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Extract from the Register of European Patents

EP About this file: EP2094603

EP2094603 - METHOD FOR FORMING NON-ALIGNED MICROCAVITIES OF DIFFERENT DEPTHS [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  03.11.2015
Database last updated on 29.07.2024
Most recent event   Tooltip03.11.2015Application deemed to be withdrawnpublished on 02.12.2015  [2015/49]
Applicant(s)For all designated states
Commissariat à l'Énergie Atomique et aux Énergies Alternatives
Bâtiment "Le Ponant D" 25, rue Leblanc
75015 Paris / FR
[N/P]
Former [2010/18]For all designated states
Commissariat à l'énergie atomique et aux énergies alternatives
Bâtiment D "Le Ponant" 25, rue Leblanc
75015 Paris / FR
Former [2009/36]For all designated states
Commissariat à l'Energie Atomique
25, rue Leblanc Immeuble "Le Ponant D"
75015 Paris / FR
Inventor(s)01 / BARBE, Jean-Charles
524 Charvolet
38160 Izeron / FR
02 / DORNEL, Erwan
2 bis Le Puisel
35770 Vern sur Seiche / FR
03 / DE CRECY, François
10 bis, rue du Priou
38180 Seyssins / FR
04 / EYMERY, Joël
2 rue du clapier
38360 Sassenage / FR
 [2009/46]
Former [2009/36]01 / BARBE, Jean-Charles
52, Rue St Laurent
38000 Grenoble / FR
02 / DORNEL, Erwan
2 bis Le Puisel
35770 Vern sur Seiche / FR
03 / DE CRECY, François
10 bis, rue du Priou
38180 Seyssins / FR
04 / EYMERY, Joël
2 rue du clapier
38360 Sassenage / FR
Representative(s)Ilgart, Jean-Christophe
BREVALEX
95, Rue d'Amsterdam
75378 Paris Cedex 8 / FR
[N/P]
Former [2009/36]Ilgart, Jean-Christophe
BREVALEX 3, rue du Docteur Lancereaux
75008 Paris / FR
Application number, filing date07857945.520.12.2007
[2009/36]
WO2007EP64324
Priority number, dateFR2006005581721.12.2006         Original published format: FR 0655817
[2009/36]
Filing languageFR
Procedural languageFR
PublicationType: A1 Application with search report
No.:WO2008074861
Date:26.06.2008
Language:FR
[2008/26]
Type: A1 Application with search report 
No.:EP2094603
Date:02.09.2009
Language:FR
The application published by WIPO in one of the EPO official languages on 26.06.2008 takes the place of the publication of the European patent application.
[2009/36]
Search report(s)International search report - published on:EP26.06.2008
ClassificationIPC:B81C1/00, B01L3/00
[2009/36]
CPC:
B81C1/00047 (EP,US); B01L3/5027 (EP,US); B81B2201/058 (EP,US);
B81B2203/0384 (EP,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MT,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2009/36]
TitleGerman:VERFAHREN ZUR HERSTELLUNG VON NICHT AUSGERICHTETEN MIKROHOHLRÄUMEN MIT VERSCHIEDENER TIEFE[2009/36]
English:METHOD FOR FORMING NON-ALIGNED MICROCAVITIES OF DIFFERENT DEPTHS[2009/36]
French:PROCEDE DE REALISATION DE MICRO-CAVITES NON-ALIGNEES ET A DIFFERENTES PROFONDEURS[2009/36]
Entry into regional phase22.06.2009National basic fee paid 
22.06.2009Designation fee(s) paid 
22.06.2009Examination fee paid 
Examination procedure10.06.2008Request for preliminary examination filed
International Preliminary Examining Authority: EP
22.06.2009Amendment by applicant (claims and/or description)
22.06.2009Examination requested  [2009/36]
31.03.2014Despatch of a communication from the examining division (Time limit: M04)
17.07.2014Reply to a communication from the examining division
01.07.2015Application deemed to be withdrawn, date of legal effect  [2015/49]
24.07.2015Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2015/49]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  31.03.2014
Fees paidRenewal fee
23.12.2009Renewal fee patent year 03
23.12.2010Renewal fee patent year 04
23.12.2011Renewal fee patent year 05
22.11.2012Renewal fee patent year 06
22.11.2013Renewal fee patent year 07
Penalty fee
Additional fee for renewal fee
31.12.201408   M06   Not yet paid
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Cited inInternational search[X]US6100132  (SATO TSUTOMU [JP], et al) [X] 1,10-13 * figures 23A,23B,23F,24A,24B * * column 16, line 30 - column 18, line 3 *;
 [A]US6383924  (FARRAR PAUL A [US], et al) [A] 1,10,11,13 * figures 4-12 ** column 3, line 43 - column 6, line 50 *;
 [A]EP1427010  (ST MICROELECTRONICS SRL [IT]) [A] 13 * paragraph [0034] - paragraph [0079] * * figures 17a-17f * * figures 26a-26f *;
 [DX]  - SATO T ET AL, "MICRO-STRUCTURE TRANSFORMATION OF SILICON: A NEWLY DEVELOPED TRANSFORMATION TECHNOLOGY FOR PATTERNING SILICON SURFACES USING THE SURFACE MIGRATION OF SILICON ATOMS BY HYDROGEN ANNEALING", JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOCIETY OF APPLIED PHYSICS, TOKYO, JP, (200009), vol. 39, no. 9A, PART 1, ISSN 0021-4922, pages 5033 - 5038, XP000977143 [DX] 1,10-12 * page 5033 - page 5035 * * figures 8,9 *

DOI:   http://dx.doi.org/10.1143/JJAP.39.5033
by applicant   - T. SATO ET AL., "Microstructure Transformation of Silicon : A Newly Developed Transformation Technology for Patterning Silicon Surfaces using the Surface Migration of Silicon Atoms by Hydrogen Annealing", JAPANESE JOURNAL OF APPLIED PHYSICS, (2000), vol. 39, doi:doi:10.1143/JJAP.39.5033, pages 5033 - 5038, XP000977143

DOI:   http://dx.doi.org/10.1143/JJAP.39.5033
    - T. SATO ET AL., "Fabrication of Silicon-on-Nothing Structure by Substrate Engineering Using the Empty-Space-in-Silicon Formation Technique", JAPANESE JOURNAL OF APPLIED PHYSICS, (2004), vol. 43, no. 1, doi:doi:10.1143/JJAP.43.12, pages 12 - 18, XP001191452

DOI:   http://dx.doi.org/10.1143/JJAP.43.12
    - SPULBER ET AL., ISPSD
    - J.M. HARTMANN ET AL., JOURNAL OF CRYSTAL GROWTH, (2006), pages 288 - 295
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.