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Extract from the Register of European Patents

EP About this file: EP2012342

EP2012342 - Hybrid etch chamber with decoupled plasma controls [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  15.07.2011
Database last updated on 03.10.2024
Most recent event   Tooltip15.07.2011Withdrawal of applicationpublished on 17.08.2011  [2011/33]
Applicant(s)For all designated states
INTEVAC, INC.
3560 Bassett Street Santa Clara
California 95054 / US
[2009/02]
Inventor(s)01 / Yang, Jang Gyoo
1960 Spanish Bay Court
San Jose CA, 95138 / US
02 / Barnes, Michael
12215 Santa Teresa Drive
San Ramon CA, 94583 / US
03 / Bluck, Terry
3128 Butte Street
Sanza Clara CA, 95051 / US
 [2009/02]
Representative(s)Foster, Mark Charles, et al
Mathisen & Macara LLP
Charta House
30-38 Church Street
Staines-upon-Thames, Middlesex TW18 4EP / GB
[N/P]
Former [2009/02]Foster, Mark Charles, et al
Mathisen, Macara & Co. The Coach House 6-8 Swakeleys Road
Ickenham, Uxbridge UB10 8BZ / GB
Application number, filing date08252118.819.06.2008
[2009/02]
Priority number, dateUS2007074906926.06.2007         Original published format: US 749069
[2009/02]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP2012342
Date:07.01.2009
Language:EN
[2009/02]
Type: A3 Search report 
No.:EP2012342
Date:01.09.2010
[2010/35]
Search report(s)(Supplementary) European search report - dispatched on:EP04.08.2010
ClassificationIPC:H01J37/32
[2009/02]
CPC:
H01J37/321 (EP,KR,US); H01J37/32091 (EP,US); H01J37/32165 (EP,KR,US);
H01J37/32862 (KR)
Designated contracting statesDE,   FR,   GB,   IT [2011/18]
Former [2009/02]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MT,  NL,  NO,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Hybridätzkammer mit entkoppelten Plasmasteuerungen[2009/02]
English:Hybrid etch chamber with decoupled plasma controls[2009/02]
French:Chambre de gravure hybride avec contrôles de plasma découplés[2009/02]
Examination procedure01.03.2011Amendment by applicant (claims and/or description)
01.03.2011Examination requested  [2011/15]
08.04.2011Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HR, HU, IE, IS, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR
15.06.2011Application withdrawn by applicant  [2011/33]
Fees paidRenewal fee
11.06.2010Renewal fee patent year 03
13.06.2011Renewal fee patent year 04
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[Y]US5882424  (TAYLOR BRAD [US], et al) [Y] 18,20 * figure 1 * * column 4, line 35 - column 8, line 62 *;
 [XYI]US2002004309  (COLLINS KENNETH S [US], et al) [X] 1,4 * figures 1,2,12 * * paragraph [0042] - paragraph [0049] * * paragraph [0065] - paragraph [0074] * * paragraph [0089] - paragraph [0090] * * paragraph [0150] * [Y] 3,5,6,9 [I] 2,7,8,10,11;
 [XYI]US6422172  (TANAKA JYUNICHI [JP], et al) [X] 13 * figures 1,4 * * column 4, line 29 - line 39 * * column 6, line 49 - line 52 * * column 6, line 60 - column 7, line 30 * [Y] 14,15,18-20 [I] 16,17;
 [AD]US2005133163  (SHANNON STEVEN C [US], et al) [AD] 1-20 * paragraph [0015] - paragraph [0018]; figure 1 *;
 [Y]WO2005093780  (VARIAN SEMICONDUCTOR EQUIPMENT [US], et al) [Y] 5,6,9,14,15 * figures 1,2,3 *;
 [Y]US2005241762  (PATERSON ALEXANDER [US], et al) [Y] 3,19 * abstract * * paragraph [0064] - paragraph [0068] *;
 [XP]EP1860680  (NEW POWER PLASMA CO LTD [KR]) [XP] 1 * figures 1,6 * * paragraph [0016] - paragraph [0022] * * paragraph [0025] - paragraph [0027] ** paragraph [0040] - paragraph [0041] *;
 [XP]WO2008010943  (LAM RES CORP [US], et al) [XP] 13 * figure 4 * * abstract * * paragraph [0027] - paragraph [0029] * * paragraph [0034] - paragraph [0038] *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.