert-Strasse 20
73433 Aalen / DE
05 / SINGER, Wolfgang
Egerlandstrasse 45
73431 Aalen / DE
 [2008/51]
Former [2008/44]01 / DEGÜNTHER, Markus
Langäckerweg 20
73432 Aalen / DE
02 / LAYH, Michael
Himmlinger Weg 33
73432 Aalen / DE
03 / GERHARD, Michael
Toggenburger Strasse 15
73432 Aalen / DE
04 / THOME, Bruno
Friedrich-Ebert-Strasse 20
73433 Aalen / DE
05 / SINGER, Wolfgang
Egerlandstrasse 45
73431 Aalen / DE
Representative(s)Hofmann, Matthias, et al
Rau, Schneck & Hübner
Patentanwälte Rechtsanwälte PartGmbB
Königstrasse 2
90402 Nürnberg / DE
[N/P]
Former [2008/44]Hofmann, Matthias, et al
Rau, Schneck & Hübner Patentanwälte Königstrasse 2
90402 Nürnberg / DE
Application number, filing date07722838.516.02.2007
[2008/44]
WO2007EP01362
Priority number, dateUS20060774850P17.02.2006         Original published format: US 774850 P
US20060823296P23.08.2006         Original published format: US 823296 P
DE2006104245209.09.2006         Original published format: DE102006042452
DE2006106171128.12.2006         Original published format: DE102006061711
[2008/44]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report
No.:WO2007093433
Date:23.08.2007
Language:DE
[2007/34]
Type: A1 Application with search report 
No.:EP1984789
Date:29.10.2008
Language:DE
The application published by WIPO in one of the EPO official languages on 23.08.2007 takes the place of the publication of the European patent application.
[2008/44]
Type: B1 Patent specification 
No.:EP1984789
Date:06.11.2013
Language:DE
[2013/45]
Search report(s)International search report - published on:EP23.08.2007
ClassificationIPC:G03F7/20
[2008/44]
CPC:
G03F7/70075 (EP,KR,US); G03F7/70091 (KR); G03F7/70058 (KR,US);
G03F7/70083 (EP,KR,US); G03F7/70108 (EP,KR,US); G03F7/70191 (EP,KR,US);
G03F7/70208 (KR); G03F7/704 (KR); G03F7/7055 (KR) (-)
Designated contracting statesDE,   FR,   NL [2009/12]
Former [2008/44]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:BELEUCHTUNGSSYSTEM FÜR DIE MIKRO-LITHOGRAPHIE, PROJEKTIONSBELICHTUNGSANLAGE MIT EINEM DERARTIGEN BELEUCHTUNGSSYSTEM[2008/44]
English:ILLUMINATION SYSTEM FOR MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS COMPRISING AN ILLUMINATION SYSTEM OF THIS TYPE[2008/44]
French:SYSTEME D'ECLAIRAGE POUR LA MICRO-LITHOGRAPHIE, EQUIPEMENT D'ECLAIRAGE PAR PROJECTION EQUIPE D'UN TEL SYSTEME D'ECLAIRAGE[2008/44]
Entry into regional phase23.08.2008National basic fee paid 
23.08.2008Designation fee(s) paid 
23.08.2008Examination fee paid 
Examination procedure23.08.2008Amendment by applicant (claims and/or description)
23.08.2008Examination requested  [2008/44]
18.09.2008Loss of particular rights, legal effect: designated state(s)
24.10.2008Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, PL, PT, RO, SE, SI, SK, TR
09.01.2009Despatch of a communication from the examining division (Time limit: M04)
11.03.2009Reply to a communication from the examining division
12.08.2010Despatch of a communication from the examining division (Time limit: M06)
05.01.2011Reply to a communication from the examining division
12.01.2012Despatch of a communication from the examining division (Time limit: M04)
30.03.2012Reply to a communication from the examining division
03.06.2013Communication of intention to grant the patent
20.09.2013Fee for grant paid
20.09.2013Fee for publishing/printing paid
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  09.01.2009
Opposition(s)07.08.2014No opposition filed within time limit [2014/42]
Fees paidRenewal fee
18.02.2009Renewal fee patent year 03
24.02.2010Renewal fee patent year 04
22.02.2011Renewal fee patent year 05
22.02.2012Renewal fee patent year 06
21.02.2013Renewal fee patent year 07
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Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipFR28.02.2014
[2015/08]
Cited inInternational search[A]US2001052969  (BUNAU RUDOLF VON [DE], et al) [A] 1-48 * abstract * * figure 13 *;
 [Y]US2002136351  (SINGER WOLFGANG [DE]) [Y] 4,11,14,17 * abstract * * figure 1 *;
 [X]WO03029875  (ZEISS CARL MICROELECTRONIC SYS [DE], et al) [X] 1,46-48 * abstract * * page 3, lines 16-20; claim 1 *;
 [XY]EP1367442  (NIKON CORP [JP]) [X] 1-3,7,37,46-48 * abstract * * figures 1,3A,3B,5 * * paragraphs [0029] , [0062] * [Y] 4,11,14,17;
 [A]US2005237623  (FIOLKA DAMIAN [DE], et al) [A] 1-48 * abstract * * figures 2,6,10 ** claim 1 *
by applicantUS2002136351
 WO03029875
 EP1307442
 US2004119961
 WO2005083512
 WO2006084478
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.