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Extract from the Register of European Patents

EP About this file: EP1999200

EP1999200 - PRODUCTION METHOD OF POROUS FILM [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  09.05.2014
Database last updated on 24.04.2024
Most recent event   Tooltip09.05.2014No opposition filed within time limitpublished on 11.06.2014  [2014/24]
Applicant(s)For all designated states
FUJIFILM Corporation
26-30, Nishiazabu 2-chome
Minato-ku
Tokyo 106-8620 / JP
[N/P]
Former [2013/01]For all designated states
FUJIFILM Corporation
26-30, Nishiazabu 2-chome Minato-ku
Tokyo 106-8620 / JP
Former [2008/50]For all designated states
FUJIFILM Corporation
26-30, Nishiazabu 2-chome Minato-ku
Tokyo 106-8620 / JP
For all designated states
National University Corporation Hokkaido University
8, Kita 8-jyo Nishi 5-chome Kita-ku Sapporo-shi
Hokkaido 060-0808 / JP
Inventor(s)01 / SHIMOMURA, Masatsugu c/o Hokkaido University
Nanotech. Rsrch Ctr., Kita 21-jyo Nishi 10-chome
Kita-ku, Sapporo-shi, Hokkaido / JP
02 / YABU, Hiroshi c/o Hokkaido University
Nanotech. Rsrch Ctr., Kita 21-jyo Nishi 10-chome
Kita-ku, Sapporo-shi, Hokkaido / JP
03 / MIKI, Yasufumi c/o Hokkaido University
Nanotech. Rsrch Ctr., Kita 21-jyo Nishi 10-chome
Kita-ku, Sapporo-shi, Hokkaido / JP
04 / YAMAZAKI, Hidekazu
FUJIFILM Corporation
210, Nakanuma
Minami-ashigara-shi, Kanagawa 250-0193 / JP
05 / ITO, Koju
FUJIFILM Corporation
210, Nakanuma
Minami-ashigara-shi, Kanagawa 250-0193 / JP
 [2013/27]
Former [2008/50]01 / SHIMOMURA, Masatsugu c/o Hokkaido University
Nanotech. Rsrch Ctr., Kita 21-jyo Nishi 10-chome
Kita-ku, Sapporo-shi, Hokkaido / JP
02 / YABU, Hiroshi c/o Hokkaido University
Nanotech. Rsrch Ctr., Kita 21-jyo Nishi 10-chome
Kita-ku, Sapporo-shi, Hokkaido / JP
03 / MIKI, Yasufumi c/o Hokkaido University
Nanotech. Rsrch Ctr., Kita 21-jyo Nishi 10-chome
Kita-ku, Sapporo-shi, Hokkaido / JP
04 / YAMAZAKI, Hidekazu
FUJIFILM Corporation 210, Nakanuma
Minami-ashigara-shi, Kanagawa 250-0193 / JP
05 / ITO, Koju
FUJIFILM Corporation 210, Nakanuma
Minami-ashigara-shi, Kanagawa 250-0193 / JP
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[N/P]
Former [2013/27]HOFFMANN EITLE
Patent- und Rechtsanwälte
Arabellastrasse 4
81925 München / DE
Former [2008/50]HOFFMANN EITLE
Patent- und Rechtsanwälte Arabellastrasse 4
81925 München / DE
Application number, filing date07740808.627.03.2007
[2008/50]
WO2007JP57372
Priority number, dateJP2006008861328.03.2006         Original published format: JP 2006088613
[2008/50]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2007114421
Date:11.10.2007
Language:EN
[2007/41]
Type: A1 Application with search report 
No.:EP1999200
Date:10.12.2008
Language:EN
The application published by WIPO in one of the EPO official languages on 11.10.2007 takes the place of the publication of the European patent application.
[2008/50]
Type: B1 Patent specification 
No.:EP1999200
Date:03.07.2013
Language:EN
[2013/27]
Search report(s)International search report - published on:JP11.10.2007
(Supplementary) European search report - dispatched on:EP09.06.2011
ClassificationIPC:C08J9/28, B29C41/28, B01D67/00
[2013/07]
CPC:
B29C41/28 (EP,US); B29C41/12 (KR); B01D67/003 (EP);
C08J5/18 (KR); C08J9/28 (KR); B01D2323/08 (EP,US);
B29K2067/00 (EP,US); B29K2067/046 (EP,US); B29K2105/04 (EP,US) (-)
Former IPC [2008/50]C08J9/28, B29C41/12
Designated contracting statesDE,   FR,   GB [2009/19]
Former [2008/50]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MT,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
Extension statesALNot yet paid
BANot yet paid
HRNot yet paid
MKNot yet paid
RSNot yet paid
TitleGerman:VERFAHREN ZUR HERSTELLUNG EINES PORÖSEN FILMS[2008/50]
English:PRODUCTION METHOD OF POROUS FILM[2008/50]
French:PROCÉDÉ DE FABRICATION D'UNE PELLICULE POREUSE[2008/50]
Entry into regional phase10.09.2008National basic fee paid 
10.09.2008Search fee paid 
10.09.2008Designation fee(s) paid 
10.09.2008Examination fee paid 
Examination procedure10.09.2008Examination requested  [2008/50]
29.10.2008Loss of particular rights, legal effect: designated state(s)
04.12.2008Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR
13.09.2011Amendment by applicant (claims and/or description)
13.10.2011Despatch of a communication from the examining division (Time limit: M04)
10.02.2012Reply to a communication from the examining division
12.02.2013Communication of intention to grant the patent
21.05.2013Fee for grant paid
21.05.2013Fee for publishing/printing paid
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  13.10.2011
Opposition(s)04.04.2014No opposition filed within time limit [2014/24]
Fees paidRenewal fee
30.03.2009Renewal fee patent year 03
16.03.2010Renewal fee patent year 04
25.03.2011Renewal fee patent year 05
15.03.2012Renewal fee patent year 06
20.03.2013Renewal fee patent year 07
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Documents cited:Search[A]US4954381  (CABASSO ISRAEL [US], et al) [A] 1 * claim 1 *;
 [A]US2003106487  (HUANG WEN-CHIANG [US]) [A] 1* paragraph [0056] - paragraph [0060] *;
 [X]JP2003294905  (FUJI PHOTO FILM CO LTD) [X] 1,2,4,5 * abstract *
International search[A]JP2003318010  (FUJI PHOTO FILM CO LTD);
 [X]JP2006070254  (FUJI PHOTO FILM CO LTD)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.