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EP2190967
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EP About this file: EP2190967
| EP2190967 - COMPOSITION AND METHOD FOR REMOVING ION-IMPLANTED PHOTORESIST [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 26.04.2013 Database last updated on 29.06.2024 | Most recent event Tooltip | 26.04.2013 | Application deemed to be withdrawn | published on 29.05.2013 [2013/22] | Applicant(s) | For all designated states Advanced Technology Materials, Inc. 7 Commerce Drive Danbury, CT 06810 / US | [2010/22] | Inventor(s) | 01 /
ZHOU, Renjie 9 Aster Way Dayton, New Jersey 08810 / US | 02 /
COOPER, Emanuel 25 Atherstone Road Scarsdale, New York 10583 / US | 03 /
KORZENSKI, Michael 110 Woodcrest Lane Danbury, Connecticut 06810 / US | 04 /
JIANG, Ping 2 Mountainview Terrace, Apartment 4321 Danbury, Connecticut 06810 / US | [2010/22] | Representative(s) | ABG Intellectual Property Law, S.L. Avenida de Burgos, 16D Edificio Euromor 28036 Madrid / ES | [N/P] |
| Former [2010/22] | ABG Patentes, S.L. Avenida de Burgos 16D Edificio Euromor 28036 Madrid / ES | Application number, filing date | 08827598.7 | 20.08.2008 | [2010/22] | WO2008US73650 | Priority number, date | US20070965456P | 20.08.2007 Original published format: US 965456 P | [2010/22] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | WO2009026324 | Date: | 26.02.2009 | Language: | EN | [2009/09] | Type: | A2 Application without search report | No.: | EP2190967 | Date: | 02.06.2010 | Language: | EN | The application published by WIPO in one of the EPO official languages on 26.02.2009 takes the place of the publication of the European patent application. | [2010/22] | Search report(s) | International search report - published on: | KR | 14.05.2009 | (Supplementary) European search report - dispatched on: | EP | 15.09.2010 | Classification | IPC: | G03F7/42, H01L21/311 | [2012/26] | CPC: |
G03F7/423 (EP,US);
H01L21/31133 (EP,US)
|
| Former IPC [2010/22] | C11D7/08, C11D7/26, C01B31/20, H01L21/02 | Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR [2010/22] | Title | German: | ZUSAMMENSETZUNG UND VERFAHREN ZUR ENTFERNUNG VON IONENIMPLANTIERTEM FOTOLACK | [2010/22] | English: | COMPOSITION AND METHOD FOR REMOVING ION-IMPLANTED PHOTORESIST | [2010/22] | French: | COMPOSITION ET PROCÉDÉ POUR RETIRER UN PHOTORÉSIST À IMPLANTATION IONIQUE | [2010/22] | Entry into regional phase | 17.03.2010 | National basic fee paid | 17.03.2010 | Search fee paid | 17.03.2010 | Designation fee(s) paid | 17.03.2010 | Examination fee paid | Examination procedure | 17.03.2010 | Examination requested [2010/22] | 04.04.2011 | Amendment by applicant (claims and/or description) | 23.05.2011 | Despatch of a communication from the examining division (Time limit: M06) | 23.11.2011 | Reply to a communication from the examining division | 12.12.2011 | Despatch of a communication from the examining division (Time limit: M02) | 07.02.2012 | Reply to a communication from the examining division | 25.05.2012 | Cancellation of oral proceeding that was planned for 11.06.2012 | 11.06.2012 | Date of oral proceedings (cancelled) | 18.07.2012 | Communication of intention to grant the patent | 29.11.2012 | Application deemed to be withdrawn, date of legal effect [2013/22] | 14.01.2013 | Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time [2013/22] | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 23.05.2011 | Fees paid | Renewal fee | 25.08.2010 | Renewal fee patent year 03 | 24.08.2011 | Renewal fee patent year 04 | 10.08.2012 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XY]FR2371705 (IBM [US]) [X] 1,3-5,9-12,14 * claims 1-7,9 * * page 3, line 4 - line 14 * * page 1, line 18 - line 24 * * page 2, line 29 - line 32; examples 1-5 * * page 3, line 34 - line 38 * [Y] 2,7,8,13,15; | [XY]US6294145 (HALL LINDSEY H [US], et al) [X] 1,3,4,10-12,14 * column 2, line 13 - line 32; examples 1,2; claims 1,2 * * column 1, line 38 * [Y] 2,7,8,13; | [XY]US2006081180 (AOKI HIDEMITSU [JP], et al) [X] 1,3-5,9,10,12,14 * paragraph [0071] * * paragraph [0047] * * First Embodiment; paragraph [0057] - paragraph [0061] * * Fourth Embodiment; paragraph [0079] - paragraph [0082] * * figures 1,3,10 * * paragraph [0048] - paragraph [0052] * [Y] 2,7,8,13,15; | [XP]WO2007143127 (DU PONT [US], et al) [XP] 1,3-6,11 * page 15 - page 16; examples 5, 7, 8 * * page 8, line 29 - line 32 *; | [Y]US4101440 (AKAGI MOTOO, et al) [Y] 2,7,8,13 * column 3, line 66 - column 4, line 22; claim 3 * * column 5, line 44 - line 46; example 2 *; | [A]US2004197261 (TUFANO THOMAS PETER [US], et al) [A] 1,5,6 * paragraph [0024]; claim 6 * | [XY] - BERGIN B.K., KAPLAN L.H., "Resist Stripping Process Using Caro's Acid. March 1976.", IBM TECHNICAL DISCLOSURE BULLETIN, New York, US, (19760301), vol. 18, no. 10, page 3225, XP002596067 [X] 1,3-5,9 * the whole document * [Y] 2,7,8,13 | International search | [A]US6489281 (SMITH KIM R [US], et al); | [A]US2006183654 (SMALL ROBERT J [US]); | [A]US2004038840 (LEE SHIHYING [US], et al) | by applicant | FR2371705 | WO2007143127 | US7188644 | US6698619 | US20070916966 | WO2008US63276 |