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Extract from the Register of European Patents

EP About this file: EP2040288

EP2040288 - Method of forming semiconductor chip wiring pattern using alignment marks [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  24.08.2012
Database last updated on 08.10.2024
Most recent event   Tooltip24.08.2012Application deemed to be withdrawnpublished on 26.09.2012  [2012/39]
Applicant(s)For all designated states
Shinko Electric Industries Co., Ltd.
80, Oshimada-machi
Nagano-shi, Nagano 381-2287 / JP
[2009/13]
Inventor(s)01 / Machida, Yoshihiro
c/o Shinko Electric Industries Co., Ltd. 80, Oshimada-machi Nagano-shi
Nagano 381-2287 / JP
 [2009/13]
Representative(s)Zimmermann & Partner Patentanwälte mbB
Postfach 330 920
80069 München / DE
[N/P]
Former [2009/13]Zimmermann & Partner
Isartorplatz 1
80331 München / DE
Application number, filing date08164617.618.09.2008
[2009/13]
Priority number, dateJP2007024137418.09.2007         Original published format: JP 2007241374
[2009/13]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP2040288
Date:25.03.2009
Language:EN
[2009/13]
ClassificationIPC:H01L21/60, H01L23/544
[2009/13]
CPC:
H01L23/544 (EP,US); H01L21/78 (KR); H01L23/3114 (EP,US);
H01L23/48 (KR); H01L24/11 (EP,US); H01L24/12 (EP,US);
H01L24/94 (EP,US); H01L2223/5442 (EP,US); H01L2223/5446 (EP,US);
H01L2224/0231 (EP,US); H01L2224/02333 (EP,US); H01L2224/0401 (EP,US);
H01L2224/05624 (EP,US); H01L2224/06135 (EP); H01L2224/13099 (EP,US);
H01L2224/274 (EP,US); H01L2924/01005 (EP,US); H01L2924/01006 (EP,US);
H01L2924/01013 (EP,US); H01L2924/01022 (EP,US); H01L2924/01023 (EP,US);
H01L2924/01029 (EP,US); H01L2924/01033 (EP,US); H01L2924/01074 (EP,US);
H01L2924/01078 (EP,US); H01L2924/01079 (EP,US); H01L2924/014 (EP,US);
H01L2924/14 (EP,US) (-)
C-Set:
H01L2224/05624, H01L2924/00014 (EP,US)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2009/13]
Extension statesALNot yet paid
BANot yet paid
MKNot yet paid
RSNot yet paid
TitleGerman:Herstellungsverfahren von Leiterbahnstrukturen eines Halbleiterbauelementes mittels Ausrichtungsmarkierungen[2009/13]
English:Method of forming semiconductor chip wiring pattern using alignment marks[2009/13]
French:Procédé de fabrication d'un circuit de connexion d'une puce à semi-conducteur en utilisant des marques d'alignement[2009/13]
Examination procedure03.04.2012Application deemed to be withdrawn, date of legal effect  [2012/39]
10.05.2012Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2012/39]
Fees paidRenewal fee
29.09.2010Renewal fee patent year 03
Penalty fee
Additional fee for renewal fee
30.09.201104   M06   Not yet paid
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Cited inby applicantJP2002313985
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