EP2023203 - Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid crystal display device [Right-click to bookmark this link] | |||
Former [2009/07] | Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid display device | ||
[2010/13] | Status | No opposition filed within time limit Status updated on 26.08.2011 Database last updated on 03.09.2024 | Most recent event Tooltip | 04.10.2013 | Lapse of the patent in a contracting state New state(s): HU | published on 06.11.2013 [2013/45] | Applicant(s) | For all designated states FUJIFILM Corporation 26-30, Nishiazabu 2-chome Minato-ku Tokyo / JP | [N/P] |
Former [2009/07] | For all designated states FUJIFILM Corporation 26-30, Nishiazabu 2-chome Minato-ku Tokyo / JP | Inventor(s) | 01 /
Nakamura, Hideyuki c/o Fujifilm Corporation No. 200 Ohnakazato Fujinomiya-shi Shizuoka-ken / JP | 02 /
Mochizuki, Kyohei c/o Fujifilm Corporation No. 200 Ohnakazato Fujinomiya-shi Shizuoka-ken / JP | 03 /
Fukushige, Yuuichi c/o Fujifilm Corporation No. 200 Ohnakazato Fujinomiya-shi Shizuoka-ken / JP | 04 /
Arioka, Daisuke c/o Fujifilm Corporation No. 200 Ohnakazato Fujinomiya-shi Shizuoka-ken / JP | [2009/07] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastraße 30 81925 München / DE | [N/P] |
Former [2009/07] | HOFFMANN EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | Application number, filing date | 08013249.1 | 23.07.2008 | [2009/07] | Priority number, date | JP20070194239 | 26.07.2007 Original published format: JP 2007194239 | [2009/07] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP2023203 | Date: | 11.02.2009 | Language: | EN | [2009/07] | Type: | B1 Patent specification | No.: | EP2023203 | Date: | 20.10.2010 | Language: | EN | [2010/42] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 12.01.2009 | Classification | IPC: | G03F7/033, G03F7/038 | [2009/07] | CPC: |
G03F7/0388 (EP,US);
G03F7/027 (KR);
G03F7/028 (KR);
G03F7/033 (EP,US)
| Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR [2009/07] | Title | German: | Lichtempfindliche Zusammensetzung, lichtempfindlicher Harzübertragungsfilm, sowie Verfahren zur Herstellung eines Lichtabstandhalters und Substrat für eine Flüssigkristallanzeigenvorrichtung und Flüssigkristallanzeige | [2009/07] | English: | Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid crystal display device | [2010/13] | French: | Composition photosensible, film de transfert de résine photosensible, et procédé de production de photo-espaceur, et substrat pour dispositif d'affichage à cristaux liquides et dispositif d'affichage à cristaux liquides | [2010/13] |
Former [2009/07] | Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid display device | ||
