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Extract from the Register of European Patents

EP About this file: EP2271463

EP2271463 - POLISHING PAD WITH CONTROLLED VOID FORMATION [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  11.07.2014
Database last updated on 17.07.2024
Most recent event   Tooltip11.07.2014Withdrawal of applicationpublished on 13.08.2014  [2014/33]
Applicant(s)For all designated states
innoPad, Inc.
6 Centennial Drive
Peabody, MA 01960 / US
[2011/02]
Inventor(s)01 / LEFEVRE, Paul
8 High Ridge Road
Topsfield, Massachusetts 01983 / US
02 / WELLS, David Adam
4 Melba Drive
Hudson, New Hampshire 03051 / US
03 / JIN, Marc C.
1 Gloucester Street Apt. 5
Boston, Massachusetts 02115 / US
04 / HSU, Oscar K.
255 North Road
Chelmsford, Massachusetts 01824 / US
05 / ALDEBORGH, John Erik
56 Boren Lane
Boxford, Massachusetts 01921 / US
06 / WU, Guangwei
1063 Plymouth Drive
Sunnyvale, California 94087 / US
07 / MATHEW, Anoop
2 Magnolia Way, no. 208
Peabody, Massachusetts 01960 / US
08 / QIAO, Scott, Xin
-
deceased / US
 [2011/10]
Former [2011/02]01 / LEFEVRE, Paul
8 High Ridge Road
Topsfield, Massachusetts 01983 / US
02 / WELLS, David Adam
4 Melba Drive
Hudson, New Hampshire 03051 / US
03 / JIN, Marc C.
1 Gloucester Street Apt. 5
Boston, Massachusetts 02115 / US
04 / HSU, Oscar K.
255 North Road
Chelmsford, Massachusetts 01824 / US
05 / ALDEBORGH, John Erik
56 Boren Lane
Boxford, Massachusetts 01921 / US
06 / WU, Guangwei
1063 Plymouth Drive
Sunnyvale, California 94087 / US
07 / MATHEW, Anoop
2 Magnolia Way, no. 208
Peabody, Massachusetts 01960 / US
08 / QIAO, Scott, Xin
2649 Fieldview Drive
Macungie, Pennsylvania 18062 / US
Representative(s)Richly & Ritschel Patentanwälte PartG mbB
Postfach 100411
51404 Bergisch Gladbach / DE
[N/P]
Former [2014/04]Kierdorf Ritschel
Sattlerweg 14
51429 Bergisch Gladbach / DE
Former [2013/25]polypatent BGL
Sattlerweg 14
51429 Bergisch Gladbach / DE
Former [2013/22]polypatent BGL
Braunsberger Feld 29
51429 Bergisch Gladbach / DE
Former [2012/02]Polypatent
Postfach 10 04 11
51404 Bergisch Gladbach / DE
Former [2011/02]Polypatent
An den Gärten 7
51491 Overath / DE
Application number, filing date08873724.202.10.2008
[2011/02]
WO2008US78610
Priority number, dateUS20080041422P01.04.2008         Original published format: US 41422 P
[2011/02]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2009123659
Date:08.10.2009
Language:EN
[2009/41]
Type: A1 Application with search report 
No.:EP2271463
Date:12.01.2011
Language:EN
The application published by WIPO in one of the EPO official languages on 08.10.2009 takes the place of the publication of the European patent application.
[2011/02]
Search report(s)International search report - published on:US08.10.2009
(Supplementary) European search report - dispatched on:EP28.10.2013
ClassificationIPC:B24B37/24
[2013/48]
CPC:
B24B37/24 (EP,US); Y10T428/249953 (EP,US); Y10T428/249978 (EP,US)
Former IPC [2011/02]B24B5/00, B24B29/00
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2011/02]
TitleGerman:POLIERKISSEN MIT GESTEUERTER HOHLRAUMBILDUNG[2011/02]
English:POLISHING PAD WITH CONTROLLED VOID FORMATION[2011/02]
French:TAMPON DE POLISSAGE AVEC PRODUCTION DE VIDES CONTRÔLÉE[2011/02]
Entry into regional phase05.10.2010National basic fee paid 
05.10.2010Search fee paid 
05.10.2010Designation fee(s) paid 
05.10.2010Examination fee paid 
Examination procedure05.10.2010Examination requested  [2011/02]
24.01.2011Amendment by applicant (claims and/or description)
01.07.2014Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
07.07.2014Application withdrawn by applicant  [2014/33]
Fees paidRenewal fee
27.12.2010Renewal fee patent year 03
25.10.2011Renewal fee patent year 04
25.10.2012Renewal fee patent year 05
28.10.2013Renewal fee patent year 06
Penalty fee
Additional fee for renewal fee
01.11.201003   M06   Fee paid on   27.12.2010
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[XY]US2003220061  (PRASAD ABANESHWAR [US]) [X] 1-3,6,7,10,13,15 * paragraphs [0001] , [0010] , [0011] , [0032] - [0034] - [0048] , [0049] , [0055] - [0058] * [Y] 5,11,12,14;
 [XY]EP1118432  (APPLIED MATERIALS INC [US]) [X] 1-4,7-9,15 * paragraphs [0001] , [0016] , [0044] , [0045] , [0047] , [0049] , [0052]; figure 2 * [Y] 5,11,12,14;
 [Y]WO2008011535  (INNOPAD INC [US], et al) [Y] 5,11,12 * page 2, lines 22-32 * * page 5, lines 7-28 *;
 [Y]US2005222288  (SEYANAGI HIROSHI [JP], et al) [Y] 14 * paragraph [0011] *
International search[X]US2005222288  (SEYANAGI HIROSHI [JP], et al);
 [Y]US2002077037  (TIETZ JAMES V [US]);
 [A]US2003168627  (SINGH RAJIV K [US], et al);
 [A]US2006189269  (ROY PRADIP K [US], et al)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.