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EP2063319
European procedure
Extract from the Register of European Patents
EP About this file: EP2063319
| EP2063319 - Metal oxide-containing film-forming composition, multilayer resist and method of formation of pattern in a substrate [Right-click to bookmark this link] | |||
| Former [2009/22] | Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method | ||
| [2011/18] | Status | No opposition filed within time limit Status updated on 07.09.2012 Database last updated on 27.07.2024 | Most recent event Tooltip | 07.09.2012 | No opposition filed within time limit | published on 10.10.2012 [2012/41] | Applicant(s) | For all designated states Shin-Etsu Chemical Co., Ltd. 6-1, Ohtemachi 2-chome, Chiyoda-ku Tokyo / JP | [2009/22] | Inventor(s) | 01 /
Ogihara, Tsutomu c/o New Functional Materials Research Center Shin-Etsu Chemical Co., Ltd. 28-1, Nishi Fukushima Kubiki-ku, Joetsu-shi Niigata-ken / JP | 02 /
Ueda, Takafumi c/o New Functional Materials Research Center Shin-Etsu Chemical Co., Ltd. 28-1, Nishi Fukushima Kubiki-ku, Joetsu-shi Niigata-ken / JP | 03 /
Yano, Toshiharu c/o New Functional Materials Research Center Shin-Etsu Chemical Co., Ltd. 28-1, Nishi Fukushima Kubiki-ku, Joetsu-shi Niigata-ken / JP | 04 /
Nakashima, Mutsuo c/o New Functional Materials Research Center Shin-Etsu Chemical Co., Ltd. 28-1, Nishi Fukushima Kubiki-ku, Joetsu-shi Niigata-ken / JP | [2011/44] |
| Former [2009/22] | 01 /
Ogihara, Tsutomu c/o New Functional Materials Research Center Shin-Etsu Chemical Co., Ltd. 28-1, Nishi Fukushima Kubiki-ku Joetsu-shi Niigata-ken / JP | ||
| 02 /
Ueda, Takafumi c/o New Functional Materials Research Center Shin-Etsu Chemical Co., Ltd. 28-1, Nishi Fukushima Kubiki-ku Joetsu-shi Niigata-ken / JP | |||
| 03 /
Yano, Toshiharu c/o New Functional Materials Research Center Shin-Etsu Chemical Co., Ltd. 28-1, Nishi Fukushima Kubiki-ku Joetsu-shi Niigata-ken / JP | |||
| 04 /
Nakashima, Mutsuo c/o New Functional Materials Research Center Shin-Etsu Chemical Co., Ltd. 28-1, Nishi Fukushima Kubiki-ku Joetsu-shi Niigata-ken / JP | Representative(s) | Ter Meer Steinmeister & Partner Patentanwälte mbB Nymphenburger Strasse 4 80335 München / DE | [N/P] |
| Former [2011/44] | TER MEER - STEINMEISTER & PARTNER GbR Patentanwälte Mauerkircherstrasse 45 81679 München / DE | ||
| Former [2009/22] | TER MEER - STEINMEISTER & PARTNER GbR Mauerkircherstrasse 45 81679 München / DE | Application number, filing date | 08020109.8 | 18.11.2008 | [2009/22] | Priority number, date | JP20070303130 | 22.11.2007 Original published format: JP 2007303130 | [2009/22] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP2063319 | Date: | 27.05.2009 | Language: | EN | [2009/22] | Type: | B1 Patent specification | No.: | EP2063319 | Date: | 02.11.2011 | Language: | EN | [2011/44] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 27.02.2009 | Classification | IPC: | G03F7/075, G03F7/11, G03F7/09 | [2009/22] | CPC: |
G03F7/11 (EP,US);
C01G1/02 (KR);
C07F5/00 (KR);
C07F7/00 (KR);
C07F7/08 (KR);
C08G77/56 (EP,US);
C09D183/14 (EP,US);
G03F7/0752 (EP,US);
H01L21/02107 (EP);
| Designated contracting states | DE [2010/05] |
| Former [2009/22] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR | Title | German: | Metalloxidhaltige, folienbildende Zusammensetzung, Mehrschicht-Resist und Verfahren zur Bildung einer Struktur in einem Substrat | [2011/18] | English: | Metal oxide-containing film-forming composition, multilayer resist and method of formation of pattern in a substrate | [2011/18] | French: | Composition de formation d'un film contenant de l'oxyde de métal, resist multicouches et procédé de formation de motif dans un substrat | [2011/18] |
| Former [2009/22] | Metalloxidhaltige, folienbildende Zusammensetzung, metalloxidhaltige Folie, metalloxidhaltiges, folientragendes Substrat und Strukturierungsverfahren | ||
| Former [2009/22] | Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method | ||
| Former [2009/22] | Composition de formation d'un film contenant de l'oxyde de métal, film contenant de l'oxyde de métal, substrat porteur de film contenant de l'oxyde de métal et procédé de placement de motif | Examination procedure | 03.07.2009 | Amendment by applicant (claims and/or description) | 03.07.2009 | Examination requested [2009/34] | 28.11.2009 | Loss of particular rights, legal effect: designated state(s) | 12.01.2010 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR | 23.11.2010 | Despatch of a communication from the examining division (Time limit: M04) | 10.03.2011 | Reply to a communication from the examining division | 23.05.2011 | Communication of intention to grant the patent | 20.09.2011 | Fee for grant paid | 20.09.2011 | Fee for publishing/printing paid | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 23.11.2010 | Opposition(s) | 03.08.2012 | No opposition filed within time limit [2012/41] | Fees paid | Renewal fee | 12.11.2010 | Renewal fee patent year 03 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | WO2006040956 [ ]; | JP2004153125 [ ]; | [XY]EP1375615 (SHINETSU CHEMICAL CO [JP]) [X] 1-14 * page 2, lines 1,2 * * page 3, line 10 - page 4, line 51 * * page 7, lines 28-47 * * page 8, lines 29-49 * * claims 1-10 * [Y] 15-21; | [DY]JP2004153125 (FUJITSU LTD) [DY] 15-21 * abstract *; | [Y]WO2006040956 (NISSAN CHEMICAL IND LTD [JP], et al) [Y] 15-21 * abstract *; | [Y]EP1788433 (SHINETSU CHEMICAL CO [JP]) [Y] 15-21 * paragraphs [0014] , [0034] , [0048] , [0054] , [0056] , [0087] , [0099] - [0104]; claims 1-20 *; | [Y]EP1788012 (SHINETSU CHEMICAL CO [JP]) [Y] 15-21* claims 1-23 * | [ ] - DATABASE WPI, 1, Derwent World Patents Index, Database accession no. 2006-299611, & WO2006040956 A1 00000000 (NISSAN CHEM IND LTD) [ ] * abstract * | [ ] - DATABASE WPI, 1, Derwent World Patents Index, vol. 2004, no. 37, Database accession no. 2004-396744, & JP2004153125 A 20040527 (FUJITSU LTD) [ ] * abstract * | by applicant | EP1375615 | JP2004153125 | WO2006040956 | EP1788433 | EP1788012 |