Former [2009/07] | Composition photosensible, film de transfert de résine photosensible, et procédé de production de photo-espaceur, et substrat pour dispositif d'affichage à cristaux liquides et dispositif d'affichage liquide | Examination procedure | 30.04.2009 | Amendment by applicant (claims and/or description) | 12.05.2009 | Examination requested [2009/26] | 03.09.2009 | Despatch of a communication from the examining division (Time limit: M04) | 31.12.2009 | Reply to a communication from the examining division | 30.04.2010 | Communication of intention to grant the patent | 07.09.2010 | Fee for grant paid | 07.09.2010 | Fee for publishing/printing paid | Opposition(s) | 21.07.2011 | No opposition filed within time limit [2011/39] | Fees paid | Renewal fee | 29.07.2010 | Renewal fee patent year 03 |
Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | AT | 20.10.2010 | BE | 20.10.2010 | CY | 20.10.2010 | CZ | 20.10.2010 | DK | 20.10.2010 | EE | 20.10.2010 | FI | 20.10.2010 | HR | 20.10.2010 | HU | 20.10.2010 | IT | 20.10.2010 | LT | 20.10.2010 | LV | 20.10.2010 | MT | 20.10.2010 | NL | 20.10.2010 | PL | 20.10.2010 | RO | 20.10.2010 | SE | 20.10.2010 | SI | 20.10.2010 | SK | 20.10.2010 | TR | 20.10.2010 | BG | 20.01.2011 | NO | 20.01.2011 | GR | 21.01.2011 | ES | 31.01.2011 | IS | 20.02.2011 | PT | 21.02.2011 | [2013/45] |
Former [2013/44] | AT | 20.10.2010 | |
BE | 20.10.2010 | ||
CY | 20.10.2010 | ||
CZ | 20.10.2010 | ||
DK | 20.10.2010 | ||
EE | 20.10.2010 | ||
FI | 20.10.2010 | ||
HR | 20.10.2010 | ||
IT | 20.10.2010 | ||
LT | 20.10.2010 | ||
LV | 20.10.2010 | ||
MT | 20.10.2010 | ||
NL | 20.10.2010 | ||
PL | 20.10.2010 | ||
RO | 20.10.2010 | ||
SE | 20.10.2010 | ||
SI | 20.10.2010 | ||
SK | 20.10.2010 | ||
TR | 20.10.2010 | ||
BG | 20.01.2011 | ||
NO | 20.01.2011 | ||
GR | 21.01.2011 | ||
ES | 31.01.2011 | ||
IS | 20.02.2011 | ||
PT | 21.02.2011 | ||
Former [2013/26] | AT | 20.10.2010 | |
BE | 20.10.2010 | ||
CY | 20.10.2010 | ||
CZ | 20.10.2010 | ||
DK | 20.10.2010 | ||
EE | 20.10.2010 | ||
FI | 20.10.2010 | ||
HR | 20.10.2010 | ||
IT | 20.10.2010 | ||
LT | 20.10.2010 | ||
LV | 20.10.2010 | ||
MT | 20.10.2010 | ||
NL | 20.10.2010 | ||
PL | 20.10.2010 | ||
RO | 20.10.2010 | ||
SE | 20.10.2010 | ||
SI | 20.10.2010 | ||
SK | 20.10.2010 | ||
BG | 20.01.2011 | ||
NO | 20.01.2011 | ||
GR | 21.01.2011 | ||
ES | 31.01.2011 | ||
IS | 20.02.2011 | ||
PT | 21.02.2011 | ||
Former [2012/05] | AT | 20.10.2010 | |
BE | 20.10.2010 | ||
CZ | 20.10.2010 | ||
DK | 20.10.2010 | ||
EE | 20.10.2010 | ||
FI | 20.10.2010 | ||
HR | 20.10.2010 | ||
IT | 20.10.2010 | ||
LT | 20.10.2010 | ||
LV | 20.10.2010 | ||
MT | 20.10.2010 | ||
NL | 20.10.2010 | ||
PL | 20.10.2010 | ||
RO | 20.10.2010 | ||
SE | 20.10.2010 | ||
SI | 20.10.2010 | ||
SK | 20.10.2010 | ||
BG | 20.01.2011 | ||
NO | 20.01.2011 | ||
GR | 21.01.2011 | ||
ES | 31.01.2011 | ||
IS | 20.02.2011 | ||
PT | 21.02.2011 | ||
Former [2012/03] | AT | 20.10.2010 | |
BE | 20.10.2010 | ||
CZ | 20.10.2010 | ||
DK | 20.10.2010 | ||
EE | 20.10.2010 | ||
