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Extract from the Register of European Patents

EP About this file: EP2028215

EP2028215 - SILICON COMPOUND, ULTRAVIOLET ABSORBENT, METHOD FOR MANUFACTURING MULTILAYER WIRING DEVICE AND MULTILAYER WIRING DEVICE [Right-click to bookmark this link]
Former [2009/09]Silicon compound, ultraviolet absorbent, method for manufacturing multilayer wiring device and multilayer wiring device
[2018/16]
StatusNo opposition filed within time limit
Status updated on  07.06.2019
Database last updated on 02.08.2024
FormerThe patent has been granted
Status updated on  29.06.2018
FormerGrant of patent is intended
Status updated on  22.03.2018
FormerExamination is in progress
Status updated on  05.09.2017
Most recent event   Tooltip07.06.2019No opposition filed within time limitpublished on 10.07.2019  [2019/28]
Applicant(s)For all designated states
Fujitsu Limited
1-1, Kamikodanaka 4-chome Nakahara-ku
Kawasaki-shi, Kanagawa 211-8588 / JP
[2009/09]
Inventor(s)01 / Ozaki, Shirou
c/o Fujitsu Limited
1-1, Kamikodanaka 4-chome
Nakahara-ku, Kawasaki-shi, KANAGAWA 211-8588 / JP
02 / Nakata, Yoshihiro
c/o Fujitsu Limited
1-1, Kamikodanaka 4-chome
Nakahara-ku, Kawasaki-shi, KANAGAWA 211-8588 / JP
03 / Yano, Ei
c/o Fujitsu Limited
1-1, Kamikodanaka 4-chome
Nakahara-ku, Kawasaki-shi, KANAGAWA 211-8588 / JP
 [2018/31]
Former [2009/09]01 / Ozaki, Shirou
c/o Fujitsu Limited 1-1, Kamikodanaka 4-chome
Nakahara-ku, Kawasaki-shi, KANAGAWA 211-8588 / JP
02 / Nakata, Yoshihiro
c/o Fujitsu Limited 1-1, Kamikodanaka 4-chome
Nakahara-ku, Kawasaki-shi, KANAGAWA 211-8588 / JP
03 / Yano, Ei
c/o Fujitsu Limited 1-1, Kamikodanaka 4-chome
Nakahara-ku, Kawasaki-shi, KANAGAWA 211-8588 / JP
Representative(s)Körfer, Thomas
Mitscherlich PartmbB
Patent- und Rechtsanwälte
Karlstraße 7
80333 München / DE
[N/P]
Former [2018/31]Körfer, Thomas
Mitscherlich PartmbB
Patent- und Rechtsanwälte
Sonnenstrasse 33
80331 München / DE
Former [2009/09]Körfer, Thomas
Mitscherlich & Partner Patent- und Rechtsanwälte Sonnenstrasse 33
80331 München / DE
Application number, filing date08161631.001.08.2008
[2009/09]
Priority number, dateJP2007020950510.08.2007         Original published format: JP 2007209505
[2009/09]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP2028215
Date:25.02.2009
Language:EN
[2009/09]
Type: B1 Patent specification 
No.:EP2028215
Date:01.08.2018
Language:EN
[2018/31]
Search report(s)(Supplementary) European search report - dispatched on:EP23.01.2009
ClassificationIPC:C08G77/60, C08G77/62, H01L21/316, H01L21/312
[2009/09]
CPC:
C08G77/62 (EP,KR,US); C08G77/60 (EP,KR,US); C08L83/16 (KR);
H01L21/02126 (EP,US); H01L21/022 (EP,US); H01L21/02203 (EP,US);
H01L21/02282 (EP,US); H01L21/02304 (EP,US); H01L21/02348 (EP,US);
H01L21/02362 (EP,US); H01L21/3121 (US); H01L21/3125 (US);
H01L21/31695 (US); H01L21/3205 (KR); H01L21/76807 (EP,US);
H01L21/76825 (EP,US); H01L21/76829 (EP,US); H01L21/76832 (EP,US);
H01L21/76834 (EP,US); H01L21/76835 (EP,US); H01L21/02164 (EP);
H01L21/02216 (EP); H01L21/02222 (EP) (-)
Designated contracting statesDE,   FR,   IT [2018/31]
Former [2009/44]DE,  FR,  IT 
Former [2009/09]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MT,  NL,  NO,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:SILICIUMVERBINDUNG, UV-LICHT ABSORBIERENDES ELEMENT, VERFAHREN ZUR HERSTELLUNG EINER MEHRSCHICHT-VERKABELUNGSVORRICHTUNG UND MEHRSCHICHT-VERKABELUNGSVORRICHTUNG[2018/16]
English:SILICON COMPOUND, ULTRAVIOLET ABSORBENT, METHOD FOR MANUFACTURING MULTILAYER WIRING DEVICE AND MULTILAYER WIRING DEVICE[2018/16]
