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EP2036856
European procedure
Extract from the Register of European Patents
EP About this file: EP2036856
| EP2036856 - Clean bench and method of producing raw material for single crystal silicon [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 19.07.2019 Database last updated on 24.08.2024 | |
| Former | The patent has been granted Status updated on 10.08.2018 | ||
| Former | Grant of patent is intended Status updated on 06.08.2018 | ||
| Former | Examination is in progress Status updated on 29.06.2018 | ||
| Former | Grant of patent is intended Status updated on 19.04.2018 | ||
| Former | Examination is in progress Status updated on 26.10.2017 | Most recent event Tooltip | 19.07.2019 | No opposition filed within time limit | published on 21.08.2019 [2019/34] | Applicant(s) | For all designated states Mitsubishi Materials Corporation 5-1, Ohtemachi 1-chome Chiyoda-ku Tokyo / JP | [2018/37] |
| Former [2009/12] | For all designated states Mitsubishi Materials Corporation 5-1, Ohtemchi 1-chome Chiyoda-ku Tokyo / JP | Inventor(s) | 01 /
Sakai, Kazuhiro c/o Mitsubishi Materials Corporation, Yokkaichi Plant, 5, Mita-cho Yokkaichi-shi, Mie-ken / JP | 02 /
Miyata, Yukiyasu c/o Mitsubishi Materials Corporation, Yokkaichi Plant, 5, Mita-cho Yokkaichi, Mie-ken / JP | [2018/37] |
| Former [2009/12] | 01 /
Sakai, Kazuhiro c/o Mitsubishi Materials Corporation, Yokkaichi Plant, 5, Mita-cho Yokkaichi-shi, Mie-ken / JP | ||
| 02 /
Miyata, Yukiyasu c/o Mitsubishi Materials Corporation, Yokkaichi Plant, 5, Mita-cho Yokkaichi, Mie-ken / JP | Representative(s) | Plasseraud IP 104 Rue de Richelieu CS92104 75080 Paris Cedex 02 / FR | [N/P] |
| Former [2018/37] | Cabinet Plasseraud 66, rue de la Chaussée d'Antin 75440 Paris Cedex 09 / FR | ||
| Former [2009/12] | Cabinet Plasseraud 52, rue de la Victoire 75440 Paris Cedex 09 / FR | Application number, filing date | 08163533.6 | 02.09.2008 | [2009/12] | Priority number, date | JP20070229211 | 04.09.2007 Original published format: JP 2007229211 | JP20080168497 | 27.06.2008 Original published format: JP 2008168497 | [2009/12] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP2036856 | Date: | 18.03.2009 | Language: | EN | [2009/12] | Type: | A3 Search report | No.: | EP2036856 | Date: | 19.08.2009 | [2009/34] | Type: | B1 Patent specification | No.: | EP2036856 | Date: | 12.09.2018 | Language: | EN | [2018/37] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 17.07.2009 | Classification | IPC: | C01B33/037 | [2009/12] | CPC: |
C01B33/037 (EP,US);
Y10S55/18 (EP,US)
| Designated contracting states | DE, IT [2018/37] |
| Former [2010/17] | DE, IT | ||
| Former [2009/12] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR | Title | German: | Sterilbank und Verfahren zur Herstellung des Rohmaterials für Einkristall-Silicium | [2009/12] | English: | Clean bench and method of producing raw material for single crystal silicon | [2009/12] | French: | Banc stérile et procédé de production de matière première pour silicium monocristallin | [2009/12] | Examination procedure | 19.02.2010 | Examination requested [2010/13] | 20.02.2010 | Loss of particular rights, legal effect: designated state(s) | 22.02.2010 | Amendment by applicant (claims and/or description) | 31.03.2010 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR | 20.08.2010 | Despatch of a communication from the examining division (Time limit: M04) | 17.12.2010 | Reply to a communication from the examining division | 11.08.2014 | Despatch of a communication from the examining division (Time limit: M04) | 19.12.2014 | Reply to a communication from the examining division | 16.10.2017 | Despatch of a communication from the examining division (Time limit: M04) | 23.02.2018 | Reply to a communication from the examining division | 20.04.2018 | Communication of intention to grant the patent | 22.06.2018 | Disapproval of the communication of intention to grant the patent by the applicant or resumption of examination proceedings by the EPO | 22.06.2018 | Fee for grant paid | 22.06.2018 | Fee for publishing/printing paid | 06.08.2018 | Information about intention to grant a patent | 06.08.2018 | Receipt of the translation of the claim(s) | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 20.08.2010 | Opposition(s) | 13.06.2019 | No opposition filed within time limit [2019/34] | Fees paid | Renewal fee | 15.07.2010 | Renewal fee patent year 03 | 27.07.2011 | Renewal fee patent year 04 | 27.07.2012 | Renewal fee patent year 05 | 02.08.2013 | Renewal fee patent year 06 | 10.07.2014 | Renewal fee patent year 07 | 22.07.2015 | Renewal fee patent year 08 | 13.07.2016 | Renewal fee patent year 09 | 06.07.2017 | Renewal fee patent year 10 | 19.07.2018 | Renewal fee patent year 11 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | IT | 12.09.2018 | [2019/21] | Documents cited: | Search | [X]JPH07149930 (PURE RETSUKUSU KK) [X] 1-5 * abstract * * figure 1 *; | [A]JP2001308158 (TAISEI CORP) [A] 3 * abstract ** figure 2 *; | [Y]EP1397030 (TECHNO RYOWA LTD [JP], et al) [Y] 1-3 * paragraphs [0001] , [0003] , [0012] , [0061] , [0063] , [0065]; figures 8-10 *; | [DY]JP2005279576 (SANYO ELECTRIC CO, et al) [DY] 1-3 * abstract * * figures 1,2 * |