FI | 20.10.2010 | ||
HR | 20.10.2010 | ||
IT | 20.10.2010 | ||
LT | 20.10.2010 | ||
LV | 20.10.2010 | ||
NL | 20.10.2010 | ||
PL | 20.10.2010 | ||
RO | 20.10.2010 | ||
SE | 20.10.2010 | ||
SI | 20.10.2010 | ||
SK | 20.10.2010 | ||
BG | 20.01.2011 | ||
NO | 20.01.2011 | ||
GR | 21.01.2011 | ||
ES | 31.01.2011 | ||
IS | 20.02.2011 | ||
PT | 21.02.2011 | ||
Former [2011/38] | AT | 20.10.2010 | |
BE | 20.10.2010 | ||
CZ | 20.10.2010 | ||
DK | 20.10.2010 | ||
EE | 20.10.2010 | ||
FI | 20.10.2010 | ||
HR | 20.10.2010 | ||
LT | 20.10.2010 | ||
LV | 20.10.2010 | ||
NL | 20.10.2010 | ||
PL | 20.10.2010 | ||
RO | 20.10.2010 | ||
SE | 20.10.2010 | ||
SI | 20.10.2010 | ||
SK | 20.10.2010 | ||
BG | 20.01.2011 | ||
NO | 20.01.2011 | ||
GR | 21.01.2011 | ||
ES | 31.01.2011 | ||
IS | 20.02.2011 | ||
PT | 21.02.2011 | ||
Former [2011/35] | AT | 20.10.2010 | |
BE | 20.10.2010 | ||
CZ | 20.10.2010 | ||
EE | 20.10.2010 | ||
FI | 20.10.2010 | ||
HR | 20.10.2010 | ||
LT | 20.10.2010 | ||
LV | 20.10.2010 | ||
NL | 20.10.2010 | ||
SE | 20.10.2010 | ||
SI | 20.10.2010 | ||
BG | 20.01.2011 | ||
NO | 20.01.2011 | ||
GR | 21.01.2011 | ||
ES | 31.01.2011 | ||
IS | 20.02.2011 | ||
PT | 21.02.2011 | ||
Former [2011/34] | AT | 20.10.2010 | |
BE | 20.10.2010 | ||
FI | 20.10.2010 | ||
HR | 20.10.2010 | ||
LT | 20.10.2010 | ||
LV | 20.10.2010 | ||
NL | 20.10.2010 | ||
SE | 20.10.2010 | ||
SI | 20.10.2010 | ||
BG | 20.01.2011 | ||
NO | 20.01.2011 | ||
GR | 21.01.2011 | ||
ES | 31.01.2011 | ||
IS | 20.02.2011 | ||
PT | 21.02.2011 | ||
Former [2011/29] | AT | 20.10.2010 | |
BE | 20.10.2010 | ||
FI | 20.10.2010 | ||
HR | 20.10.2010 | ||
LT | 20.10.2010 | ||
LV | 20.10.2010 | ||
NL | 20.10.2010 | ||
SE | 20.10.2010 | ||
SI | 20.10.2010 | ||
BG | 20.01.2011 | ||
NO | 20.01.2011 | ||
GR | 21.01.2011 | ||
IS | 20.02.2011 | ||
PT | 21.02.2011 | Documents cited: | Search | [X]DE10206364 (MITSUBISHI PAPER MILLS LTD [JP]) [X] 1-14 * pages 21-22; claim 2 *; | [AD]JP2002287354 (NIPPON PAINT CO LTD) [AD] 1-14 * the whole document *; | [AD]JP2003207787 (FUJI PHOTO FILM CO LTD) [AD] 1-14* the whole document *; | [X]EP1505441 (FUJI PHOTO FILM CO LTD [JP]) [X] 1-14 * pages 49,56,57; claim 3 *; | [X]EP1564591 (FUJI PHOTO FILM CO LTD [JP]) [X] 1-14 * page 83; claim 1; compounds P-25 *; | [E]EP1975709 (FUJIFILM CORP [JP]) [E] 1-14 * page 9; claim 1 *; | [E]WO2008123601 (FUJIFILM CORP [JP], et al) [E] 1-14 * pages 46-53; claim 4 * | by applicant | US2367660 | US2448828 | US2681294 | US2722512 | US2951758 | US3046127 | US3549367 | JPS5148516B | US4212976 | US4239850 | JPH07110575 | JPH1177942 | JPH11133600 | JP2000334836 | JP2001310147 | JP2002079163 | JP2002148794 | JP2002287354 | JP2003010767 | JP2003164787 | JP2003170098 | JP2003207787 | JP2003302639 | JP2004017043 | JP2004089851 | JP2004347831 | JP2005003861 | JP2005062620 | JP2006023696 | JP2006064921 |