EP2271463 - POLISHING PAD WITH CONTROLLED VOID FORMATION [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 11.07.2014 Database last updated on 17.07.2024 | Most recent event Tooltip | 11.07.2014 | Withdrawal of application | published on 13.08.2014 [2014/33] | Applicant(s) | For all designated states innoPad, Inc. 6 Centennial Drive Peabody, MA 01960 / US | [2011/02] | Inventor(s) | 01 /
LEFEVRE, Paul 8 High Ridge Road Topsfield, Massachusetts 01983 / US | 02 /
WELLS, David Adam 4 Melba Drive Hudson, New Hampshire 03051 / US | 03 /
JIN, Marc C. 1 Gloucester Street Apt. 5 Boston, Massachusetts 02115 / US | 04 /
HSU, Oscar K. 255 North Road Chelmsford, Massachusetts 01824 / US | 05 /
ALDEBORGH, John Erik 56 Boren Lane Boxford, Massachusetts 01921 / US | 06 /
WU, Guangwei 1063 Plymouth Drive Sunnyvale, California 94087 / US | 07 /
MATHEW, Anoop 2 Magnolia Way, no. 208 Peabody, Massachusetts 01960 / US | 08 /
QIAO, Scott, Xin - deceased / US | [2011/10] |
Former [2011/02] | 01 /
LEFEVRE, Paul 8 High Ridge Road Topsfield, Massachusetts 01983 / US | ||
02 /
WELLS, David Adam 4 Melba Drive Hudson, New Hampshire 03051 / US | |||
03 /
JIN, Marc C. 1 Gloucester Street Apt. 5 Boston, Massachusetts 02115 / US | |||
04 /
HSU, Oscar K. 255 North Road Chelmsford, Massachusetts 01824 / US | |||
05 /
ALDEBORGH, John Erik 56 Boren Lane Boxford, Massachusetts 01921 / US | |||
06 /
WU, Guangwei 1063 Plymouth Drive Sunnyvale, California 94087 / US | |||
07 /
MATHEW, Anoop 2 Magnolia Way, no. 208 Peabody, Massachusetts 01960 / US | |||
08 /
QIAO, Scott, Xin 2649 Fieldview Drive Macungie, Pennsylvania 18062 / US | Representative(s) | Richly & Ritschel Patentanwälte PartG mbB Postfach 100411 51404 Bergisch Gladbach / DE | [N/P] |
Former [2014/04] | Kierdorf Ritschel Sattlerweg 14 51429 Bergisch Gladbach / DE | ||
Former [2013/25] | polypatent BGL Sattlerweg 14 51429 Bergisch Gladbach / DE | ||
Former [2013/22] | polypatent BGL Braunsberger Feld 29 51429 Bergisch Gladbach / DE | ||
Former [2012/02] | Polypatent Postfach 10 04 11 51404 Bergisch Gladbach / DE | ||
Former [2011/02] | Polypatent An den Gärten 7 51491 Overath / DE | Application number, filing date | 08873724.2 | 02.10.2008 | [2011/02] | WO2008US78610 | Priority number, date | US20080041422P | 01.04.2008 Original published format: US 41422 P | [2011/02] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2009123659 | Date: | 08.10.2009 | Language: | EN | [2009/41] | Type: | A1 Application with search report | No.: | EP2271463 | Date: | 12.01.2011 | Language: | EN | The application published by WIPO in one of the EPO official languages on 08.10.2009 takes the place of the publication of the European patent application. | [2011/02] | Search report(s) | International search report - published on: | US | 08.10.2009 | (Supplementary) European search report - dispatched on: | EP | 28.10.2013 | Classification | IPC: | B24B37/24 | [2013/48] | CPC: |
B24B37/24 (EP,US);
Y10T428/249953 (EP,US);
Y10T428/249978 (EP,US)
|
Former IPC [2011/02] | B24B5/00, B24B29/00 | Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR [2011/02] | Title | German: | POLIERKISSEN MIT GESTEUERTER HOHLRAUMBILDUNG | [2011/02] | English: | POLISHING PAD WITH CONTROLLED VOID FORMATION | [2011/02] | French: | TAMPON DE POLISSAGE AVEC PRODUCTION DE VIDES CONTRÔLÉE | [2011/02] | Entry into regional phase | 05.10.2010 | National basic fee paid | 05.10.2010 | Search fee paid | 05.10.2010 | Designation fee(s) paid | 05.10.2010 | Examination fee paid | Examination procedure | 05.10.2010 | Examination requested [2011/02] | 24.01.2011 | Amendment by applicant (claims and/or description) | 01.07.2014 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time | 07.07.2014 | Application withdrawn by applicant [2014/33] | Fees paid | Renewal fee | 27.12.2010 | Renewal fee patent year 03 | 25.10.2011 | Renewal fee patent year 04 | 25.10.2012 | Renewal fee patent year 05 | 28.10.2013 | Renewal fee patent year 06 | Penalty fee | Additional fee for renewal fee | 01.11.2010 | 03   M06   Fee paid on   27.12.2010 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XY]US2003220061 (PRASAD ABANESHWAR [US]) [X] 1-3,6,7,10,13,15 * paragraphs [0001] , [0010] , [0011] , [0032] - [0034] - [0048] , [0049] , [0055] - [0058] * [Y] 5,11,12,14; | [XY]EP1118432 (APPLIED MATERIALS INC [US]) [X] 1-4,7-9,15 * paragraphs [0001] , [0016] , [0044] , [0045] , [0047] , [0049] , [0052]; figure 2 * [Y] 5,11,12,14; | [Y]WO2008011535 (INNOPAD INC [US], et al) [Y] 5,11,12 * page 2, lines 22-32 * * page 5, lines 7-28 *; | [Y]US2005222288 (SEYANAGI HIROSHI [JP], et al) [Y] 14 * paragraph [0011] * | International search | [X]US2005222288 (SEYANAGI HIROSHI [JP], et al); | [Y]US2002077037 (TIETZ JAMES V [US]); | [A]US2003168627 (SINGH RAJIV K [US], et al); | [A]US2006189269 (ROY PRADIP K [US], et al) |