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Extract from the Register of European Patents

EP About this file: EP1978562

EP1978562 - Trench gate MOSFET and method of manufacturing the same [Right-click to bookmark this link]
StatusThe application has been refused
Status updated on  09.10.2015
Database last updated on 13.07.2024
Most recent event   Tooltip09.10.2015Refusal of applicationpublished on 11.11.2015  [2015/46]
Applicant(s)For all designated states
Vishay-Siliconix
2201 Laurelwood Road Santa Clara
California 95054 / US
[2008/41]
Inventor(s)01 / Li, Jian
822 Los Robles Avenue
Palo Alto, CA 94306 / US
02 / Chen, Kuo-In
1673 Newcastle Drive
Los Altos, CA 94024 / US
03 / Terril, Kyle
3385 Londonberry Drive
Santa Clara, CA 95050 / US
 [2008/41]
Representative(s)Richards, John, et al
Ladas & Parry LLP
Temple Chambers
3-7 Temple Avenue
London EC4Y 0DA / GB
[N/P]
Former [2012/24]Richards, John, et al
Ladas & Parry LLP Dachauerstrasse 37
80335 München / DE
Former [2008/41]Ebner von Eschenbach, Jennifer, et al
Ladas & Parry LLP Dachauerstrasse 37
80335 München / DE
Application number, filing date08006487.631.03.2008
[2008/41]
Priority number, dateUS20070921792P03.04.2007         Original published format: US 921792 P
US2008001572317.01.2008         Original published format: US 15723
[2008/41]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1978562
Date:08.10.2008
Language:EN
[2008/41]
Type: A3 Search report 
No.:EP1978562
Date:13.06.2012
Language:EN
[2012/24]
Search report(s)(Supplementary) European search report - dispatched on:EP11.05.2012
ClassificationIPC:H01L29/78, H01L29/417, H01L29/10, H01L21/336, // H01L29/45, H01L29/423, H01L29/49
[2012/24]
CPC:
H01L29/66734 (EP,US); H01L29/1095 (EP,US); H01L29/41766 (EP,US);
H01L29/66719 (EP,US); H01L29/66727 (EP,US); H01L29/7813 (EP,US);
H01L29/456 (EP,US); H01L29/4925 (EP,US); H01L29/4933 (EP,US) (-)
Former IPC [2008/41]H01L29/78, H01L29/417, H01L29/10, H01L21/336, H01L29/45, H01L29/423, H01L29/49, // H01L29/45, H01L29/423, H01L29/49
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2008/41]
TitleGerman:MOSFET mit Graben-Gate und Verfahren zu dessen Herstellung[2008/41]
English:Trench gate MOSFET and method of manufacturing the same[2008/41]
French:Transistor à grille en tranchée et son procédé de fabrication[2008/41]
Examination procedure12.12.2012Amendment by applicant (claims and/or description)
12.12.2012Examination requested  [2013/04]
21.08.2013Despatch of a communication from the examining division (Time limit: M06)
26.02.2014Reply to a communication from the examining division
11.06.2015Cancellation of oral proceeding that was planned for 30.06.2015
22.06.2015Despatch of communication that the application is refused, reason: substantive examination [2015/46]
30.06.2015Date of oral proceedings (cancelled)
02.07.2015Application refused, date of legal effect [2015/46]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  21.08.2013
Fees paidRenewal fee
25.03.2010Renewal fee patent year 03
29.03.2011Renewal fee patent year 04
26.03.2012Renewal fee patent year 05
27.03.2013Renewal fee patent year 06
27.03.2014Renewal fee patent year 07
27.03.2015Renewal fee patent year 08
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Documents cited:Search[XY]WO2007002857  (FAIRCHILD SEMICONDUCTOR [US]; GREBS THOMAS E [US]; RIDLEY RODNEY S [US) [X] 1-10,13-17,19,20 * figures 1, 7 * * paragraph [0046] - paragraph [0047]; figures 5D-5F * * paragraph [0079]; figures 11A-11N * * paragraph [0081] - paragraph [0085] * * paragraph [0090] - paragraph [0092] * [Y] 11,12,18;
 [XI]US2006267090  (SAPP STEVEN [US] ET AL) [X] 15-17,19,20 * paragraph [0112] - paragraph [0116]; figures 23A-23I,24A-24I * [I] 18;
 [I]EP0620588  (PHILIPS ELECTRONICS UK LTD [GB]; KONINKL PHILIPS ELECTRONICS NV [NL]) [I] 15-20 * page 6, line 29 - page 9, line 3; figures 1-8 *;
 [Y]US2004021174  (KOBAYASHI KENYA [JP]) [Y] 11,12 * paragraph [0009]; figure 1 *;
 [Y]US2006014349  (WILLIAMS RICHARD K [US] ET AL) [Y] 18 * paragraph [0139]; figure 23G *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.