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Extract from the Register of European Patents

EP About this file: EP2051056

EP2051056 - MTF MEASURING SYSTEM, MTF MEASURING METHOD, MTF MEASURING UNIT AND MTF MEASURING PROGRAM [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  24.08.2012
Database last updated on 24.07.2024
Most recent event   Tooltip24.08.2012Withdrawal of applicationpublished on 26.09.2012  [2012/39]
Applicant(s)For all designated states
Acutelogic Corporation
Mitsuwa Ogawamachi Bldg. 3F 3-7-1, Kanda-Ogawamachi Chiyoda-ku
Tokyo 101-0052 / JP
[2009/17]
Inventor(s)01 / MASUDA, Takashi
c/o ACUTELOGIC CORPORATION Mitsuwa Ogawamachi Bldg. 3F. 3-7-1, Kanda-ogawamachi, Chiyoda-ku
Tokyo 101-0052 / JP
02 / YOSHIDA, Kouki
c/o ACUTELOGIC CORPORATION Mitsuwa Ogawamachi Bldg. 3F. 3-7-1, Kanda-ogawamachi, Chiyoda-ku
Tokyo 101-0052 / JP
03 / AOKI, Takaharu
c/o ACUTELOGIC CORPORATION Mitsuwa Ogawamachi Bldg. 3F. 3-7-1, Kanda-ogawamachi, Chiyoda-ku
Tokyo 101-0052 / JP
04 / WAKI, Kenichiro
c/o ACUTELOGIC CORPORATION Mitsuwa Ogawamachi Bldg. 3F. 3-7-1, Kanda-ogawamachi, Chiyoda-ku
Tokyo 101-0052 / JP
 [2009/17]
Representative(s)Vossius & Partner Patentanwälte Rechtsanwälte mbB
Siebertstrasse 3
81675 München / DE
[N/P]
Former [2009/17]Vossius & Partner
Siebertstrasse 4
81675 München / DE
Application number, filing date07792316.703.08.2007
[2009/17]
WO2007JP65670
Priority number, dateJP2006021443707.08.2006         Original published format: JP 2006214437
[2009/17]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2008018573
Date:14.02.2008
Language:JA
[2008/07]
Type: A1 Application with search report 
No.:EP2051056
Date:22.04.2009
Language:EN
[2009/17]
Search report(s)International search report - published on:JP14.02.2008
ClassificationIPC:G01M11/02
[2009/17]
CPC:
G01M11/0292 (EP,KR,US); G01M99/008 (KR); G02B27/4205 (KR);
G01N2021/9583 (KR)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MT,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2009/17]
TitleGerman:MTF-MESSSYSTEM, MTF-MESSVERFAHREN, MTF-MESSVERFAHREN UND MTF-MESSPROGRAMM[2009/17]
English:MTF MEASURING SYSTEM, MTF MEASURING METHOD, MTF MEASURING UNIT AND MTF MEASURING PROGRAM[2009/17]
French:SYSTEME DE MESURE DE MTF, PROCEDE DE MESURE DE MTF, UNITE DE MESURE DE MTF ET PROGRAMME DE MESURE DE MTF[2009/17]
Entry into regional phase03.02.2009Translation filed 
24.02.2009National basic fee paid 
24.02.2009Search fee paid 
24.02.2009Designation fee(s) paid 
24.02.2009Examination fee paid 
Examination procedure24.02.2009Examination requested  [2009/17]
17.08.2012Application withdrawn by applicant  [2012/39]
Fees paidRenewal fee
24.08.2009Renewal fee patent year 03
24.08.2010Renewal fee patent year 04
25.08.2011Renewal fee patent year 05
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Cited inInternational search[Y]JP2003185531  (OLYMPUS OPTICAL CO);
 [Y]JPS562519  (RICOH KK);
 [Y]JP2000511288  ;
 [Y]JP2004132703  (CHINONTEC KK)
by applicantJP2002350285
 JP2006214437
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.