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Extract from the Register of European Patents

EP About this file: EP1953183

EP1953183 - Silphenylene-bearing polymer, photo-curable resin composition, patterning process, and substrate circuit protective film [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  11.07.2014
Database last updated on 31.08.2024
Most recent event   Tooltip11.07.2014No opposition filed within time limitpublished on 13.08.2014  [2014/33]
Applicant(s)For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Ohtemachi 2-chome, Chiyoda-ku
Tokyo / JP
[2008/32]
Inventor(s)01 / Kato, Hideto, c/o Shin-Etsu Chemical Co. Ltd.
28-1, Nishi Fukushima
Kubiki-ku
Joetsu-shi, Niigata-ken / JP
02 / Asai, Satoshi, c/o Shin-Etsu Chemical Co. Ltd.
28-1, Nishi Fukushima
Kubiki-ku
Joetsu-shi, Niigata-ken / JP
 [2013/36]
Former [2008/32]01 / Kato, Hideto, c/o Shin-Etsu Chemical Co. Ltd.
28-1, Nishi Fukushima, Kubiki-ku
Joetsu-shi, Niigata-ken / JP
02 / Asai, Satoshi, c/o Shin-Etsu Chemical Co. Ltd.
28-1, Nishi Fukushima, Kubiki-ku
Joetsu-shi, Niigata-ken / JP
Representative(s)Stoner, Gerard Patrick, et al
Mewburn Ellis LLP
City Tower
40 Basinghall Street
London EC2V 5DE / GB
[N/P]
Former [2013/36]Stoner, Gerard Patrick, et al
Mewburn Ellis LLP
33 Gutter Lane
London
EC2V 8AS / GB
Former [2008/32]Stoner, Gerard Patrick, et al
Mewburn Ellis LLP York House 23 Kingsway
London WC2B 6HP / GB
Application number, filing date08250362.430.01.2008
[2008/32]
Priority number, dateJP2007002102331.01.2007         Original published format: JP 2007021023
[2008/32]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1953183
Date:06.08.2008
Language:EN
[2008/32]
Type: A3 Search report 
No.:EP1953183
Date:19.11.2008
[2008/47]
Type: B1 Patent specification 
No.:EP1953183
Date:04.09.2013
Language:EN
[2013/36]
Search report(s)(Supplementary) European search report - dispatched on:EP22.10.2008
ClassificationIPC:C08G77/60, C08J5/18, C08J7/04, C08L83/16, C09D183/16, G03F7/075, H01L21/312
[2008/47]
CPC:
C08G77/52 (EP,KR,US); H01L21/02126 (EP,US); C08G77/60 (EP,KR,US);
C09D183/14 (EP,KR,US); C09D183/16 (EP,KR,US); G03F7/0043 (KR);
G03F7/0045 (KR); G03F7/0757 (EP,KR,US); H01L21/02282 (EP,US);
H01L21/312 (US); H01L21/02107 (KR); Y10S430/106 (EP,KR,US);
Y10S430/115 (EP,KR,US); Y10T428/24802 (EP,US) (-)
Former IPC [2008/32]C08G77/00
Designated contracting statesDE,   FR,   GB [2009/30]
Former [2008/32]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MT,  NL,  NO,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Silphenylenhaltiges Polymer, lichthärtbare Harzzusammensetzung, Musterungsverfahren und Substratschaltungsschutzfilm[2008/32]
English:Silphenylene-bearing polymer, photo-curable resin composition, patterning process, and substrate circuit protective film[2008/32]
French:Polymère portant du silphénylène, composition de résine photodurcissable, procédé de formation de motif, et film de protection de circuit de substrat[2008/32]
Examination procedure05.03.2009Examination requested  [2009/16]
20.05.2009Loss of particular rights, legal effect: designated state(s)
25.06.2009Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR
01.03.2013Communication of intention to grant the patent
23.04.2013Disapproval of the communication of intention to grant the patent by the applicant or resumption of examination proceedings by the EPO
15.05.2013Communication of intention to grant the patent
24.07.2013Fee for grant paid
24.07.2013Fee for publishing/printing paid
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  01.03.2013
Opposition(s)05.06.2014No opposition filed within time limit [2014/33]
Fees paidRenewal fee
13.01.2010Renewal fee patent year 03
14.01.2011Renewal fee patent year 04
11.01.2012Renewal fee patent year 05
10.01.2013Renewal fee patent year 06
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]US4990546  (ECKBERG RICHARD P [US]) [A] 1-4 * example 1 *;
 [A]US6072016  (KOBAYASHI HIDEKI [JP], et al) [A] 1-4* the whole document *
by applicantUS3159601
 US3159662
 US3220972
 US3775452
 JPS49115541
 JPS54145794
 JPS5545746
 JPH0146862B
 JPH03209478
 JPH10265571
 JPH10274850
 JPH1165107
 JP2001335619
 JP2002088158
 JP2002293877
 US6590010
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.