French:COMPOSÉ DE SILICONE, ABSORBANT D'ULTRAVIOLETS, PROCÉDÉ DE FABRICATION DE DISPOSITIF DE CÂBLAGE MULTICOUCHES ET DISPOSITIF DE CÂBLAGE MULTICOUCHES[2018/16]
Former [2009/09]Siliciumverbindung, UV-Licht absorbierendes Element, Verfahren zur Herstellung einer Mehrschicht-Verkabelungsvorrichtung und Mehrschicht-Verkabelungsvorrichtung
Former [2009/09]Silicon compound, ultraviolet absorbent, method for manufacturing multilayer wiring device and multilayer wiring device
Former [2009/09]Composé de silicone, absorbant d'ultraviolets, procédé de fabrication de dispositif de câblage multicouches et dispositif de câblage multicouches
Examination procedure23.06.2009Amendment by applicant (claims and/or description)
09.07.2009Examination requested  [2009/34]
26.08.2009Loss of particular rights, legal effect: designated state(s)
06.10.2009Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GB, GR, HR, HU, IE, IS, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR
20.04.2011Despatch of a communication from the examining division (Time limit: M06)
20.10.2011Reply to a communication from the examining division
06.08.2014Despatch of a communication from the examining division (Time limit: M06)
08.01.2015Reply to a communication from the examining division
24.08.2017Despatch of a communication from the examining division (Time limit: M04)
27.12.2017Reply to a communication from the examining division
23.03.2018Communication of intention to grant the patent
21.06.2018Fee for grant paid
21.06.2018Fee for publishing/printing paid
21.06.2018Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  20.04.2011
Opposition(s)03.05.2019No opposition filed within time limit [2019/28]
Fees paidRenewal fee
30.08.2010Renewal fee patent year 03
30.08.2011Renewal fee patent year 04
31.05.2012Renewal fee patent year 05
03.06.2013Renewal fee patent year 06
02.06.2014Renewal fee patent year 07
31.05.2015Renewal fee patent year 08
15.06.2016Renewal fee patent year 09
31.05.2017Renewal fee patent year 10
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Documents cited:Search[X]US4761458  (BURNS GARY T [US], et al) [X] 1,2 * examples 3,6-8; claims 15,19 *;
 [A]DE3841348  (KALI CHEMIE AG [DE]) [A] 1-3 * examples 1,2 *;
 [X]DE3917838  (KALI CHEMIE AG [DE]) [X] 1-3 * page 4, lines 48-50 * * page 5, lines 17-20 * * page 8, line 51 * * claims 1,11,15,16 *;
 [A]DE4214045  (SOLVAY DEUTSCHLAND [DE]) [A] 1-3 * examples 7-13 *;
 [X]JPH11105186  (TONEN CORP) [X] 1-3 * paragraphs [0005] , [0006] *;
 [X]US6395649  (WU HUI-JUNG [US]) [X] 1 * column 11, lines 14-30; figure .; example 1 *;
 [AX]JP2002170883  (NEC CORP, et al) [A] 4-10 * abstract * * paragraphs [0031] - [0034]; figure 4 * [X] 11;
 [A]EP1308476  (FUJITSU LTD [JP]) [A] 4-11 * paragraphs [0014] , [0033] , [0034] , [0083]; figures 4B,5B; claim - *;
 [X]WO2007051089  (STARFIRE SYSTEMS INC [US], et al) [X] 1,2 * page 22, lines 1,2 * * examples 3,7 *;
 [PX]US2007190461  (OZAKI SHIROU [JP], et al) [PX] 1-11* example -; claim -; table 1 *;
 [X]  - HABEL W ET AL, JOURNAL OF ORGANOMETALLIC CHEMISTRY, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, (19950125), vol. 486, no. 1, ISSN 0022-328X, pages 267 - 273, XP004024378 [X] 1,2 * abstract *

DOI:   http://dx.doi.org/10.1016/0022-328X(94)05054-F
 [X]  - HABEL W ET AL, JOURNAL OF ORGANOMETALLIC CHEMISTRY, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, (19950531), vol. 494, no. 1, ISSN 0022-328X, pages 157 - 163, XP004023967 [X] 1,2 * abstract *

DOI:   http://dx.doi.org/10.1016/0022-328X(95)05397-8
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